Moniwa; Akemi

Patent Applications and Registrations

Patent applications and USPTO patent grants for Moniwa; Akemi.The latest application filed is for "manufacturing method of photomask, method for optical proximity correction, and manufacturing method of semiconductor device".

Company Profile

0.13.12

Moniwa; Akemi - Kanagawa JP
Moniwa; Akemi - Tokyo JP
Moniwa; Akemi - Sayama JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Manufacturing method of photomask, method for optical proximity correction, and manufacturing method of semiconductor device Grant 8,835,083 - Minamide , et al. September 16, 2	2014-09-16
Manufacturing Method Of Photomask, Method For Optical Proximity Correction, And Manufacturing Method Of Semiconductor Device App 20140030657 - MINAMIDE; Ayumi ; et al.	2014-01-30
Manufacturing method of photomask, method for optical proximity correction, and manufacturing method of semiconductor device Grant 8,563,200 - Minamide , et al. October 22, 2	2013-10-22
Photomask, manufacturing apparatus and method of semiconductor device using the same, and photomask feature layout method Grant 8,426,087 - Minamide , et al. April 23, 2	2013-04-23
Pattern formation method using levenson-type mask and method of manufacturing levenson-type mask Grant 8,367,309 - Okuno , et al. February 5, 2	2013-02-05
Manufacturing Method Of Photomask, Method For Optical Proximity Correction, And Manufacturing Method Of Semiconductor Device App 20120183891 - MINAMIDE; Ayumi ; et al.	2012-07-19
Photomask, Manufacturing Apparatus And Method Of Semiconductor Device Using The Same, And Photomask Feature Layout Method App 20120052419 - MINAMIDE; Ayumi ; et al.	2012-03-01
Photomask, apparatus for manufacturing semiconductor device having the photomask, and method of manufacturing semiconductor device using the photomask Grant 8,119,308 - Minamide , et al. February 21, 2	2012-02-21
Pattern Formation Method Using Levenson-type Mask And Method Of Manufacturing Levenson-type Mask App 20120028194 - OKUNO; Mitsuru ; et al.	2012-02-02
Pattern formation method using levenson-type mask and method of manufacturing levenson-type mask Grant 8,071,264 - Okuno , et al. December 6, 2	2011-12-06
Pattern Formation Method Using Levenson-type Mask And Method Of Manufacturing Levenson-type Mask App 20110165520 - OKUNO; Mitsuru ; et al.	2011-07-07
Pattern formation method using levenson-type mask and method of manufacturing levenson-type mask Grant 7,935,462 - Okuno , et al. May 3, 2	2011-05-03
Pattern Formation Method Using Levenson-type Mask And Method Of Manufacturing Levenson-type Mask App 20100136487 - OKUNO; Mitsuru ; et al.	2010-06-03
Pattern formation method using Levenson-type mask and method of manufacturing Levenson-type mask Grant 7,682,760 - Okuno , et al. March 23, 2	2010-03-23
Photomask, Apparatus For Manufacturing Semiconductor Device Having The Photomask, And Method Of Manufacturing Semiconductor Device Using The Photomask App 20090239159 - MINAMIDE; Ayumi ; et al.	2009-09-24
Semiconductor Device Manufacturing Method Using Double Patterning And Mask App 20090061362 - TAOKA; Hironobu ; et al.	2009-03-05
Pattern formation method using Levenson-type mask and method of manufacturing Levenson-type mask App 20070141480 - Okuno; Mitsuru ; et al.	2007-06-21
Semiconductor device and manufacturing method thereof Grant 6,964,832 - Moniwa , et al. November 15, 2	2005-11-15
Method for fabricating a semiconductor device Grant 6,787,459 - Moniwa , et al. September 7, 2	2004-09-07
Semiconductor device and manufacturing method thereof App 20030228758 - Moniwa, Akemi ; et al.	2003-12-11
Method for fabricating a semiconductor device App 20030106037 - Moniwa, Akemi ; et al.	2003-06-05
Method of manufacturing semiconductor device App 20020175298 - Moniwa, Akemi ; et al.	2002-11-28

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