Morishima; Masato
Patent Applications and Registrations
Patent applications and USPTO patent grants for Morishima; Masato.The latest application filed is for "method for processing workpiece".
- Morishima; Masato - Tokyo JP
- MORISHIMA; Masato - Minato-ku Tokyo
- Morishima; Masato - Nirasaki JP
- MORISHIMA; Masato - Nirasaki City JP
- Morishima; Masato - Shiga JP
- Morishima; Masato - Nirasaki-shi JP
- MORISHIMA; Masato - Tsukuba City JP
| Patent | Date |
|---|---|
| Method for processing workpiece Grant 10,763,106 - Ouchi , et al. Sep | 2020-09-01 |
| Plasma electrode and plasma processing device Grant 10,600,621 - Morishima , et al. | 2020-03-24 |
| Method For Processing Workpiece App 20190189437 - OUCHI; Kenji ; et al. | 2019-06-20 |
| Plasma Electrode And Plasma Processing Device App 20190108984 - MORISHIMA; Masato ; et al. | 2019-04-11 |
| Film forming method and film forming apparatus Grant 9,926,624 - Yamada , et al. March 27, 2 | 2018-03-27 |
| Film Forming Method And Film Forming Apparatus App 20150368802 - YAMADA; Kazuki ; et al. | 2015-12-24 |
| Refrigerant compressor Grant 9,051,937 - Kubota , et al. June 9, 2 | 2015-06-09 |
| Substrate Processing Apparatus And Substrate Processing Method App 20150132960 - Nishimura; Eiichi ; et al. | 2015-05-14 |
| Film Forming Device App 20140373783 - SAWADA; Ikuo ; et al. | 2014-12-25 |
| Sealed Compressor App 20130266459 - MORISHIMA; Masato ; et al. | 2013-10-10 |
| Refrigerant Compressor App 20130121809 - KUBOTA; Akihiko ; et al. | 2013-05-16 |
| Film Formation Apparatus App 20120247390 - Sawada; Ikuo ; et al. | 2012-10-04 |
| Process gas introducing mechanism and plasma processing device Grant 8,191,505 - Kamaishi , et al. June 5, 2 | 2012-06-05 |
| Substrate Processing Apparatus And Substrate Processing Method App 20100206846 - Nishimura; Eiichi ; et al. | 2010-08-19 |
| Process gas introducing mechanism and plasma processing device App 20090260762 - Kamaishi; Takayuki ; et al. | 2009-10-22 |
| Method for manufacturing a fin field effect transistor App 20080132077 - Morishima; Masato | 2008-06-05 |
| Film formation method App 20060127601 - Murakami; Seishi ; et al. | 2006-06-15 |
| Process gas introducing mechanism and plasma processing device App 20060060141 - Kamaishi; Takayuki ; et al. | 2006-03-23 |
| Worktable device, film formation apparatus, and film formation method for semiconductor process App 20050257747 - Wakabayashi, Satoshi ; et al. | 2005-11-24 |
| CVD method App 20010021414 - Morishima, Masato ; et al. | 2001-09-13 |
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