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Patent applications and USPTO patent grants for Morikita; Shinya.The latest application filed is for "pulsed capacitively coupled plasma processes".
Patent | Date |
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Pulsed Capacitively Coupled Plasma Processes App 20220059358 - Ventzek; Peter ;   et al. | 2022-02-24 |
Plasma processing method and plasma processing apparatus Grant 11,251,048 - Aoki , et al. February 15, 2 | 2022-02-15 |
Processing Method And Substrate Processing Apparatus App 20210335598 - Tokuo; Takahiro ;   et al. | 2021-10-28 |
Plasma processing method Grant 11,145,490 - Yokota , et al. October 12, 2 | 2021-10-12 |
Treatment Method App 20210313187 - ITO; Kiyohito ;   et al. | 2021-10-07 |
Etching Method And Plasma Processing Apparatus App 20210305057 - ISHIHARADA; Kota ;   et al. | 2021-09-30 |
Substrate Processing Method And Substrate Processing Apparatus App 20210296090 - NAKAMURA; Satoru ;   et al. | 2021-09-23 |
Method of processing substrate, device manufacturing method, and plasma processing apparatus Grant 11,081,351 - Aoki , et al. August 3, 2 | 2021-08-03 |
Plasma processing apparatus and plasma processing method Grant 11,062,882 - Aoki , et al. July 13, 2 | 2021-07-13 |
Cleaning method and plasma processing apparatus Grant 10,991,551 - Bin Budiman , et al. April 27, 2 | 2021-04-27 |
Plasma processing method and plasma processing apparatus Grant 10,957,515 - Hosoya , et al. March 23, 2 | 2021-03-23 |
Etching method Grant 10,950,458 - Hama , et al. March 16, 2 | 2021-03-16 |
Method Of Processing Substrate, Device Manufacturing Method, And Plasma Processing Apparatus App 20210057212 - AOKI; Yusuke ;   et al. | 2021-02-25 |
Substrate processing method and substrate processing apparatus Grant 10,886,138 - Yang , et al. January 5, 2 | 2021-01-05 |
Plasma Processing Method And Plasma Processing Apparatus App 20200402805 - AOKI; Yusuke ;   et al. | 2020-12-24 |
Cleaning Method And Plasma Processing Apparatus App 20200328064 - BIN BUDIMAN; Mohd Fairuz ;   et al. | 2020-10-15 |
Plasma processing method and plasma processing apparatus Grant 10,770,268 - Morikita , et al. Sep | 2020-09-08 |
Apparatus And Method For Plasma Processing App 20200266036 - AOKI; Yusuke ;   et al. | 2020-08-20 |
Plasma Processing Apparatus And Plasma Processing Method App 20200234925 - AOKI; Yusuke ;   et al. | 2020-07-23 |
Method of processing target object Grant 10,707,088 - Morikita , et al. | 2020-07-07 |
Method for processing workpiece Grant 10,692,726 - Morikita , et al. | 2020-06-23 |
Plasma Processing Method App 20200126759 - YOKOTA; Akihiro ;   et al. | 2020-04-23 |
Plasma processing method Grant 10,546,723 - Yokota , et al. Ja | 2020-01-28 |
Substrate Processing Method And Substrate Processing Apparatus App 20190355588 - Yang; Timothy Tianshyun ;   et al. | 2019-11-21 |
Method For Processing Workpiece App 20190252198 - MORIKITA; Shinya ;   et al. | 2019-08-15 |
Etching Method App 20190214269 - Hama; Yasutaka ;   et al. | 2019-07-11 |
Plasma Processing Method App 20190096635 - YOKOTA; Akihiro ;   et al. | 2019-03-28 |
Plasma processing method Grant 10,192,750 - Morikita , et al. Ja | 2019-01-29 |
Plasma Processing Method And Plasma Processing Apparatus App 20180233331 - HOSOYA; Masanori ;   et al. | 2018-08-16 |
Plasma Processing Method And Plasma Processing Apparatus App 20180197720 - MORIKITA; Shinya ;   et al. | 2018-07-12 |
Method Of Processing Target Object App 20180047578 - Morikita; Shinya ;   et al. | 2018-02-15 |
Plasma Processing Method App 20170345666 - MORIKITA; Shinya ;   et al. | 2017-11-30 |
Pattern forming method Grant 9,412,618 - Morikita , et al. August 9, 2 | 2016-08-09 |
Pattern Forming Method App 20160042970 - Morikita; Shinya ;   et al. | 2016-02-11 |
Plasma etching method Grant 7,488,689 - Morikita , et al. February 10, 2 | 2009-02-10 |
Etching method and apparatus, computer program and computer readable storage medium Grant 7,387,743 - Morikita , et al. June 17, 2 | 2008-06-17 |
Etching method and apparatus, computer program and computer readable storage medium App 20060219657 - Morikita; Shinya ;   et al. | 2006-10-05 |
Plasma etching method App 20060118520 - Morikita; Shinya ;   et al. | 2006-06-08 |
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