Moore; Gary M.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Moore; Gary M..The latest application filed is for "gas ring and method of processing substrates".

Company Profile

0.23.1

Moore; Gary M. - San Francisco CA US
Moore; Gary M. - Los Gatos CA
Moore; Gary M. - San Jose CA
Moore; Gary M. - Monte Sereno CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Rapid thermal process reactor utilizing a low profile dome Grant 8,610,033 - Moore , et al. December 17, 2	2013-12-17
Gas ring and method of processing substrates Grant 7,794,667 - Nishikawa , et al. September 14, 2	2010-09-14
Gas ring and method of processing substrates App 20070087533 - Nishikawa; Katsuhito ; et al.	2007-04-19
Gas flow controller system Grant 6,799,603 - Moore October 5, 2	2004-10-05
Method of controlling gas flow to a semiconductor processing reactor Grant 6,773,749 - Moore August 10, 2	2004-08-10
Gas dispersion head Grant 6,475,284 - Moore , et al. November 5, 2	2002-11-05
Rapid thermal processing apparatus for processing semiconductor wafers Grant 6,310,327 - Moore , et al. October 30, 2	2001-10-30
Thermocouple sheath cover Grant 6,169,244 - Carlos , et al. January 2, 2	2001-01-02
Substrate support element Grant 6,163,015 - Moore , et al. December 19, 2	2000-12-19
Rapid thermal processing apparatus for processing semiconductor wafers Grant 6,151,447 - Moore , et al. November 21, 2	2000-11-21
Rapid thermal processing barrel reactor for processing substrates Grant 6,110,289 - Moore August 29, 2	2000-08-29
Multi-layer susceptor for rapid thermal process reactors Grant 5,820,686 - Moore October 13, 1	1998-10-13
Method for measuring substrate temperature in radiant heated reactors Grant 5,802,099 - Curran , et al. September 1, 1	1998-09-01
Power management system for a semiconductor processing facility Grant 5,801,961 - Moore , et al. September 1, 1	1998-09-01
Rapid thermal processing apparatus for processing semiconductor wafers Grant 5,710,407 - Moore , et al. January 20, 1	1998-01-20
Rapid thermal processing apparatus for processing semiconductor wafers Grant 5,683,518 - Moore , et al. November 4, 1	1997-11-04
Automated process gas supply system for evacuating a process line Grant 5,601,107 - Moore , et al. February 11, 1	1997-02-11
Multi-layer susceptor for rapid thermal process reactors Grant 5,580,388 - Moore December 3, 1	1996-12-03
Rapid thermal processing apparatus for processing semiconductor wafers Grant 5,444,217 - Moore , et al. August 22, 1	1995-08-22
Automated process gas supply system for evacuating a process line Grant 5,240,024 - Moore , et al. August 31, 1	1993-08-31
High capacity epitaxial reactor Grant 5,207,835 - Moore * May 4, 1	1993-05-04
Method for increasing the batch size of a barrel epitaxial reactor and reactor produced thereby Grant 5,053,247 - Moore October 1, 1	1991-10-01
Wafer handling tool and method of use Grant 4,823,654 - Moore April 25, 1	1989-04-25

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