Mizuno; Bunji
Patent Applications and Registrations
Patent applications and USPTO patent grants for Mizuno; Bunji.The latest application filed is for "plasma processing apparatus and plasma processing method".
Company Profile
0.70.93
- Mizuno; Bunji - Nara JP
- Mizuno; Bunji - Ikoma N/A JP
- MIZUNO; Bunji - Ikoma-shi JP
- Mizuno; Bunji - Osaka JP
- Mizuno; Bunji - Ikoma-city JP
Patent Activity
| Patent | Date |
|---|---|
| Plasma processing apparatus and plasma processing method Grant 9,502,220 - Okita , et al. November 22, 2 | 2016-11-22 |
| Plasma Processing Apparatus And Plasma Processing Method App 20160064196 - OKITA; Shogo ; et al. | 2016-03-03 |
| Plasma doping method and plasma doping apparatus Grant 8,709,926 - Okumura , et al. April 29, 2 | 2014-04-29 |
| Plasma doping method with gate shutter Grant 8,652,953 - Okumura , et al. February 18, 2 | 2014-02-18 |
| Plasma Doping Method And Apparatus App 20130337641 - OKUMURA; Tomohiro ; et al. | 2013-12-19 |
| Plasma Doping Method And Apparatus App 20130323916 - OKUMURA; Tomohiro ; et al. | 2013-12-05 |
| Method for producing a semiconductor device have fin-shaped semiconductor regions Grant 8,536,000 - Sasaki , et al. September 17, 2 | 2013-09-17 |
| Semiconductor Device App 20130175586 - SASAKI; Yuichiro ; et al. | 2013-07-11 |
| Semiconductor device and method for fabricating the same Grant 8,409,939 - Sasaki , et al. April 2, 2 | 2013-04-02 |
| Plasma processing method and apparatus Grant 8,404,573 - Okumura , et al. March 26, 2 | 2013-03-26 |
| Plasma Processing Method And Apparatus App 20130022759 - OKUMURA; Tomohiro ; et al. | 2013-01-24 |
| Plasma Doping Method With Gate Shutter App 20120285818 - OKUMURA; Tomohiro ; et al. | 2012-11-15 |
| Plasma processing method and apparatus Grant 8,288,259 - Okumura , et al. October 16, 2 | 2012-10-16 |
| Plasma doping device with gate shutter Grant 8,257,501 - Okumura , et al. September 4, 2 | 2012-09-04 |
| Semiconductor device Grant 8,258,585 - Sasaki , et al. September 4, 2 | 2012-09-04 |
| Plasma Doping Method And Apparatus App 20120186519 - Okumura; Tomohiro ; et al. | 2012-07-26 |
| Method for introducing impurities and apparatus for introducing impurities Grant 8,222,128 - Sasaki , et al. July 17, 2 | 2012-07-17 |
| Method for fabricating semiconductor device and plasma doping system Grant 8,193,080 - Sasaki , et al. June 5, 2 | 2012-06-05 |
| Semiconductor Device And Method For Fabricating The Same App 20120119295 - SASAKI; Yuichiro ; et al. | 2012-05-17 |
| Impurity introducing apparatus having feedback mechanism using optical characteristics of impurity introducing region Grant 8,138,582 - Jin , et al. March 20, 2 | 2012-03-20 |
| Plasma doping method and apparatus Grant 8,129,202 - Okumura , et al. March 6, 2 | 2012-03-06 |
| Semiconductor device and method for fabricating the same Grant 8,124,507 - Sasaki , et al. February 28, 2 | 2012-02-28 |
| Method for producing a semiconductor device by plasma doping a semiconductor region to form an impurity region Grant 8,105,926 - Sasaki , et al. January 31, 2 | 2012-01-31 |
| Semiconductor Device And Method For Producing The Same App 20120015504 - SASAKI; Yuichiro ; et al. | 2012-01-19 |
| Semiconductor device and method for producing the same Grant 8,063,437 - Sasaki , et al. November 22, 2 | 2011-11-22 |
| Method For Producing A Semiconductor Device Have Fin-shaped Semiconductor Regions App 20110275201 - SASAKI; Yuichiro ; et al. | 2011-11-10 |
| Semiconductor Device And Method For Fabricating The Same App 20110272763 - Sasaki; Yuichiro ; et al. | 2011-11-10 |
| Method for manufacturing semiconductor device Grant 8,030,187 - Sasaki , et al. October 4, 2 | 2011-10-04 |
| Method For Making Junction And Processed Material Formed Using The Same App 20110237056 - SASAKI; Yuichiro ; et al. | 2011-09-29 |
