loadpatents
name:-0.016983985900879
name:-0.012856960296631
name:-0.0013430118560791
Mochiki; Hiromasa Patent Filings

Mochiki; Hiromasa

Patent Applications and Registrations

Patent applications and USPTO patent grants for Mochiki; Hiromasa.The latest application filed is for "method for manufacturing semiconductor device".

Company Profile
0.15.12
  • Mochiki; Hiromasa - Yamanashi JP
  • Mochiki; Hiromasa - Nirasaki N/A JP
  • MOCHIKI; Hiromasa - Tokyo JP
  • MOCHIKI; Hiromasa - Nirasaki City JP
  • Mochiki; Hiromasa - Kofu JP
  • Mochiki; Hiromasa - Nirasaki-shi JP
  • Mochiki; Hiromasa - Kofu-shi JP
  • Mochiki; Hiromasa - Kofu-City JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Etching processing method
Grant 9,496,150 - Mochiki , et al. November 15, 2
2016-11-15
Etching processing method
Grant 9,373,521 - Mochiki , et al. June 21, 2
2016-06-21
Shower plate and substrate processing apparatus
Grant 9,136,097 - Koshimizu , et al. September 15, 2
2015-09-15
Method For Manufacturing Semiconductor Device
App 20150194441 - YATSUDA; Koichi ;   et al.
2015-07-09
Etching Processing Method
App 20150170933 - MOCHIKI; Hiromasa ;   et al.
2015-06-18
Substrate processing method
Grant 8,685,267 - Yatsuda , et al. April 1, 2
2014-04-01
Plasma etching apparatus, plasma etching method and storage medium
Grant 8,641,916 - Yatsuda , et al. February 4, 2
2014-02-04
Plasma etching method, plasma etching apparatus and storage medium
Grant 8,383,001 - Mochiki , et al. February 26, 2
2013-02-26
Substrate Processing Method
App 20110318933 - Yatsuda; Koichi ;   et al.
2011-12-29
Etching Processing Method
App 20110244691 - MOCHIKI; Hiromasa ;   et al.
2011-10-06
Method and system for uniformity control in ballistic electron beam enhanced plasma processing system
Grant 7,829,469 - Chen , et al. November 9, 2
2010-11-09
Plasma Etching Method, Plasma Etching Apparatus And Storage Medium
App 20100213162 - Mochiki; Hiromasa ;   et al.
2010-08-26
Plasma Etching Apparatus, Plasma Etching Method And Storage Medium
App 20100190350 - YATSUDA; Koichi ;   et al.
2010-07-29
Gas setting method, gas setting apparatus, etching apparatus and substrate processing system
Grant 7,723,236 - Mochiki May 25, 2
2010-05-25
Method and system for etching a high-k dielectric material
Grant 7,709,397 - Chen , et al. May 4, 2
2010-05-04
Shower Plate And Substrate Processing Apparatus
App 20090120582 - Koshimizu; Chishio ;   et al.
2009-05-14
Method And System For Uniformity Control In Ballistic Electron Beam Enhanced Plasma Processing System
App 20080135518 - Chen; Lee ;   et al.
2008-06-12
Method and system for etching a film stack
Grant 7,172,969 - Xia , et al. February 6, 2
2007-02-06
Gas setting method, gas setting apparatus, etching apparatus and substrate processing system
App 20060157445 - Mochiki; Hiromasa
2006-07-20
Method and system for etching a gate stack
App 20060049139 - Xia; Annie ;   et al.
2006-03-09
Method and system for etching a film stack
App 20060051964 - Xia; Annie ;   et al.
2006-03-09
Method and system for etching a high-k dielectric material
App 20050164511 - Chen, Lee ;   et al.
2005-07-28

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