Momota; Makoto

Patent Applications and Registrations

Patent applications and USPTO patent grants for Momota; Makoto.The latest application filed is for "dielectric composition and multilayer electronic device".

Company Profile

1.9.8

Momota; Makoto - Tokyo JP
Momota; Makoto - Haibara-gun JP
Momota; Makoto - Shizuoka JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Dielectric composition and multilayer electronic device Grant 10,276,303 - Kano , et al.	2019-04-30
Pattern forming method, and, method for producing electronic device and electronic device, each using the same Grant 10,126,651 - Sugiyama , et al. November 13, 2	2018-11-13
Dielectric Composition And Multilayer Electronic Device App 20180061572 - KANO; Yushi ; et al.	2018-03-01
Pattern Forming Method, And, Method For Producing Electronic Device And Electronic Device, Each Using The Same App 20150160555 - SUGIYAMA; Shinichi ; et al.	2015-06-11
Positive resist composition Grant 7,338,740 - Nakao , et al. March 4, 2	2008-03-04
Positive resist composition and pattern formation method using the same Grant 7,279,265 - Momota , et al. October 9, 2	2007-10-09
Positive photoresist composition Grant 7,022,456 - Momota April 4, 2	2006-04-04
Bottom anti-reflective coating material composition and method for forming resist pattern using the same Grant 6,808,869 - Mizutani , et al. October 26, 2	2004-10-26
Positive resist composition and pattern formation method using the same App 20040202954 - Momota, Makoto ; et al.	2004-10-14
Positive resist composition App 20040191676 - Nakao, Hajime ; et al.	2004-09-30
Positive photoresist composition App 20040048190 - Momota, Makoto	2004-03-11
Resist composition App 20030054287 - Yasunami, Shoichiro ; et al.	2003-03-20
Positive photoresist composition App 20020172886 - Momota, Makoto ; et al.	2002-11-21
Bottom anti-reflective coating material composition for photoresist and method of forming resist pattern using the same Grant 6,399,269 - Mizutani , et al. June 4, 2	2002-06-04
Bottom Anti-reflective Coating Material Composition For Photoresist And Method Of Forming Resist Pattern Using The Same App 20020015909 - MIZUTANI, KAZUYOSHI ; et al.	2002-02-07
Bottom anti-reflective coating material composition and method for forming resist pattern using the same Grant 6,165,684 - Mizutani , et al. December 26, 2	2000-12-26
Positive photoresist composition Grant 5,747,218 - Momota , et al. May 5, 1	1998-05-05

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