Moreau; Wayne Martin

Patent Applications and Registrations

Patent applications and USPTO patent grants for Moreau; Wayne Martin.The latest application filed is for "multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof".

Company Profile

0.30.24

Moreau; Wayne Martin - Wappingers Falls NY
Moreau; Wayne Martin - Wappinger NY
Moreau; Wayne Martin - Wappinqers Falls NY
Moreau; Wayne Martin - Dutchess County NY

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof Grant 7,736,833 - Angelopoulos , et al. June 15, 2	2010-06-15
Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof Grant 7,709,177 - Angelopoulos , et al. May 4, 2	2010-05-04
Ultrathin polymeric photoacid generator layer and method of fabricating at least one of a device and a mask by using said layer Grant 7,638,266 - Angelopoulos , et al. December 29, 2	2009-12-29
Dielectric material Grant 7,485,964 - Cotte , et al. February 3, 2	2009-02-03
Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof App 20080124650 - Angelopoulos; Marie ; et al.	2008-05-29
Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof App 20080124649 - Angelopoulos; Marie ; et al.	2008-05-29
Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof Grant 7,361,444 - Angelopoulos , et al. April 22, 2	2008-04-22
Process of removing residue from a precision surface using liquid or supercritical carbon dioxide composition Grant 7,332,436 - Cotte , et al. February 19, 2	2008-02-19
Method of making a packaged radiation sensitive resist film-coated workpiece Grant 7,168,224 - Angelopoulos , et al. January 30, 2	2007-01-30
Dielectric material App 20060180922 - Cotte; John M. ; et al.	2006-08-17
Process of insulating a semiconductor device using a polymeric material Grant 7,056,837 - Cotte , et al. June 6, 2	2006-06-06
Ultrathin polymeric photoacid generator layer and method of fabricating at least one of a device and a mask by using said layer App 20060035167 - Angelopoulos; Marie ; et al.	2006-02-16
Process of removing residue from a precision surface using liquid or supercritical critical carbon dioxide composition App 20050224748 - Cotte, John Michael ; et al.	2005-10-13
Apparatus and process for supercritical carbon dioxide phase processing Grant 6,953,042 - Jur , et al. October 11, 2	2005-10-11
Apparatus and process for supercritical carbon dioxide phase processing Grant 6,892,741 - Jur , et al. May 17, 2	2005-05-17
Process of removing residue material from a precision surface Grant 6,890,855 - Cotte , et al. May 10, 2	2005-05-10
Liquid or supercritical carbon dioxide composition Grant 6,838,015 - Cotte , et al. January 4, 2	2005-01-04
Check valve for micro electro mechanical structure devices Grant 6,834,671 - Cotte , et al. December 28, 2	2004-12-28
Apparatus and process for supercritical carbon dioxide phase processing App 20040149317 - Jur, Jesse Stephen ; et al.	2004-08-05
Check valve for micro electro mechanical structure devices App 20040134538 - Cotte, John Michael ; et al.	2004-07-15
Apparatus for cleaning filters Grant 6,739,346 - Cotte , et al. May 25, 2	2004-05-25
Packaged radiation sensitive coated workpiece process for making and method of storing same App 20040045866 - Angelopoulos, Marie ; et al.	2004-03-11
Energy sensitive electrically conductive admixtures, uses thereof, methods of fabrication and structures fabricated therewith Grant 6,685,853 - Angelopoulos , et al. February 3, 2	2004-02-03
Process of removing ion-implanted photoresist from a workpiece Grant 6,683,008 - Cotte , et al. January 27, 2	2004-01-27
Process of providing a semiconductor device with electrical interconnection capability Grant 6,653,233 - Cotte , et al. November 25, 2	2003-11-25
Dielectric material and process of insulating a semiconductor device using same App 20030211312 - Cotte, John M. ; et al.	2003-11-13
Process and apparatus for contacting a precision surface with liquid or supercritical carbon dioxide App 20030196679 - Cotte, John Michael ; et al.	2003-10-23
Electromechanical device and a process of preparing same Grant 6,622,507 - Cotte , et al. September 23, 2	2003-09-23
Process for cleaning a workpiece using supercritical carbon dioxide Grant 6,558,475 - Jur , et al. May 6, 2	2003-05-06
Apparatus and process for supercritical carbon dioxide phase processing App 20030066544 - Jur, Jesse Stephen ; et al.	2003-04-10
Liquid or supercritical carbon dioxide composition and process of removing residue from a precision surface using same App 20030045117 - Cotte, John Michael ; et al.	2003-03-06
Packaged radiation sensitive coated workpiece process for making and method of storing same App 20030019782 - Angelopoulos, Marie ; et al.	2003-01-30
Check valve for micro electro mechanical structure devices App 20030019528 - Cotte, John Michael ; et al.	2003-01-30
Electromechanical device and a process of preparing same App 20030019540 - Cotte, John Michael ; et al.	2003-01-30
Fixtures for processing a workpiece in a supercritical fluid App 20030010363 - Cotte, John Michael ; et al.	2003-01-16
Dielectric material and process of insulating a semiconductor device using same App 20030008129 - Cotte, John M. ; et al.	2003-01-09
Apparatus for cleaning filters App 20030000556 - Cotte, John Michael ; et al.	2003-01-02
Process of providing a semiconductor device with electrical interconnection capability App 20030003746 - Cotte, John Michael ; et al.	2003-01-02
Process of removing residue material from a precision surface App 20030003762 - Cotte, John Michael ; et al.	2003-01-02
Process for depositing a film on a nanometer structure Grant 6,451,375 - Cotte , et al. September 17, 2	2002-09-17
Process for removing chemical mechanical polishing residual slurry Grant 6,425,956 - Cotte , et al. July 30, 2	2002-07-30
Process For Depositing A Film On A Nanometer Structure App 20020090458 - Cotte, John Michael ; et al.	2002-07-11
Process For Removing Chemical Mechanical Polishing Residual Slurry App 20020088477 - Cotte, John Michael ; et al.	2002-07-11
Process of drying semiconductor wafers using liquid or supercritical carbon dioxide Grant 6,398,875 - Cotte , et al. June 4, 2	2002-06-04
Method for selective extraction of sacrificial place-holding material used in fabrication of air gap-containing interconnect structures Grant 6,346,484 - Cotte , et al. February 12, 2	2002-02-12
Highly Sensitive Positive Photoresist Compositions App 20010049071 - MERRITT, DAVID PAUL ; et al.	2001-12-06
Detection of a gaseous substance emanating from a layer of polymeric composition App 20010001370 - Collins, James Patrick ; et al.	2001-05-24
Polymeric dyes for antireflective coatings Grant 6,051,364 - Knors , et al. April 18, 2	2000-04-18
Highly sensitive positive photoresist composition Grant 6,051,659 - Merritt , et al. April 18, 2	2000-04-18
Reworkable polymer chip encapsulant Grant 5,930,597 - Call , et al. July 27, 1	1999-07-27
Making of microlithographic structures with an underlayer film containing a thermolyzed azide compound Grant 5,795,701 - Conley , et al. August 18, 1	1998-08-18
Method for patterning a photoresist material wherein an anti-reflective coating comprising a copolymer of bisphenol A and benzophenone is used Grant 5,736,301 - Fahey , et al. April 7, 1	1998-04-07
Reworkable polymer chip encapsulant Grant 5,659,203 - Call , et al. August 19, 1	1997-08-19
Polymeric dyes for antireflective coatings Grant 5,654,376 - Knors , et al. August 5, 1	1997-08-05

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