Moriizumi; Koichi

Patent Applications and Registrations

Patent applications and USPTO patent grants for Moriizumi; Koichi.The latest application filed is for "substrate inspection apparatus and mask inspection apparatus".

Company Profile

0.9.1

Moriizumi; Koichi - Kanagawa N/A JP
Moriizumi; Koichi - Tokyo JP
Moriizumi; Koichi - Hyogo JP
Moriizumi; Koichi - Itami JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Substrate inspection apparatus and mask inspection apparatus Grant 8,760,642 - Hori , et al. June 24, 2	2014-06-24
Substrate Inspection Apparatus And Mask Inspection Apparatus App 20120287424 - HORI; Zenta ; et al.	2012-11-15
Apparatus and process for pattern distortion detection for semiconductor process and semiconductor device manufactured by use of the apparatus or process Grant 6,343,370 - Taoka , et al. January 29, 2	2002-01-29
Apparatus and method for inhibiting pattern distortions to correct pattern data in a semiconductor device Grant 6,298,473 - Ono , et al. October 2, 2	2001-10-02
Method of producing highly precise charged beam drawing data divided into plurality of drawing fields Grant 6,088,520 - Taoka , et al. July 11, 2	2000-07-11
Pattern comparison inspection system and method employing gray level bit map Grant 6,069,971 - Kanno , et al. May 30, 2	2000-05-30
Charged beam pattern data generating method and a charged beam pattern data generating apparatus Grant 5,812,412 - Moriizumi , et al. September 22, 1	1998-09-22
Electron beam exposure method Grant 5,086,398 - Moriizumi February 4, 1	1992-02-04
Charged beam pattern defect inspection apparatus Grant 4,794,646 - Takeuchi , et al. December 27, 1	1988-12-27

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