Morse; Patrick Lawrence
Patent Applications and Registrations
Patent applications and USPTO patent grants for Morse; Patrick Lawrence.The latest application filed is for "dual power feed rotary sputtering cathode".
- Morse; Patrick Lawrence - Tucson AZ
- Morse; Patrick Lawrence - Tuscon AZ
| Patent | Date |
|---|---|
| Dual Power Feed Rotary Sputtering Cathode App 20200266038 - Crowley; Daniel Theodore ; et al. | 2020-08-20 |
| Magnetic force release for sputtering sources with magnetic target materials Grant 10,727,034 - Morse , et al. | 2020-07-28 |
| Dual power feed rotary sputtering cathode Grant 10,699,885 - Crowley , et al. | 2020-06-30 |
| Rotary magnetron magnet bar and apparatus containing the same for high target utilization Grant 10,273,570 - Madocks , et al. | 2019-04-30 |
| Magnetic Force Release For Sputtering Sources With Magnetic Target Materials App 20190057848 - Morse; Patrick Lawrence ; et al. | 2019-02-21 |
| Dual Power Feed Rotary Sputtering Cathode App 20170278685 - Crowley; Daniel Theodore ; et al. | 2017-09-28 |
| Sputtering apparatus Grant 9,758,862 - Morse September 12, 2 | 2017-09-12 |
| Rotary Magnetron Magnet Bar And Apparatus Containing The Same For High Target Utilization App 20160289820 - MADOCKS; JOHN E. ; et al. | 2016-10-06 |
| Sputtering apparatus Grant 9,418,823 - Crowley , et al. August 16, 2 | 2016-08-16 |
| Sputtering Apparatus App 20160225591 - Crowley; Daniel Theodore ; et al. | 2016-08-04 |
| Plasma enhanced chemical vapor deposition (PECVD) source Grant 9,406,487 - Crowley , et al. August 2, 2 | 2016-08-02 |
| Rotary magnetron magnet bar and apparatus containing the same for high target utilization Grant 9,388,490 - Madocks , et al. July 12, 2 | 2016-07-12 |
| Sputtering apparatus Grant 9,312,108 - Crowley , et al. April 12, 2 | 2016-04-12 |
| Ion Control For A Plasma Source App 20160064191 - Morse; Patrick Lawrence | 2016-03-03 |
| Ion control for a plasma source Grant 9,198,274 - Morse November 24, 2 | 2015-11-24 |
| Decentralized Process Controller App 20150120001 - German; John Robert ; et al. | 2015-04-30 |
| Sputtering Apparatus App 20140246310 - Crowley; Daniel Theodore ; et al. | 2014-09-04 |
| Sputtering Apparatus App 20140246312 - Crowley; Daniel Theodore ; et al. | 2014-09-04 |
| Plasma Enhanced Chemical Vapor Deposition (pecvd) Source App 20140184073 - Crowley; Daniel Theodore ; et al. | 2014-07-03 |
| Sputtering Apparatus App 20140061029 - Morse; Patrick Lawrence | 2014-03-06 |
| Ion Control For A Plasma Source App 20140007813 - Morse; Patrick Lawrence | 2014-01-09 |
| Rotatable magnetron sputtering with axially movable target electrode tube Grant 8,535,490 - Madocks , et al. September 17, 2 | 2013-09-17 |
| Rotary Magnetron Magnet Bar And Apparatus Containing The Same For High Target Utilization App 20120261253 - Madocks; John E. ; et al. | 2012-10-18 |
| Rotatable Magnetron Sputtering With Axially Movable Target Electrode Tube App 20100155226 - Madocks; John ; et al. | 2010-06-24 |
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