Molzen, Jr.; Walter W.
Patent Applications and Registrations
Patent applications and USPTO patent grants for Molzen, Jr.; Walter W..The latest application filed is for "method for correcting proximity effects in electron beam lithography".
- Molzen, Jr.; Walter W. - Holmes NY
- Molzen, Jr.; Walter W. - Patterson NY
| Patent | Date |
|---|---|
| Method for correcting proximity effects in electron beam lithography Grant 5,051,598 - Ashton , et al. September 24, 1 | 1991-09-24 |
| Inspection of unsintered single layer or multilayer ceramics using a broad area electrical contacting structure Grant 4,621,232 - Chang , et al. November 4, 1 | 1986-11-04 |
| Sub-100A range line width pattern fabrication Grant 4,316,093 - Broers , et al. February 16, 1 | 1982-02-16 |
| Sub 100A range line width pattern fabrication Grant 4,197,332 - Broers , et al. April 8, 1 | 1980-04-08 |
| Chemical sputtering purification process Grant 3,892,650 - Cuomo , et al. July 1, 1 | 1975-07-01 |
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