loadpatents
name:-0.048696041107178
name:-0.029201984405518
name:-0.0056228637695312
MIYOSHI; Hidenori Patent Filings

MIYOSHI; Hidenori

Patent Applications and Registrations

Patent applications and USPTO patent grants for MIYOSHI; Hidenori.The latest application filed is for "substrate processing method and substrate processing apparatus".

Company Profile
4.32.43
  • MIYOSHI; Hidenori - Nirasaki City JP
  • Miyoshi; Hidenori - Nirasaki JP
  • Miyoshi; Hidenori - Miyagi JP
  • MIYOSHI; Hidenori - Tokyo JP
  • MIYOSHI; Hidenori - Kurokawa-gun Miyagi
  • Miyoshi; Hidenori - Nirasaki-shi JP
  • Miyoshi; Hidenori - Yamanashi JP
  • Miyoshi, Hidenori - Tsukuba-shi JP
  • Miyoshi, Hidenori - Hosaka-cho Nirasaki-shi Yamanashi JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Substrate Processing Method And Substrate Processing Apparatus
App 20220108913 - NAITO; Hajime ;   et al.
2022-04-07
Etching method and etching apparatus
Grant 11,024,514 - Abe , et al. June 1, 2
2021-06-01
Method for etching copper layer
Grant 10,825,688 - Tahara , et al. November 3, 2
2020-11-03
Black Powder, And Method For Producing Same
App 20200180970 - MIYOSHI; Hidenori ;   et al.
2020-06-11
Etching Method And Etching Apparatus
App 20200035504 - ABE; Takuya ;   et al.
2020-01-30
Method For Etching Copper Layer
App 20190272997 - TAHARA; Shigeru ;   et al.
2019-09-05
Semiconductor Element Manufacturing Method
App 20160351398 - UEDA; Hirokazu ;   et al.
2016-12-01
Method for forming barrier film on wiring line
Grant 9,293,417 - Miyoshi , et al. March 22, 2
2016-03-22
Substrate processing apparatus
Grant 8,999,102 - Miyoshi , et al. April 7, 2
2015-04-07
Method For Forming Conductive Film
App 20150056381 - Hori; Masaru ;   et al.
2015-02-26
Film forming method, pretreatment device, and processing system
Grant 8,865,590 - Matsumoto , et al. October 21, 2
2014-10-21
Substrate Processing Apparatus
App 20140290857 - MIYOSHI; Hidenori ;   et al.
2014-10-02
Film forming method, semiconductor device, manufacturing method thereof and substrate processing apparatus therefor
Grant 8,785,311 - Miyoshi , et al. July 22, 2
2014-07-22
Device And Method For Forming Film
App 20140190409 - MATSUMOTO; Kenji ;   et al.
2014-07-10
Film forming method and film forming apparatus
Grant 8,765,221 - Miyoshi , et al. July 1, 2
2014-07-01
Processing System For Forming Film On Target Object
App 20140117551 - Miyoshi; Hidenori
2014-05-01
Method for forming a film
Grant 8,709,541 - Matsumoto , et al. April 29, 2
2014-04-29
Barrier layer, film forming method, and processing system
Grant 8,653,665 - Miyoshi February 18, 2
2014-02-18
Plasma Generation Device, Plasma Processing Apparatus And Plasma Processing Method
App 20140008326 - TOYODA; Hirotaka ;   et al.
2014-01-09
Plasma generating apparatus, plasma processing apparatus and plasma processing method
Grant 8,610,353 - Itoh , et al. December 17, 2
2013-12-17
Processing Apparatus And Method For Processing Metal Film
App 20130306597 - Gunji; Isao ;   et al.
2013-11-21
Film forming method and film forming apparatus
Grant 8,551,565 - Gunji , et al. October 8, 2
2013-10-08
Plasma process device and plasma process method
Grant 8,394,231 - Takatsuki , et al. March 12, 2
2013-03-12
Film Forming Method And Film Forming Apparatus
App 20130017328 - MIYOSHI; Hidenori ;   et al.
2013-01-17
Metal oxide film formation method and apparatus
Grant 8,354,337 - Matsumoto , et al. January 15, 2
2013-01-15
Semiconductor device manufacturing method and target substrate processing system
Grant 8,310,054 - Miyoshi , et al. November 13, 2
2012-11-13
Device And Method For Forming Film
App 20120251721 - Matsumoto; Kenji ;   et al.
2012-10-04
Film Forming Method, Pretreatment Device, And Processing System
App 20120135612 - Matsumoto; Kenji ;   et al.
2012-05-31
Film Forming Method
App 20120114869 - MIYOSHI; Hidenori ;   et al.
2012-05-10
Barrier Layer, Film Forming Method, And Processing System
App 20120091588 - Miyoshi; Hidenori
2012-04-19
Plasma Generating Apparatus, Plasma Processing Apparatus And Plasma Processing Method
App 20120068603 - ITOH; Hitoshi ;   et al.
2012-03-22
Method of substrate treatment, process for producing semiconductor device, substrate treating apparatus, and recording medium
Grant 8,138,095 - Miyoshi March 20, 2
2012-03-20
Film Forming Method, Semiconductor Device, Manufacturing Method Thereof And Substrate Processing Apparatus Therefor
