Moreau; Wayne

Patent Applications and Registrations

Patent applications and USPTO patent grants for Moreau; Wayne.The latest application filed is for "high sensitivity resist compositions for electron-based lithography".

Company Profile

0.4.4

Moreau; Wayne - Wappingers Falls NY

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
High sensitivity resist compositions for electron-based lithography Grant 7,314,700 - Huang , et al. January 1, 2	2008-01-01
Silicon-containing compositions for spin-on arc/hardmask materials Grant 7,276,327 - Angelopoulos , et al. October 2, 2	2007-10-02
Silicon-containing compositions for spin-on ARC/hardmask materials Grant 7,270,931 - Angelopoulos , et al. September 18, 2	2007-09-18
High sensitivity resist compositions for electron-based lithography App 20060127800 - Huang; Wu-Song ; et al.	2006-06-15
Silicon-containing compositions for spin-on arc/hardmask materials App 20060058489 - Angelopoulos; Marie ; et al.	2006-03-16
Process for removing impurities from low dielectric constant films disposed on semiconductor devices App 20050087490 - Chace, Mark S. ; et al.	2005-04-28
Silicon-containing compositions for spin-on arc/hardmask materials App 20050074689 - Angelopoulos, Marie ; et al.	2005-04-07
Silylation method for reducing critical dimension loss and resist loss Grant 6,107,177 - Lu , et al. August 22, 2	2000-08-22

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