Mosley David Trademarks & Logos

Patent Application	Date
ACID POLISHING COMPOSITION AND METHOD OF POLISHING A SUBSTRATE HAVING ENHANCED DEFECT INHIBITION 20200239734 - Guo; Yi ; et al.	2020-07-30
CMP SLURRY COMPOSITIONS CONTAINING SILICA WITH TRIMETHYLSULFOXONIUM CATIONS 20190185713 - 15/842297 Mosley; David	2019-06-20
AQUEOUS SILICA SLURRY AND AMINE CARBOXYLIC ACID COMPOSITIONS SELECTIVE FOR NITRIDE REMOVAL IN POLISHING AND METHODS OF USING THEM 20190092972 - 15/719031 Penta; Naresh Kumar ; et al.	2019-03-28
AQUEOUS LOW ABRASIVE SILICA SLURRY AND AMINE CARBOXYLIC ACID COMPOSITIONS FOR USE IN SHALLOW TRENCH ISOLATION AND METHODS OF MAKING AND USING THEM 20190092970 - 15/718998 Guo; Yi ; et al.	2019-03-28
AQUEOUS SILICA SLURRY COMPOSITIONS FOR USE IN SHALLOW TRENCH ISOLATION AND METHODS OF USING THEM 20190062593 - 15/691115 Penta; Naresh Kumar ; et al.	2019-02-28
Acid polishing composition and method of polishing a substrate having enhanced defect inhibition 10,781,343 - 16/256,593 Guo , et al. Sept	2020-09-22
Aqueous silica slurry and amine carboxylic acid compositions selective for nitride removal in polishing and methods of using them 10,584,265 - 15/719,031 Penta , et al.	2020-03-10
Aqueous low abrasive silica slurry and amine carboxylic acid compositions for use in shallow trench isolation and methods of making and using them 10,508,221 - 15/718,998 Guo , et al. Dec	2019-12-17
Aqueous silica slurry compositions for use in shallow trench isolation and methods of using them 10,316,218 - 15/691,115 Penta , et al.	2019-06-11
Aqueous silica slurry compositions for use in shallow trench isolation and methods of using them 10,221,336 - 15/680,730 Kozhukh , et al.	2019-03-05

Patent Application

Date

ACID POLISHING COMPOSITION AND METHOD OF POLISHING A SUBSTRATE HAVING ENHANCED DEFECT INHIBITION
20200239734 - Guo; Yi ; et al.

2020-07-30

CMP SLURRY COMPOSITIONS CONTAINING SILICA WITH TRIMETHYLSULFOXONIUM CATIONS
20190185713 - 15/842297 Mosley; David

2019-06-20

AQUEOUS SILICA SLURRY AND AMINE CARBOXYLIC ACID COMPOSITIONS SELECTIVE FOR NITRIDE REMOVAL IN POLISHING AND METHODS OF USING THEM
20190092972 - 15/719031 Penta; Naresh Kumar ; et al.

2019-03-28

AQUEOUS LOW ABRASIVE SILICA SLURRY AND AMINE CARBOXYLIC ACID COMPOSITIONS FOR USE IN SHALLOW TRENCH ISOLATION AND METHODS OF MAKING AND USING THEM
20190092970 - 15/718998 Guo; Yi ; et al.

2019-03-28

AQUEOUS SILICA SLURRY COMPOSITIONS FOR USE IN SHALLOW TRENCH ISOLATION AND METHODS OF USING THEM
20190062593 - 15/691115 Penta; Naresh Kumar ; et al.

2019-02-28

Acid polishing composition and method of polishing a substrate having enhanced defect inhibition
10,781,343 - 16/256,593 Guo , et al. Sept

2020-09-22

Aqueous silica slurry and amine carboxylic acid compositions selective for nitride removal in polishing and methods of using them
10,584,265 - 15/719,031 Penta , et al.

2020-03-10

Aqueous low abrasive silica slurry and amine carboxylic acid compositions for use in shallow trench isolation and methods of making and using them
10,508,221 - 15/718,998 Guo , et al. Dec

2019-12-17

Aqueous silica slurry compositions for use in shallow trench isolation and methods of using them
10,316,218 - 15/691,115 Penta , et al.

2019-06-11

Aqueous silica slurry compositions for use in shallow trench isolation and methods of using them
10,221,336 - 15/680,730 Kozhukh , et al.

2019-03-05

Mark Image Registration \| Serial	Trademark Application Date
"EXCLUSV" 87637902	EXCLUSV 2017-10-09

Mark Image

Registration | Serial

Trademark

Application Date

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