App 20120064708 - MIYOSHI; Hidenori ;   et al.
2012-03-15
Heat treatment method, heat treatment apparatus and substrate processing apparatus
Grant 8,114,786 - Miyoshi February 14, 2
2012-02-14
Substrate Processing Method And Substrate Processing Apparatus
App 20120006782 - MIYOSHI; Hidenori
2012-01-12
Semiconductor Device Manufacturing Method And Target Substrate Processing System
App 20110265950 - MIYOSHI; Hidenori ;   et al.
2011-11-03
Film formation method and apparatus
Grant 8,029,856 - Miyoshi , et al. October 4, 2
2011-10-04
Semiconductor device manufacturing method and target substrate processing system
Grant 8,003,535 - Miyoshi , et al. August 23, 2
2011-08-23
Metal Oxide Film Formation Method And Apparatus
App 20100323512 - Matsumoto; Kenji ;   et al.
2010-12-23
Film Forming Method And Film Forming Apparatus
App 20100316799 - Gunji; Isao ;   et al.
2010-12-16
Insulation film forming method, insulation film forming system, and semiconductor device manufacturing method
Grant 7,772,130 - Miyoshi , et al. August 10, 2
2010-08-10
Substrate Mounting Table, Substrate Processing Apparatus And Method For Treating Surface Of Substrate Mounting Table
App 20100108108 - Hayashi; Kazuichi ;   et al.
2010-05-06
Substrate processing method and apparatus fabrication process of a semiconductor device
Grant 7,709,394 - Miyoshi , et al. May 4, 2
2010-05-04
Method For Manufacturing Semiconductor Device And Storage Medium
App 20100029086 - Miyoshi; Hidenori ;   et al.
2010-02-04
Heat Treatment Method And Heat Treatment Apparatus
App 20090325393 - Miyoshi; Hidenori ;   et al.
2009-12-31
Cvd Film Forming Method And Cvd Film Forming Apparatus
App 20090324827 - Miyoshi; Hidenori
2009-12-31
Method for Preparing Modified Porous Silica Films, Modified Porous Silica Films Prepared According to This Method and Semiconductor Devices Fabricated Using the Modified Porous Silica Films
App 20090206453 - Fujii; Nobutoshi ;   et al.
2009-08-20
Substrate Processing Method And Apparatus, Method For Manufacturing Semiconductor Device And Storage Medium
App 20090204252 - MIYOSHI; Hidenori ;   et al.
2009-08-13
Semiconductor device manufacturing apparatus and operating method thereof
Grant 7,556,711 - Miyoshi July 7, 2
2009-07-07
Heat Treatment Method, Heat Treatment Apparatus And Substrate Processing Apparatus
App 20090163038 - Miyoshi; Hidenori
2009-06-25
Method Of Substrate Treatment, Process For Producing Semiconductor Device, Substrate Treating Apparatus, And Recording Medium
App 20090087995 - Miyoshi; Hidenori
2009-04-02
Method Of Substrate Treatment, Process For Producing Semiconductor Device, Substrate Treating Apparatus, And Recording Medium
App 20090075475 - Miyoshi; Hidenori
2009-03-19
Copper Re-deposition Preventing Method, Semiconductor Device Manufacturing Method, And Substrate Processing Apparatus
App 20090042397 - MIYOSHI; Hidenori
2009-02-12
Semiconductor Device Manufacturing Method And Target Substrate Processing System
App 20090042384 - Miyoshi; Hidenori ;   et al.
2009-02-12
Method For Manufacturing Semiconductor Device, Semiconductor Manufacturing Apparatus And Storage Medium For Executing The Method
App 20080213998 - Nagai; Hiroyuki ;   et al.
2008-09-04
Film Formation Method And Apparatus
App 20080000416 - Miyoshi; Hidenori ;   et al.
2008-01-03
Insulation Film Forming Method, Insulation Film Forming System, And Semiconductor Device Manufacturing Method
App 20070275568 - Miyoshi; Hidenori ;   et al.
2007-11-29
Material and method for forming low-dielectric-constant film
Grant 7,279,434 - Hata , et al. October 9, 2
2007-10-09
Substrate Processing Method And Apparatus Fabrication Process Of A Semiconductor Device
App 20070224725 - MIYOSHI; Hidenori ;   et al.
2007-09-27
Plasma process device and plasma process method
App 20070131171 - Takatsuki; Koichi ;   et al.
2007-06-14
Semiconductor device manufacturing apparatus and operating method thereof
App 20060289297 - Miyoshi; Hidenori
2006-12-28
Material and method for forming low-dielectric-constant film
App 20050287818 - Hata, Nobuhiro ;   et al.
2005-12-29
Method and apparatus for forming film
App 20040253777 - Miyoshi, Hidenori ;   et al.
2004-12-16
Plasma processing device and plasma processing method
App 20040127033 - Takatsuki, Koichi ;   et al.
2004-07-01

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