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name:-0.024405956268311
name:-0.025225162506104
name:-0.0025460720062256
Momose; Hikaru Patent Filings

Momose; Hikaru

Patent Applications and Registrations

Patent applications and USPTO patent grants for Momose; Hikaru.The latest application filed is for "(meth)acrylate resin material, surface hardness enhancer, polycarbonate resin composition, and molded article".

Company Profile
2.22.20
  • Momose; Hikaru - Otake JP
  • MOMOSE; Hikaru - Otake-shi JP
  • MOMOSE; Hikaru - Hiroshima JP
  • Momose; Hikaru - Yokohama JP
  • Momose; Hikaru - Kanagawa N/A JP
  • MOMOSE; Hikaru - Yokohama-shi JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
(Meth)acrylate resin material, surface hardness enhancer, polycarbonate resin composition, and molded article
Grant 11,098,193 - Aoki , et al. August 24, 2
2021-08-24
(meth)acrylate Resin Material, Surface Hardness Enhancer, Polycarbonate Resin Composition, And Molded Article
App 20200010673 - AOKI; Yutaka ;   et al.
2020-01-09
(Meth)acrylate resin material, surface hardness enhancer, polycarbonate resin composition, and molded article
Grant 10,513,606 - Aoki , et al. Dec
2019-12-24
Binder resin composition for secondary battery electrodes, slurry for secondary battery electrodes, electrode for secondary batteries, and lithium ion secondary battery
Grant 10,446,850 - Momose , et al. Oc
2019-10-15
Binder resin for nonaqueous secondary battery electrode, binder resin composition for nonaqueous secondary battery electrode slurry composition for nonaqueous secondary battery electrode, electrode for nonaqueous secondary battery, and nonaqueous secondary battery
Grant 10,361,434 - Okada , et al.
2019-07-23
Binder resin for nonaqueous secondary battery electrode, binder resin composition for nonaqueous secondary battery electrode slurry composition for nonaqueous secondary battery electrode, electrode for nonaqueous secondary battery, and nonaqueous secondary battery
Grant 9,774,038 - Okada , et al. September 26, 2
2017-09-26
(meth)acrylate Resin Material, Surface Hardness Enhancer, Polycarbonate Resin Composition, And Molded Article
App 20170253736 - AOKI; Yutaka ;   et al.
2017-09-07
Binder Resin for Nonaqueous Secondary Battery Electrode, Binder Resin Composition for Nonaqueous Secondary Battery Electrode Slurry Composition for Nonaqueous Secondary Battery Electrode, Electrode for Nonaqueous Secondary Battery, and Nonaqueous Secondary Battery
App 20170244105 - OKADA; Haruki ;   et al.
2017-08-24
Copolymers for lithography and method for producing same, resist composition, method for producing substrate with pattern formed thereupon, method for evaluating copolymers, and method for analyzing copolymer compositions
Grant 9,733,564 - Yasuda , et al. August 15, 2
2017-08-15
Resin Composition For Secondary Battery Electrodes, Solution Or Dispersion For Secondary Battery Electrodes, Slurry For Secondary Battery Electrodes, Electrode For Secondary Batteries, And Secondary Battery
App 20160260975 - ISHIGAKI; Kenichi ;   et al.
2016-09-08
Resist polymer, process for production thereof, resist composition, and process for production of substrates with patterns thereon
Grant 9,188,857 - Momose , et al. November 17, 2
2015-11-17
Binder Resin Composition for Secondary Battery Electrodes, Slurry for Secondary Battery Electrodes, Electrode for Secondary Batteries, and Lithium Ion Secondary Battery
App 20140349185 - Momose; Fumino ;   et al.
2014-11-27
Binder Resin for Nonaqueous Secondary Battery Electrode, Binder Resin Composition for Nonaqueous Secondary Battery Electrode Slurry Composition for Nonaqueous Secondary Battery Electrode, Electrode for Nonaqueous Secondary Battery, and Nonaqueous Secondary Battery
App 20140287308 - Okada; Haruki ;   et al.
2014-09-25
Binder For Electrode Of Electrochemical Element, Composition For Electrode Of Electrochemical Element, Electrode Of Electrochemical Element And Electrochemical Element
