loadpatents
name:-0.010913133621216
name:-0.0060360431671143
name:-0.0022218227386475
Miyahara; Junya Patent Filings

Miyahara; Junya

Patent Applications and Registrations

Patent applications and USPTO patent grants for Miyahara; Junya.The latest application filed is for "tungsten film forming method and storage medium".

Company Profile
1.4.7
  • Miyahara; Junya - Nirasaki JP
  • Miyahara; Junya - Yamanashi JP
  • MIYAHARA; Junya - Nirasaki City JP
  • Miyahara; Junya - Amagasaki-shi JP
  • Miyahara; Junya - Amagasaki JP
  • Miyahara; Junya - Hyogo JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Tungsten film forming method and storage medium
Grant 10,400,330 - Suzuki , et al. Sep
2019-09-03
Method of controlling threshold of transistor and method of manufacturing semiconductor device
Grant 10,153,169 - Shiraga , et al. Dec
2018-12-11
Method for manufacturing insulating film laminated structure
Grant 9,887,081 - Miyahara , et al. February 6, 2
2018-02-06
Tungsten Film Forming Method And Storage Medium
App 20170283942 - SUZUKI; Kenji ;   et al.
2017-10-05
Method Of Controlling Threshold Of Transistor And Method Of Manufacturing Semiconductor Device
App 20170221716 - SHIRAGA; Kentaro ;   et al.
2017-08-03
Method For Manufacturing Insulating Film Laminated Structure
App 20170170010 - MIYAHARA; Junya ;   et al.
2017-06-15
Silicon Dioxide Film And Process For Production Thereof, Computer-readable Storage Medium, And Plasma Cvd Device
App 20120126376 - Honda; Minoru ;   et al.
2012-05-24
Forming a silicon nitride film by plasma CVD
Grant 8,119,545 - Honda , et al. February 21, 2
2012-02-21
Silicon Oxide Film, Method For Forming Silicon Oxide Film, And Plasma Cvd Apparatus
App 20110206590 - Honda; Minoru ;   et al.
2011-08-25
Silicon Oxynitride Film And Process For Production Thereof, Computer-readable Storage Medium, And Plasma Cvd Device
App 20110189862 - Honda; Minoru ;   et al.
2011-08-04
Process For Producing Silicon Nitride Film, Process For Producing Silicon Nitride Film Laminate, Computer-readable Storage Medium, And Plasma Cvd Device
App 20110086517 - Honda; Minoru ;   et al.
2011-04-14

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