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Patent applications and USPTO patent grants for More; Ming-Te.The latest application filed is for "pvd equipment and electrode and deposition ring thereof".
Patent | Date |
---|---|
PVD equipment and electrode and deposition ring thereof App 20060219172 - Kuo; Yu-Yuan ;   et al. | 2006-10-05 |
Method to reduce residual particulate contamination in CVD and PVD semiconductor wafer manufacturing Grant 6,812,156 - Day , et al. November 2, 2 | 2004-11-02 |
Container flush and gas charge system and method Grant 6,688,344 - Hu , et al. February 10, 2 | 2004-02-10 |
Method to reduce residual particulate contamination in CVD and PVD semiconductor wafer manufacturing App 20040005787 - Day, Dyson ;   et al. | 2004-01-08 |
Container Flush And Gas Charge System And Method App 20030221744 - Hu, Tain-Chen ;   et al. | 2003-12-04 |
Electrostatic charge-free solvent-type dryer for semiconductor wafers Grant 6,647,998 - Twu , et al. November 18, 2 | 2003-11-18 |
Electrostatic charge-free solvent-type dryer for semiconductor wafers App 20020195130 - Twu, Jih-Churng ;   et al. | 2002-12-26 |
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