Motonaga; Toshiaki

Patent Applications and Registrations

Patent applications and USPTO patent grants for Motonaga; Toshiaki.The latest application filed is for "halftone phase shift photomask and blank for halftone phase shift photomask".

Company Profile

0.6.6

Motonaga; Toshiaki - Tokyo JP
Motonaga; Toshiaki - Tokyo-to JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Photomask with dust-proofing device and exposure method using the same Grant 6,933,082 - Motonaga , et al. August 23, 2	2005-08-23
Halftone phase shift photomask and blank for halftone phase shift photomask Grant 6,869,736 - Nakagawa , et al. March 22, 2	2005-03-22
Halftone phase shifting photomask and blanks for halftone phase shifting photomask therefor and a method for forming pattern by using the halftone phase shifting photomask Grant 6,780,547 - Motonaga , et al. August 24, 2	2004-08-24
Photomask Grant 6,740,455 - Noguchi , et al. May 25, 2	2004-05-25
Halftone phase shift photomask and blanks for halftone phase shift photomask for it and pattern forming method using this Grant 6,709,791 - Mohri , et al. March 23, 2	2004-03-23
Halftone phase shift photomask and blank for halftone phase shift photomask App 20030186135 - Nakagawa, Hiro-o ; et al.	2003-10-02
Halftone phase shift photomask and blank for halftone phase shift photomask Grant 6,599,667 - Yusa , et al. July 29, 2	2003-07-29
Photomask with dust-proofing device and exposure method using the same App 20030087165 - Motonaga, Toshiaki ; et al.	2003-05-08
Photomask App 20020119379 - Noguchi, Kenji ; et al.	2002-08-29
Halftone phase shift photomask and blank for halftone phase shift photomask App 20020039689 - Yusa, Satoshi ; et al.	2002-04-04
Halftone phase shifting photomask and blanks for halftone phase shifting photomask therefor and a method for forming pattern by using the halftone phase shifting photomask App 20020015187 - Motonaga, Toshiaki ; et al.	2002-02-07
Blank for halftone phase shift photomask and halftone phase shift photomask App 20010005564 - Motonaga, Toshiaki ; et al.	2001-06-28

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.