loadpatents
Patent applications and USPTO patent grants for MORIYA; Shuji.The latest application filed is for "apparatuses for manufacturing semiconductor devices".
Patent | Date |
---|---|
Apparatuses For Manufacturing Semiconductor Devices App 20210313169 - SONG; Hyunjae ;   et al. | 2021-10-07 |
Method for cleaning chamber of substrate processing apparatus Grant 10,786,837 - Saito , et al. September 29, 2 | 2020-09-29 |
Substrate processing method and substrate processing apparatus Grant 10,312,101 - Moriya , et al. | 2019-06-04 |
Method For Cleaning Chamber Of Substrate Processing Apparatus App 20180369881 - SAITO; Yukimasa ;   et al. | 2018-12-27 |
Substrate Cleaning Apparatus App 20180355465 - SAITO; Yukimasa ;   et al. | 2018-12-13 |
Substrate Processing Method And Substrate Processing Apparatus App 20170316947 - MORIYA; Shuji ;   et al. | 2017-11-02 |
Etching method Grant 9,691,630 - Takahashi , et al. June 27, 2 | 2017-06-27 |
Pipe joint Grant 9,435,470 - Okabe , et al. September 6, 2 | 2016-09-06 |
Pipe joint Grant 9,371,946 - Okabe , et al. June 21, 2 | 2016-06-21 |
Etching Method App 20160086814 - TAKAHASHI; Nobuhiro ;   et al. | 2016-03-24 |
Etching apparatus and etching method Grant 9,236,272 - Moriya January 12, 2 | 2016-01-12 |
Processing apparatus Grant 9,150,965 - Moriya , et al. October 6, 2 | 2015-10-06 |
Image forming apparatus Grant 9,026,011 - Kubo , et al. May 5, 2 | 2015-05-05 |
Etching method and non-transitory storage medium Grant 9,012,331 - Moriya , et al. April 21, 2 | 2015-04-21 |
Etching Method And Non-transitory Storage Medium App 20140357085 - MORIYA; Shuji ;   et al. | 2014-12-04 |
Flow rate controller and processing apparatus Grant 8,893,743 - Okabe , et al. November 25, 2 | 2014-11-25 |
Joint App 20140333067 - Okabe; Tsuneyuki ;   et al. | 2014-11-13 |
Pipe Joint App 20140312617 - Okabe; Tsuneyuki ;   et al. | 2014-10-23 |
Etching Apparatus And Etching Method App 20140076849 - MORIYA; Shuji | 2014-03-20 |
Image Forming Apparatus App 20130223861 - Kubo; Kenta ;   et al. | 2013-08-29 |
Image Forming Apparatus App 20130216263 - Miyazawa; Tomoaki ;   et al. | 2013-08-22 |
Fluid control apparatus Grant 8,434,522 - Okase , et al. May 7, 2 | 2013-05-07 |
Flow Rate Controller And Processing Apparatus App 20130092264 - OKABE; Tsuneyuki ;   et al. | 2013-04-18 |
Pressure type flow rate control reference and corrosion resistant pressure type flow rate controller used for the same Grant 8,381,755 - Moriya , et al. February 26, 2 | 2013-02-26 |
Pressure Type Flow Rate Control Reference And Corrosion Resistant Pressure Type Flow Rate Controller Used For The Same App 20120234406 - Moriya; Shuji ;   et al. | 2012-09-20 |
Thermal type mass flow meter, and thermal type mass flow control device Grant 8,219,329 - Ebi , et al. July 10, 2 | 2012-07-10 |
Pressure type flow rate control reference and corrosion resistant pressure type flow rate controller used for the same Grant 8,210,022 - Moriya , et al. July 3, 2 | 2012-07-03 |
Processing Apparatus App 20120055402 - Moriya; Shuji ;   et al. | 2012-03-08 |
Gas supply unit and gas supply system Grant 8,104,516 - Moriya , et al. January 31, 2 | 2012-01-31 |
Image forming apparatus Grant 8,019,260 - Endo , et al. September 13, 2 | 2011-09-13 |
Image forming apparatus Grant 7,962,076 - Endo , et al. June 14, 2 | 2011-06-14 |
Thermal Type Mass Flow Meter, And Thermal Type Mass Flow Control Device App 20110125445 - Ebi; Hiroyuki ;   et al. | 2011-05-26 |
Gas supply system for semiconductor manufacturing apparatus Grant 7,862,638 - Moriya , et al. January 4, 2 | 2011-01-04 |
Image Forming Apparatus App 20100202806 - ENDO; Rie ;   et al. | 2010-08-12 |
Image forming apparatus Grant 7,734,205 - Sakaizawa , et al. June 8, 2 | 2010-06-08 |
Fluid Control Apparatus App 20100096031 - Okase; Wataru ;   et al. | 2010-04-22 |
Semiconductor fabrication system, and flow rate correction method and program for semiconductor fabrication system Grant 7,682,843 - Moriya , et al. March 23, 2 | 2010-03-23 |