| Plasma Doping Method And Apparatus App 20110217830 - OKUMURA; Tomohiro ; et al. | 2011-09-08 |
| Method for manufacturing semiconductor device using plasma doping Grant 8,012,862 - Okashita , et al. September 6, 2 | 2011-09-06 |
| Semiconductor device and method for producing the same Grant 8,004,045 - Sasaki , et al. August 23, 2 | 2011-08-23 |
| Method for making junction and processed material formed using the same Grant 7,981,779 - Sasaki , et al. July 19, 2 | 2011-07-19 |
| Plasma doping apparatus and method, and method for manufacturing semiconductor device Grant 7,972,945 - Sasaki , et al. July 5, 2 | 2011-07-05 |
| Semiconductor Device And Method For Fabricating The Same App 20110147856 - Sasaki; Yuichiro ; et al. | 2011-06-23 |
| Semiconductor Device And Method For Fabricating The Same App 20110147813 - Sasaki; Yuichiro ; et al. | 2011-06-23 |
| Method For Fabricating Semiconductor Device And Plasma Doping System App 20110151652 - Sssaki; Yuichiro ; et al. | 2011-06-23 |
| Plasma doping method and plasma doping apparatus Grant 7,939,388 - Okumura , et al. May 10, 2 | 2011-05-10 |
| Process for fabricating semiconductor device Grant 7,932,185 - Kudo , et al. April 26, 2 | 2011-04-26 |
| Plasma Processing Method And Apparatus App 20110081787 - OKUMURA; Tomohiro ; et al. | 2011-04-07 |
| Method For Manufacturing Semiconductor Device App 20110065266 - Sasaki; Yuichiro ; et al. | 2011-03-17 |
| Plasma Doping Method and Plasma Doping Apparatus App 20110065267 - Okumura; Tomohiro ; et al. | 2011-03-17 |
| Beam current sensor Grant 7,888,937 - Watanabe , et al. February 15, 2 | 2011-02-15 |
| Plasma doping method and apparatus employed in the same Grant 7,871,853 - Sasaki , et al. January 18, 2 | 2011-01-18 |
| Plasma doping method and plasma doping apparatus Grant 7,863,168 - Okumura , et al. January 4, 2 | 2011-01-04 |
| Semiconductor Device And Method For Producing The Same App 20100330782 - SASAKI; Yuichiro ; et al. | 2010-12-30 |
| Plasma processing method and plasma processing apparatus Grant 7,858,155 - Okumura , et al. December 28, 2 | 2010-12-28 |
| Plasma processing method and apparatus Grant 7,858,537 - Okumura , et al. December 28, 2 | 2010-12-28 |
| Method and apparatus of fabricating semiconductor device Grant 7,858,479 - Mizuno , et al. December 28, 2 | 2010-12-28 |
| Plasma Doping Apparatus And Method, And Method For Manufacturing Semiconductor Device App 20100297836 - Sasaki; Yuichiro ; et al. | 2010-11-25 |
| Plasma doping processing device and method thereof Grant 7,820,230 - Nakamoto , et al. October 26, 2 | 2010-10-26 |
| Television and lifetime estimating method of a television Grant 7,813,946 - Mizuno , et al. October 12, 2 | 2010-10-12 |
| Method For Manufacturing Semiconductor Device App 20100255615 - Okashita; Katsumi ; et al. | 2010-10-07 |
| Semiconductor device and method for producing the same Grant 7,800,165 - Sasaki , et al. September 21, 2 | 2010-09-21 |
| Plasma doping method Grant 7,790,586 - Sasaki , et al. September 7, 2 | 2010-09-07 |
| Semiconductor Device App 20100207211 - Sasaki; Yuichiro ; et al. | 2010-08-19 |
| Method for forming impurity-introduced layer, method for cleaning object to be processed apparatus for introducing impurity and method for producing device Grant 7,759,254 - Sasaki , et al. July 20, 2 | 2010-07-20 |
| Method for producing semiconductor device and semiconductor producing apparatus Grant 7,754,503 - Sasaki , et al. July 13, 2 | 2010-07-13 |
| Method For Introducing Impurities And Apparatus For Introducing Impurities App 20100167508 - Sasaki; Yuichiro ; et al. | 2010-07-01 |
| Method for introducing impurities and apparatus for introducing impurities Grant 7,741,199 - Sasaki , et al. June 22, 2 | 2010-06-22 |
