Mizohata; Yasuhiro

Patent Applications and Registrations

Patent applications and USPTO patent grants for Mizohata; Yasuhiro.The latest application filed is for "pressure sensor and substrate processing apparatus".

Company Profile

0.9.14

Mizohata; Yasuhiro - Kyoto JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Pressure Sensor And Substrate Processing Apparatus App 20080236291 - Yane; Takeshi ; et al.	2008-10-02
Pressure sensor and substrate processing apparatus Grant 7,409,864 - Yane , et al. August 12, 2	2008-08-12
Substrate processing apparatus and substrate processing method Grant 7,396,199 - Koyama , et al. July 8, 2	2008-07-08
Differential pressure flowmeter, flow controller, and apparatus for processing substrate Grant 7,337,677 - Mizohata March 4, 2	2008-03-04
Plating Apparatus, Cartridge And Copper Dissolution Tank For Use In The Plating Apparatus, And Plating Method App 20070235341 - Mizohata; Yasuhiro ; et al.	2007-10-11
Plating apparatus, cartridge and copper dissolution tank for use in the plating apparatus, and plating method Grant 7,279,079 - Mizohata , et al. October 9, 2	2007-10-09
Plating apparatus and plating method Grant 7,204,916 - Mizohata April 17, 2	2007-04-17
Plating Apparatus, Plating Cup And Cathode Ring App 20070080057 - MIZOHATA; Yasuhiro ; et al.	2007-04-12
Plating Apparatus, Plating Cup And Cathode Ring App 20070023277 - Mizohata; Yasuhiro ; et al.	2007-02-01
Plating apparatus, plating cup and cathode ring Grant 7,169,269 - Mizohata , et al. January 30, 2	2007-01-30
Pressure sensor and substrate processing apparatus App 20060260409 - Yane; Takeshi ; et al.	2006-11-23
Apparatus and method for supplying liquid and apparatus for processing substrate App 20060248934 - Mizohata; Yasuhiro	2006-11-09
Apparatus and method for supplying liquid and apparatus for processing substrate App 20060137419 - Mizohata; Yasuhiro	2006-06-29
Differential pressure flowmeter, flow controller, and apparatus for processing substrate App 20060112771 - Mizohata; Yasuhiro	2006-06-01
Plating apparatus and plating method Grant 6,958,113 - Mizohata , et al. October 25, 2	2005-10-25
Plating apparatus, plating cup and cathode ring App 20040140199 - Mizohata, Yasuhiro ; et al.	2004-07-22
Plating apparatus and plating method App 20040118676 - Mizohata, Yasuhiro ; et al.	2004-06-24
Plating apparatus and plating method App 20040084315 - Mizohata, Yasuhiro ; et al.	2004-05-06
Plating apparatus, cartridge and copper dissolution tank for use in the plating apparatus, and plating method App 20040069647 - Mizohata, Yasuhiro ; et al.	2004-04-15
Plating apparatus and plating method App 20040055890 - Mizohata, Yasuhiro	2004-03-25
Substrate processing apparatus and substrate processing method App 20030123971 - Koyama, Yoshihiro ; et al.	2003-07-03
Substrate cooling method and apparatus Grant 5,638,687 - Mizohata , et al. June 17, 1	1997-06-17
Substrate cooling device and substrate heat-treating apparatus Grant 5,411,076 - Matsunaga , et al. May 2, 1	1995-05-02

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