Plasma Process Apparatus, Plasma Process Method, And Object Processed By The Plasma Process Method App 20090246542 - Nakao; Ken ;   et al. | 2009-10-01 |
Gas Supply Unit and Gas Supply System App 20090165872 - Moriya; Shuji ;   et al. | 2009-07-02 |
Pressure Type Flow Rate Control Reference And Corrosion Resistant Pressure Type Flow Rate Controller Used For The Same App 20090146089 - Moriya; Shuji ;   et al. | 2009-06-11 |
Semiconductor Fabrication System, And Flow Rate Correction Method And Program For Semiconductor Fabrication System App 20090061541 - Moriya; Shuji ;   et al. | 2009-03-05 |
Image Forming Apparatus App 20090003892 - Sakaizawa; Katsuhiro ;   et al. | 2009-01-01 |
Gas supply system and gas supply accumulation unit of semiconductor manufacturing apparatus App 20080295963 - Moriya; Shuji ;   et al. | 2008-12-04 |
Developing apparatus featuring image defect supression Grant 7,440,718 - Hagiwara , et al. October 21, 2 | 2008-10-21 |
Gas Supply System For Semiconductor Manufacturing Apparatus App 20080251018 - MORIYA; Shuji ;   et al. | 2008-10-16 |
Developing apparatus for preventing ghost images and uneven image density Grant 7,383,003 - Kichijima , et al. June 3, 2 | 2008-06-03 |
Developing apparatus Grant 7,379,693 - Ogawa , et al. May 27, 2 | 2008-05-27 |
Substrate Processing Device App 20080017105 - Moriya; Shuji ;   et al. | 2008-01-24 |
Developing apparatus including magnetic field generating means, for use with a developer which includes a magnetic toner component Grant 7,251,441 - Hagiwara , et al. July 31, 2 | 2007-07-31 |
Image forming apparatus when a maximum developing bias voltage |V| max and surface potential Vd of a charged image bearing member satisfy: |V| max.ltoreq.|Vd| Grant 7,239,831 - Hagiwara , et al. July 3, 2 | 2007-07-03 |
Developing apparatus featuring a developer carrying member with an elastic surface layer Grant 7,233,758 - Osada , et al. June 19, 2 | 2007-06-19 |
Image forming apparatus App 20070098459 - Endo; Rie ;   et al. | 2007-05-03 |
Developing apparatus App 20060233572 - Ogawa; Kenya ;   et al. | 2006-10-19 |
Developing apparatus App 20060233573 - Kichijima; Naoto ;   et al. | 2006-10-19 |
Developing Apparatus App 20060171745 - Hagiwara; Kazunari ;   et al. | 2006-08-03 |
Developing apparatus App 20050214031 - Hagiwara, Kazunari ;   et al. | 2005-09-29 |
Image forming apparatus App 20050196201 - Hagiwara, Kazunari ;   et al. | 2005-09-08 |
Developing apparatus App 20050152718 - Osada, Hikaru ;   et al. | 2005-07-14 |
Plasma-resistant member and plasma treatment apparatus using the same Grant 6,834,613 - Miyazaki , et al. December 28, 2 | 2004-12-28 |
Thin-film deposition apparatus and method for rapidly switching supply of source gases App 20040112289 - Moriya, Shuji ;   et al. | 2004-06-17 |
Developing device with developer bearing member overlying developer containing chamber Grant 6,738,593 - Kawamura , et al. May 18, 2 | 2004-05-18 |
Apparatus and method for detecting an end point of a cleaning process Grant 6,737,666 - Ito , et al. May 18, 2 | 2004-05-18 |
Heater including heat dissipation resistor on substrate and image heating apparatus equipped with the heater Grant 6,614,004 - Moriya , et al. September 2, 2 | 2003-09-02 |
Developing device with developer bearing member overlying developer containing chamber App 20030026629 - Kawamura, Takeshi ;   et al. | 2003-02-06 |
Integrated fluid supply apparatus, sealing device used there, and semiconductor manufacturing system using it App 20020060360 - Sugiyama, Kazuhiko ;   et al. | 2002-05-23 |
Image fixing apparatus App 20020061200 - Sakakibara, Hiroyuki ;   et al. | 2002-05-23 |
Heater including heat dissipation resistor on substrate and image heating apparatus equipped with the heater App 20020018109 - Moriya, Shuji ;   et al. | 2002-02-14 |
Gas supplying head and load lock chamber of semiconductor processing system Grant 5,578,129 - Moriya November 26, 1 | 1996-11-26 |
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