Moon; Sung-Taek

Patent Applications and Registrations

Patent applications and USPTO patent grants for Moon; Sung-Taek.The latest application filed is for "pad conditioner of semiconductor wafer polishing apparatus and manufacturing method thereof".

Company Profile

0.5.11

Moon; Sung-Taek - Suwon-si KR
Moon; Sung-Taek - Suwon KR
Moon; Sung-Taek - Gyeonggi-do KR
Moon; Sung-Taek - Suwon-city KR

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Slurry compositions, methods of preparing slurry compositions, and methods of polishing an object using slurry compositions Grant 8,007,676 - So , et al. August 30, 2	2011-08-30
Polishing pad, platen, method of monitoring, method of manufacturing, and method of detecting Grant 7,662,022 - Lim , et al. February 16, 2	2010-02-16
Pad Conditioner Of Semiconductor Wafer Polishing Apparatus And Manufacturing Method Thereof App 20090042494 - Moon; Sung-Taek ; et al.	2009-02-12
Polishing pad, platen, method of monitoring, method of manufacturing, and method of detecting App 20090029630 - Lim; Young-Sam ; et al.	2009-01-29
Polishing pad, platen, method of monitoring, method of manufacturing, and method of detecting Grant 7,442,111 - Lim , et al. October 28, 2	2008-10-28
Slurry Compositions, Methods Of Preparing Slurry Compositions, And Methods Of Polishing An Object Using Slurry Compositions App 20080227296 - SO; Jae-Hyun ; et al.	2008-09-18
Slurry compositions, methods of preparing slurry compositions, and methods of polishing an object using slurry compositions Grant 7,402,261 - So , et al. July 22, 2	2008-07-22
Polishing pad, platen, method of monitoring, method of manufacturing, and method of detecting App 20070212980 - Lim; Young-Sam ; et al.	2007-09-13
Conditioner Device For Conditioning Polishing Pad And Chemical Mechanical Polishing Apparatus Including The Same App 20070167117 - MOON; Sung-Taek ; et al.	2007-07-19
Polishing pad, platen, method of monitoring, method of manufacturing, and method of detecting Grant 7,229,337 - Lim , et al. June 12, 2	2007-06-12
Pad conditioner for chemical mechanical polishing apparatus App 20060199482 - Moon; Sung-Taek ; et al.	2006-09-07
Slurry compositions, methods of preparing slurry compositions, and methods of polishing an object using slurry compositions App 20060060568 - So; Jae-Hyun ; et al.	2006-03-23
Method of preparing slurry composition for chemical mechanical polishing App 20060032147 - So; Jae-hyun ; et al.	2006-02-16
Method for producing improved cerium oxide abrasive particles and compositions including such particles App 20060032150 - So; Jae Hyun ; et al.	2006-02-16
Polishing pad, platen, method of monitoring, method of manufacturing, and method of detecting App 20040253910 - Lim, Young-Sam ; et al.	2004-12-16
Method of forming silicon oxide layer in semiconductor manufacturing process using spin-on glass composition and isolation method using the same method App 20020055271 - Lee, Jung-Ho ; et al.	2002-05-09

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