MORISADA; Yoshinori

Patent Applications and Registrations

Patent applications and USPTO patent grants for MORISADA; Yoshinori.The latest application filed is for "film forming apparatus and film forming method".

Company Profile

0.19.21

MORISADA; Yoshinori - Nirasaki-shi Yamanashi
MORISADA; Yoshinori - Nirasaki City Yamanashi JP
Morisada; Yoshinori - Nirasaki JP
MORISADA; Yoshinori - Nirasaki City JP
Morisada; Yoshinori - Tama JP
Morisada; Yoshinori - Tokyo JP
Morisada; Yoshinori - Tami JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Film Forming Apparatus And Film Forming Method App 20210301402 - SUZUKI; Yusuke ; et al.	2021-09-30
Hard Mask, Substrate Processing Method, And Substrate Processing Apparatus App 20200370172 - MORIYA; Tsuyoshi ; et al.	2020-11-26
Method for improving chemical resistance of polymerized film, polymerized film forming method, film forming apparatus, and electronic product manufacturing method Grant 9,708,507 - Sugita , et al. July 18, 2	2017-07-18
Polymerized film forming method Grant 9,422,452 - Yamaguchi , et al. August 23, 2	2016-08-23
Method for Improving Chemical Resistance of Polymerized Film, Polymerized Film Forming Method, Film Forming Apparatus, and Electronic Product Manufacturing Method App 20150240121 - SUGITA; Kippei ; et al.	2015-08-27
Polymerized Film Forming Method And Polymerized Film Forming Apparatus App 20150232702 - YAMAGUCHI; Tatsuya ; et al.	2015-08-20
Shower plate having projections and plasma CVD apparatus using same Grant 7,799,134 - Tsuji , et al. September 21, 2	2010-09-21
Method of forming a carbon polymer film using plasma CVD Grant 7,638,441 - Morisada , et al. December 29, 2	2009-12-29
Method Of Self-cleaning Of Carbon-based Film App 20090090382 - Morisada; Yoshinori ; et al.	2009-04-09
Method of forming a carbon polymer film using plasma CVD Grant 7,504,344 - Matsuki , et al. March 17, 2	2009-03-17
Method Of Forming A Carbon Polymer Film Using Plasma Cvd App 20090068852 - MORISADA; Yoshinori ; et al.	2009-03-12
Method of forming a carbon polymer film using plasma CVD Grant 7,470,633 - Matsuki , et al. December 30, 2	2008-12-30
Method of forming carbon polymer film using plasma CVD Grant 7,410,915 - Morisada , et al. August 12, 2	2008-08-12
Dual-chamber plasma processing apparatus Grant 7,381,291 - Tobe , et al. June 3, 2	2008-06-03
Method of forming carbon polymer film using plasma CVD App 20070224833 - Morisada; Yoshinori ; et al.	2007-09-27
Method of forming a carbon polymer film using plasma CVD App 20070218705 - Matsuki; Nobuo ; et al.	2007-09-20
Plasma CVD film formation apparatus provided with mask App 20070065597 - Kaido; Shintaro ; et al.	2007-03-22
Method for forming low-k hard film Grant 7,064,088 - Hyodo , et al. June 20, 2	2006-06-20
Formation technology of nano-particle films having low dielectric constant App 20060105583 - Ikeda; Shingo ; et al.	2006-05-18
Method of forming a carbon polymer film using plasma CVD App 20060084280 - Matsuki; Nobuo ; et al.	2006-04-20
Dual-chamber plasma processing apparatus App 20060021701 - Tobe; Yasuhiro ; et al.	2006-02-02
Shower plate having projections and plasma CVD apparatus using same App 20050183666 - Tsuji, Naoto ; et al.	2005-08-25
Insulation film on semiconductor substrate and method for forming same Grant 6,881,683 - Matsuki , et al. April 19, 2	2005-04-19
Insulation film on semiconductor substrate and method for forming same Grant 6,852,650 - Matsuki , et al. February 8, 2	2005-02-08
Insulation film on semiconductor substrate and method for forming same Grant 6,784,123 - Matsuki , et al. August 31, 2	2004-08-31
Method for forming low dielectric constant interlayer insulation film Grant 6,759,344 - Matsuki , et al. July 6, 2	2004-07-06
Plasma CVD film-forming device Grant 6,740,367 - Matsuki , et al. May 25, 2	2004-05-25
Method for forming low-k hard film App 20040038514 - Hyodo, Yasuyoshi ; et al.	2004-02-26
Insulation film on semiconductor substrate and method for forming same App 20030224622 - Matsuki, Nobuo ; et al.	2003-12-04
Plasma CVD film-forming device Grant 6,631,692 - Matsuki , et al. October 14, 2	2003-10-14
Insulation film on semiconductor substrate and method for forming same App 20030162408 - Matsuki, Nobuo ; et al.	2003-08-28
Method for forming low dielectric constant interlayer insulation film App 20030143867 - Matsuki, Nobuo ; et al.	2003-07-31
Insulation film on semiconductor substrate and method for forming same App 20030119336 - Matsuki, Nobuo ; et al.	2003-06-26
Plasma CVD film-forming device App 20030089314 - Matsuki, Nobuo ; et al.	2003-05-15
Siloxan polymer film on semiconductor substrate Grant 6,559,520 - Matsuki , et al. May 6, 2	2003-05-06
Siloxan polymer film on semiconductor substrate and method for forming same Grant 6,514,880 - Matsuki , et al. February 4, 2	2003-02-04
Siloxan polymer film on semiconductor substrate App 20020160626 - Matsuki, Nobuo ; et al.	2002-10-31
Silicone polymer insulation film on semiconductor substrate and method for forming the film Grant 6,383,955 - Matsuki , et al. May 7, 2	2002-05-07
Silicone polymer insulation film on semiconductor substrate and method for forming the film Grant 6,352,945 - Matsuki , et al. March 5, 2	2002-03-05
Siloxan polymer film on semiconductor substrate and method for forming same App 20010046567 - Matsuki, Nobuo ; et al.	2001-11-29

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