Patent applications and USPTO patent grants for Moore Epitaxial, Inc..The latest application filed is for "gas ring and method of processing substrates".
Patent | Date |
---|---|
Rapid thermal process reactor utilizing a low profile dome Grant 8,610,033 - Moore , et al. December 17, 2 | 2013-12-17 |
Gas ring and method of processing substrates Grant 7,794,667 - Nishikawa , et al. September 14, 2 | 2010-09-14 |
Gas ring and method of processing substrates App 20070087533 - Nishikawa; Katsuhito ;   et al. | 2007-04-19 |
Gas flow controller system Grant 6,799,603 - Moore October 5, 2 | 2004-10-05 |
Method of controlling gas flow to a semiconductor processing reactor Grant 6,773,749 - Moore August 10, 2 | 2004-08-10 |
Rotating susceptor and method of processing substrates App 20030029384 - Nishikawa, Katsuhito | 2003-02-13 |
Linear robot Grant 6,491,435 - Nishikawa , et al. December 10, 2 | 2002-12-10 |
Gas dispersion head Grant 6,475,284 - Moore , et al. November 5, 2 | 2002-11-05 |
Particulate free air bearing and seal Grant 6,443,618 - Nishikawa , et al. September 3, 2 | 2002-09-03 |
Rapid thermal processing apparatus for processing semiconductor wafers Grant 6,310,327 - Moore , et al. October 30, 2 | 2001-10-30 |
Thermocouple sheath cover Grant 6,169,244 - Carlos , et al. January 2, 2 | 2001-01-02 |
Substrate support element Grant 6,163,015 - Moore , et al. December 19, 2 | 2000-12-19 |
Rapid thermal processing barrel reactor for processing substrates Grant 6,110,289 - Moore August 29, 2 | 2000-08-29 |
Multi-layer susceptor for rapid thermal process reactors Grant 5,820,686 - Moore October 13, 1 | 1998-10-13 |
Method for measuring substrate temperature in radiant heated reactors Grant 5,802,099 - Curran , et al. September 1, 1 | 1998-09-01 |
Power management system for a semiconductor processing facility Grant 5,801,961 - Moore , et al. September 1, 1 | 1998-09-01 |
Rapid thermal processing apparatus for processing semiconductor wafers Grant 5,710,407 - Moore , et al. January 20, 1 | 1998-01-20 |
Rapid thermal processing apparatus for processing semiconductor wafers Grant 5,683,518 - Moore , et al. November 4, 1 | 1997-11-04 |
Automated process gas supply system for evacuating a process line Grant 5,601,107 - Moore , et al. February 11, 1 | 1997-02-11 |
Multi-layer susceptor for rapid thermal process reactors Grant 5,580,388 - Moore December 3, 1 | 1996-12-03 |
Rapid thermal processing apparatus for processing semiconductor wafers Grant 5,444,217 - Moore , et al. August 22, 1 | 1995-08-22 |
Automated process gas supply system for evacuating a process line Grant 5,240,024 - Moore , et al. August 31, 1 | 1993-08-31 |
High capacity epitaxial reactor Grant 5,207,835 - Moore * May 4, 1 | 1993-05-04 |
Method for increasing the batch size of a barrel epitaxial reactor and reactor produced thereby Grant 5,053,247 - Moore October 1, 1 | 1991-10-01 |
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