Mizuochi; Ryuta

Patent Applications and Registrations

Patent applications and USPTO patent grants for Mizuochi; Ryuta.The latest application filed is for "resist underlayer film-forming composition containing alicyclic compound-terminated polymer".

Company Profile

7.8.15

Mizuochi; Ryuta - Toyama JP
MIZUOCHI; Ryuta - Toyama-shi JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Underlayer film-forming composition for use in forming a microphase-separated pattern Grant 11,440,985 - Mizuochi , et al. September 13, 2	2022-09-13
Resist Underlayer Film-forming Composition Containing Alicyclic Compound-terminated Polymer App 20220187707 - WAKAYAMA; Hiroyuki ; et al.	2022-06-16
Chemical-resistant Protective Film-forming Composition Containing Polymerization Product Of Arylene Compound Having Glycidyl Group App 20210403635 - ENDO; Takafumi ; et al.	2021-12-30
Resist Underlayer Film-forming Composition And Method For Forming Resist Pattern Using The Same App 20210397090 - SHIMIZU; Shou ; et al.	2021-12-23
Composition For Forming Block Copolymer Layer For Formation Of Microphase-separated Pattern App 20210284782 - MIZUOCHI; Ryuta ; et al.	2021-09-16
Self-organized film-forming composition for use in forming a micro-phase-separated pattern Grant 10,995,172 - Mizuochi , et al. May 4, 2	2021-05-04
Film Forming Composition Containing Fluorine-containing Surfactant App 20210102088 - UMEZAKI; Makiko ; et al.	2021-04-08
Resist Underlayer Film Forming Composition Having A Disulfide Structure App 20210063881 - ENDO; Takafumi ; et al.	2021-03-04
Upper-layer film forming composition and method for producing a phase-separated pattern Grant 10,865,262 - Mizuochi , et al. December 15, 2	2020-12-15
Self-organized Film-forming Composition For Use In Forming A Micro-phase-separated Pattern App 20200123298 - MIZUOCHI; Ryuta ; et al.	2020-04-23
Underlayer Film-forming Composition For Use In Forming A Microphase-separated Pattern App 20190359749 - MIZUOCHI; Ryuta ; et al.	2019-11-28
Upper-layer Film Forming Composition And Method For Producing A Phase-separated Pattern App 20190233559 - MIZUOCHI; Ryuta ; et al.	2019-08-01
Electron beam resist underlayer film-forming composition containing lactone-structure-containing polymer Grant 10,289,002 - Sakaida , et al.	2019-05-14
Resist underlayer film-forming composition containing polymer which contains nitrogen-containing ring compound Grant 10,113,083 - Ohnishi , et al. October 30, 2	2018-10-30
Mask blank, method for manufacturing mask blank and transfer mask Grant 10,042,247 - Hiromatsu , et al. August 7, 2	2018-08-07
Mask Blank, Method For Manufacturing Mask Blank And Transfer Mask App 20170285460 - HIROMATSU; Takahiro ; et al.	2017-10-05
Mask blank and transfer mask Grant 9,746,764 - Hiromatsu , et al. August 29, 2	2017-08-29
Electron Beam Resist Underlayer Film-forming Composition Containing Lactone-structure-containing Polymer App 20160363863 - SAKAIDA; Yasushi ; et al.	2016-12-15
Film Forming Composition Containing Fluorine-containing Surfactant App 20160347965 - UMEZAKI; Makiko ; et al.	2016-12-01
Mask Blank And Transfer Mask App 20160274457 - HIROMATSU; Takahiro ; et al.	2016-09-22
Composition for forming antistatic film and oligomer compound Grant 9,394,231 - Nishita , et al. July 19, 2	2016-07-19
Resist Underlayer Film-forming Composition Containing Polymer Which Contains Nitrogen-containing Ring Compound App 20160186006 - OHNISHI; Ryuji ; et al.	2016-06-30
Composition For Forming Antistatic Film And Oligomer Compound App 20150008372 - Nishita; Tokio ; et al.	2015-01-08

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