| Impurity Introducing Method Using Optical Characteristics To Determine Annealing Conditions App 20100148323 - Jin; Cheng-Guo ; et al. | 2010-06-17 |
| Method for introducing impurities and apparatus for introducing impurities Grant 7,709,362 - Sasaki , et al. May 4, 2 | 2010-05-04 |
| Plasma Doping Method And Apparatus App 20100098837 - OKUMURA; Tomohiro ; et al. | 2010-04-22 |
| Impurity introducing method using optical characteristics to determine annealing conditions Grant 7,700,382 - Jin , et al. April 20, 2 | 2010-04-20 |
| Method for introduction impurities and apparatus for introducing impurities Grant 7,696,072 - Sasaki , et al. April 13, 2 | 2010-04-13 |
| Method For Producing Semiconductor Device And Semiconductor Producing Apparatus App 20100075489 - Sasaki; Yuichiro ; et al. | 2010-03-25 |
| Method of impurity introduction, impurity introduction apparatus and semiconductor device produced with use of the method Grant 7,682,954 - Sasaki , et al. March 23, 2 | 2010-03-23 |
| Method For Manufacturing Semiconductor Device App 20100015788 - Sasaki; Yuichiro ; et al. | 2010-01-21 |
| Plasma Doping Method And Apparatus App 20100009469 - Kai; Takayuki ; et al. | 2010-01-14 |
| Plasma Doping Processing Device And Method Thereof App 20090317963 - Nakamoto; Keiichi ; et al. | 2009-12-24 |
| Impurity introducing apparatus and impurity introducing method Grant 7,626,184 - Mizuno , et al. December 1, 2 | 2009-12-01 |
| Semiconductor Device And Method For Producing The Same App 20090289300 - SASAKI; Yuichiro ; et al. | 2009-11-26 |
| Impurity introducing apparatus and impurity introducing method Grant 7,622,725 - Mizuno , et al. November 24, 2 | 2009-11-24 |
| Beam current measuring instrument and beam current measuring method using same Grant 7,619,223 - Sasaki , et al. November 17, 2 | 2009-11-17 |
| Method for introducing impurities and apparatus for introducing impurities Grant 7,618,883 - Sasaki , et al. November 17, 2 | 2009-11-17 |
| Plasma Doping Apparatus App 20090266298 - Okashita; Katsumi ; et al. | 2009-10-29 |
| Method and apparatus for plasma processing Grant 7,601,619 - Okumura , et al. October 13, 2 | 2009-10-13 |
| Plasma Doping Method and Apparatus App 20090233383 - Okumura; Tomohiro ; et al. | 2009-09-17 |
| Plasma Doping Method App 20090233427 - Sasaki; Yuichiro ; et al. | 2009-09-17 |
| Plasma Doping Method and Plasma Doping Apparatus App 20090233385 - Okumura; Tomohiro ; et al. | 2009-09-17 |
| Method of doping impurities, and electronic element using the same Grant 7,582,492 - Jin , et al. September 1, 2 | 2009-09-01 |
| Method of plasma doping Grant 7,575,987 - Okumura , et al. August 18, 2 | 2009-08-18 |
| Plasma Doping Method and Apparatus Employed in the Same App 20090186426 - Sasaki; Yuichiro ; et al. | 2009-07-23 |
| Plasma Doping Method and Apparatus App 20090181526 - Okumura; Tomohiro ; et al. | 2009-07-16 |
| Plasma Doping Method and Plasma Processing Device App 20090176355 - Okumura; Tomohiro ; et al. | 2009-07-09 |
| Charge neutralizing device Grant 7,557,364 - Ito , et al. July 7, 2 | 2009-07-07 |
| Method of introducing impurity, device and element Grant 7,547,619 - Sasaki , et al. June 16, 2 | 2009-06-16 |
| Impurity Introducing Apparatus and Impurity Introducing Method App 20090140174 - Mizuno; Bunji ; et al. | 2009-06-04 |
| Plasma Processing Apparatus, Plasma Processing Method, Dielectric Window Used Therein, And Manufacturing Method Of Such A Dielectric Window App 20090130335 - Okumura; Tomohiro ; et al. | 2009-05-21 |
| Beam measuring equipment and beam measuring method using the same Grant 7,535,220 - Sasaki , et al. May 19, 2 | 2009-05-19 |
| Asher, Ashing Method and Impurity Doping Apparatus App 20090104783 - Jin; Cheng-Guo ; et al. | 2009-04-23 |
