name:-0.14511299133301
name:-0.028064966201782
name:-0.0011851787567139
Moore Epitaxial, Inc. Patent Filings

Moore Epitaxial, Inc.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Moore Epitaxial, Inc..The latest application filed is for "gas ring and method of processing substrates".

Company Profile
0.22.2
  • Moore Epitaxial, Inc. - Tracy CA
  • Moore Epitaxial Inc. -
  • Moore Epitaxial, Inc. - San Jose CA
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Trademarks
Patent Activity
PatentDate
Rapid thermal process reactor utilizing a low profile dome
Grant 8,610,033 - Moore , et al. December 17, 2
2013-12-17
Gas ring and method of processing substrates
Grant 7,794,667 - Nishikawa , et al. September 14, 2
2010-09-14
Gas ring and method of processing substrates
App 20070087533 - Nishikawa; Katsuhito ;   et al.
2007-04-19
Gas flow controller system
Grant 6,799,603 - Moore October 5, 2
2004-10-05
Method of controlling gas flow to a semiconductor processing reactor
Grant 6,773,749 - Moore August 10, 2
2004-08-10
Rotating susceptor and method of processing substrates
App 20030029384 - Nishikawa, Katsuhito
2003-02-13
Linear robot
Grant 6,491,435 - Nishikawa , et al. December 10, 2
2002-12-10
Gas dispersion head
Grant 6,475,284 - Moore , et al. November 5, 2
2002-11-05
Particulate free air bearing and seal
Grant 6,443,618 - Nishikawa , et al. September 3, 2
2002-09-03
Rapid thermal processing apparatus for processing semiconductor wafers
Grant 6,310,327 - Moore , et al. October 30, 2
2001-10-30
Thermocouple sheath cover
Grant 6,169,244 - Carlos , et al. January 2, 2
2001-01-02
Substrate support element
Grant 6,163,015 - Moore , et al. December 19, 2
2000-12-19
Rapid thermal processing barrel reactor for processing substrates
Grant 6,110,289 - Moore August 29, 2
2000-08-29
Multi-layer susceptor for rapid thermal process reactors
Grant 5,820,686 - Moore October 13, 1
1998-10-13
Method for measuring substrate temperature in radiant heated reactors
Grant 5,802,099 - Curran , et al. September 1, 1
1998-09-01
Power management system for a semiconductor processing facility
Grant 5,801,961 - Moore , et al. September 1, 1
1998-09-01
Rapid thermal processing apparatus for processing semiconductor wafers
Grant 5,710,407 - Moore , et al. January 20, 1
1998-01-20
Rapid thermal processing apparatus for processing semiconductor wafers
Grant 5,683,518 - Moore , et al. November 4, 1
1997-11-04
Automated process gas supply system for evacuating a process line
Grant 5,601,107 - Moore , et al. February 11, 1
1997-02-11
Multi-layer susceptor for rapid thermal process reactors
Grant 5,580,388 - Moore December 3, 1
1996-12-03
Rapid thermal processing apparatus for processing semiconductor wafers
Grant 5,444,217 - Moore , et al. August 22, 1
1995-08-22
Automated process gas supply system for evacuating a process line
Grant 5,240,024 - Moore , et al. August 31, 1
1993-08-31
High capacity epitaxial reactor
Grant 5,207,835 - Moore * May 4, 1
1993-05-04
Method for increasing the batch size of a barrel epitaxial reactor and reactor produced thereby
Grant 5,053,247 - Moore October 1, 1
1991-10-01

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