App 20140193709 - Okada; Haruki ;   et al.
2014-07-10
Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer
Grant 8,614,283 - Momose , et al. December 24, 2
2013-12-24
Resist polymer and resist composition
Grant 8,580,481 - Momose , et al. November 12, 2
2013-11-12
Resist Polymer, Process For Production Thereof, Resist Composition, And Process For Production Of Substrates With Patterns Thereon
App 20130252181 - MOMOSE; Hikaru ;   et al.
2013-09-26
Copolymers For Lithography And Method For Producing Same, Resist Composition, Method For Producing Substrate With Pattern Formed Thereupon, Method For Evaluating Copolymers, And Method For Analyzing Copolymer Compositions
App 20130224654 - Yasuda; Atsushi ;   et al.
2013-08-29
Resist polymer, process for production thereof, resist composition, and process for production of substrated with patterns thereon
Grant 8,476,401 - Momose , et al. July 2, 2
2013-07-02
Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer
Grant 8,241,829 - Momose , et al. August 14, 2
2012-08-14
Resist Polymer And Resist Composition
App 20120034561 - Momose; Hikaru ;   et al.
2012-02-09
Resist polymer and resist composition
Grant 8,092,979 - Momose , et al. January 10, 2
2012-01-10
Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer
Grant 8,049,042 - Momose , et al. November 1, 2
2011-11-01
Resist Polymer, Resist Composition, Process For Pattern Formation, And Starting Compounds For Production Of The Resist Polymer
App 20110144295 - Momose; Hikaru ;   et al.
2011-06-16
Resist Polymer And Resist Composition
App 20090263743 - MOMOSE; Hikaru ;   et al.
2009-10-22
Resist polymer and resist composition
Grant 7,575,846 - Momose , et al. August 18, 2
2009-08-18
Resist Polymer, Resist Composition, Process For Pattern Formation, And Starting Compounds For Production Of The Resist Polymer
App 20090198065 - Momose; Hikaru ;   et al.
2009-08-06
(Meth)acrylate, raw material alcohol for the (meth)acrylate, method of producing the (meth)acrylate and the alcohol, polymer produced by polymerizing the (meth)acrylate, chemically amplified resist composition, and method of the formation of a pattern
Grant 7,339,014 - Kamon , et al. March 4, 2
2008-03-04
Resist Polymer, Process For Production Thereof, Resist Composition, And Process For Production Of Substrated With Patterns Thereon
App 20080032241 - Momose; Hikaru ;   et al.
2008-02-07
5-methylene-1,3-dioxolan-4-one derivatives, process for their production, polymers of the derivatives, resist compositions, and pattern formation process
Grant 7,316,884 - Ansai , et al. January 8, 2
2008-01-08
Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer
App 20070190449 - Momose; Hikaru ;   et al.
2007-08-16
Resist polymer and resist composition
App 20060127801 - Momose; Hikaru ;   et al.
2006-06-15
(Meth)acrylate esters, starting alcohols for the preparation thereof, processes for preparing both, polymers of the esters, chemically amplifiable resist compositions, and method for forming patterns
Grant 7,041,838 - Kamon , et al. May 9, 2
2006-05-09
Resins for resists and chemically amplifiable resist compositions
Grant 6,927,011 - Fujiwara , et al. August 9, 2
2005-08-09
(Meth)acrylate, raw material alcohol for the (meth)acrylate, method of producing the (meth)acrylate and the alcohol, polymer produced by polymerizing the (meth)acrylate, chemically amplified resist composition, and method of the formation of a pattern
App 20050113538 - Kamon, Yoshihiro ;   et al.
2005-05-26
(Meth)acrylate esters, starting alcohols for the preparation thereof, processes for preparing both, polymers of the esters, chemically amplifiable resist compositions, and method for forming patterns
App 20040063882 - Kamon, Yoshihiro ;   et al.
2004-04-01
Resins for resists and chemically amplifiable resist compositions
App 20030148214 - Fujiwara, Tadayuki ;   et al.
2003-08-07

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