| Method and Apparatus for Plasma Processing App 20090068769 - Okumura; Tomohiro ; et al. | 2009-03-12 |
| Apparatus And Method For Plasma Doping App 20090042321 - Sasaki; Yuichiro ; et al. | 2009-02-12 |
| Plasma Doping Method and Apparatus App 20090035878 - Sasaki; Yuichiro ; et al. | 2009-02-05 |
| Semiconductor Device And Method For Producing The Same App 20090026540 - Sasaki; Yuichiro ; et al. | 2009-01-29 |
| Method for fabricating semiconductor device App 20090023262 - Jin; Cheng-Guo ; et al. | 2009-01-22 |
| Plasma Doping Method App 20080318399 - SASAKI; Yuichiro ; et al. | 2008-12-25 |
| Semiconductor Device And Method For Producing The Same App 20080308871 - Sasaki; Yuichiro ; et al. | 2008-12-18 |
| Method for introducing impurities Grant 7,456,085 - Sasaki , et al. November 25, 2 | 2008-11-25 |
| Plasma Processing Method and Plasma Processing Apparatus App 20080258082 - Okumura; Tomohiro ; et al. | 2008-10-23 |
| Plasma Doping Method And Apparatus App 20080233723 - Okumura; Tomohiro ; et al. | 2008-09-25 |
| Liquid Phase Etching Method And Liquid Phase Etching Apparatus App 20080196834 - Mizuno; Bunji ; et al. | 2008-08-21 |
| Method of Introducing Impurity App 20080194086 - Sasaki; Yuichiro ; et al. | 2008-08-14 |
| Plasma doping method Grant 7,407,874 - Sasaki , et al. August 5, 2 | 2008-08-05 |
| Semiconductor Device And Method For Producing The Same App 20080179683 - SASAKI; Yuichiro ; et al. | 2008-07-31 |
| Impurity Introducing Method, Impurity Introducing Apparatus, and Electronic Device Produced by Using Those App 20080182348 - Jin; Cheng-Guo ; et al. | 2008-07-31 |
| Impurity Introducing Apparatus And Impurity Introducing Method App 20080166861 - Mizuno; Bunji ; et al. | 2008-07-10 |
| Method For Introducing Impurities And Apparatus For Introducing Impurities App 20080160728 - SASAKI; Yuichiro ; et al. | 2008-07-03 |
| Method of Impurity Introduction, Impurity Introduction Apparatus and Semiconductor Device Produced with Use of the Method App 20080142931 - Sasaki; Yuichiro ; et al. | 2008-06-19 |
| Method for Introducing Impurities App 20080146009 - Sasaki; Yuichiro ; et al. | 2008-06-19 |
| Method for making junction and processed material formed using the same App 20080135980 - Sasaki; Yuichiro ; et al. | 2008-06-12 |
| Method for introduction impurities and apparatus for introducing impurities App 20080124900 - Sasaki; Yuichiro ; et al. | 2008-05-29 |
| Liquid phase etching method and liquid phase etching apparatus Grant 7,378,031 - Mizuno , et al. May 27, 2 | 2008-05-27 |
| Ion-implanting apparatus, ion-implanting method, and device manufactured thereby Grant 7,365,346 - Sasaki , et al. April 29, 2 | 2008-04-29 |
| Plasma doping method and plasma doping apparatus Grant 7,358,511 - Sasaki , et al. April 15, 2 | 2008-04-15 |
| Plasma doping method Grant 7,348,264 - Sasaki , et al. March 25, 2 | 2008-03-25 |
| Plasma Doping Method And Plasma Doping Apparatus App 20080067439 - Sasaki; Yuichiro ; et al. | 2008-03-20 |
| Method of Doping Impurities, and Electronic Element Using the Same App 20080061292 - Jin; Cheng-Guo ; et al. | 2008-03-13 |
| Beam Measuring Equipment and Beam Measuring Method Using the Same App 20080024126 - Sasaki; Yuichiro ; et al. | 2008-01-31 |
| Method for introducing impurities and apparatus for introducing impurities App 20070254460 - Sasaki; Yuichiro ; et al. | 2007-11-01 |
| Charge Neutralizing Device App 20070228294 - Ito; Hiroyuki ; et al. | 2007-10-04 |
| Beam Current Sensor App 20070229057 - Watanabe; Tamaki ; et al. | 2007-10-04 |
| Method And Apparatus Of Fabricating Semiconductor Device App 20070212837 - Mizuno; Bunji ; et al. | 2007-09-13 |
| Plasma Doping Method App 20070190759 - Sasaki; Yuichiro ; et al. | 2007-08-16 |
| Plasma doping method and plasma doping apparatus App 20070176124 - Sasaki; Yuichiro ; et al. | 2007-08-02 |
| Plasma doping method App 20070166846 - Sasaki; Yuichiro ; et al. | 2007-07-19 |
| Plasma doping method and plasma doping apparatus App 20070111548 - Sasaki; Yuichiro ; et al. | 2007-05-17 |
| Method and apparatus for plasma doping App 20070074813 - Okumura; Tomohiro ; et al. | 2007-04-05 |
| Plasma processing method and apparatus Grant 7,199,064 - Okumura , et al. April 3, 2 | 2007-04-03 |
| Method of plasma doping Grant 7,192,854 - Sasaki , et al. March 20, 2 | 2007-03-20 |
| Method for making junction and processed material formed using the same App 20070042578 - Sasaki; Yuichiro ; et al. | 2007-02-22 |
| Apparatus for plasma doping App 20070037367 - Okumura; Tomohiro ; et al. | 2007-02-15 |
| Plasma Doping Method and Plasma Doping Apparatus App 20070026649 - Okumura; Tomohiro ; et al. | 2007-02-01 |
| Plasma processing method and apparatus App 20070020958 - Okumura; Tomohiro ; et al. | 2007-01-25 |
| Beam current measuring instrument and beam current measuring method using same App 20060237660 - Sasaki; Yuichiro ; et al. | 2006-10-26 |
| Process for fabricating semiconductor device App 20060183350 - Kudo; Toshio ; et al. | 2006-08-17 |
| Ion-implanting apparatus, ion-implanting method, and device manufactured thereby App 20060138353 - Sasaki; Yuichiro ; et al. | 2006-06-29 |
| Method of introducing impurity, device and element App 20060088989 - Sasaki; Yuichiro ; et al. | 2006-04-27 |
| Method and apparatus for liquid etching App 20060049140 - Mizuno; Bunji ; et al. | 2006-03-09 |
| Method of plasma doping App 20050287776 - Sasaki, Yuichiro ; et al. | 2005-12-29 |
| Method for introducing impurities and apparatus for introducing impurities App 20050277273 - Sasaki, Yuichiro ; et al. | 2005-12-15 |
| Plasma processing method and apparatus App 20050170669 - Okumura, Tomohiro ; et al. | 2005-08-04 |
| Method of manufacturing semiconductor device by sputter doping Grant 6,784,080 - Mizuno , et al. August 31, 2 | 2004-08-31 |
| Plasma doping method and plasma doping apparatus App 20040149219 - Okumura, Tomohiro ; et al. | 2004-08-05 |
| Apparatus for plasma doping App 20040045507 - Okumura, Tomohiro ; et al. | 2004-03-11 |
| Method and apparatus for plasma doping App 20040036038 - Okumura, Tomohiro ; et al. | 2004-02-26 |
| Method of manufacturing semiconductor devices by sputter-doping App 20030166328 - Mizuno, Bunji ; et al. | 2003-09-04 |
| Method for surface treatment and system for fabricating semiconductor device App 20030153101 - Takase, Michihiko ; et al. | 2003-08-14 |
| Commodity recycling method App 20030139981 - Mizuno, Bunji ; et al. | 2003-07-24 |
| Computer system for assisting the collection of gadgets and method for assisting the collection of gadgets using a computer system App 20020032577 - Yamamoto, Shinichi ; et al. | 2002-03-14 |
| Impurity Introducing Apparatus And Method App 20010037939 - NAKAOKA, HIROAKI ; et al. | 2001-11-08 |
| Ion implantation apparatus and fabrication method for semiconductor device Grant 6,037,599 - Takase , et al. March 14, 2 | 2000-03-14 |
| Method for fabricating a semiconductor device by high energy ion implantation while minimizing damage within the semiconductor substrate Grant 5,436,176 - Shimizu , et al. July 25, 1 | 1995-07-25 |
| Method of fabricating a semiconductor device having buried insulation layer separated by ditches Grant 4,997,786 - Kubota , et al. March 5, 1 | 1991-03-05 |
| Plasma doping process and apparatus therefor Grant 4,937,205 - Nakayama , et al. June 26, 1 | 1990-06-26 |
| Plasma doping method Grant 4,912,065 - Mizuno , et al. March 27, 1 | 1990-03-27 |
| Method for removing impurities existing in semiconductor substrate Grant 4,837,172 - Mizuno , et al. June 6, 1 | 1989-06-06 |
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