| Patent | Date |
|---|
Light Source Device, Cooling Method, And Manufacturing Method For Product
App 20220178533 - Miura; Takao ; et al. | 2022-06-09 |
Apparatus, Method, And Program For Monitoring Operation Of High Frequency Resistance Welding And Induction Heating Welding Of El
App 20200038929 - HASEGAWA; Noboru ; et al. | 2020-02-06 |
Electric resistance welding operation management device, electric resistance welding operation management method, and computer program
Grant 9,446,473 - Hasegawa , et al. September 20, 2 | 2016-09-20 |
Split valve
Grant 9,416,882 - Miura August 16, 2 | 2016-08-16 |
Conveying apparatus
Grant 9,327,908 - Miura May 3, 2 | 2016-05-03 |
Operation management device, operation management method, and operation management program for high-frequency resistance welding and induction welding
Grant 9,199,291 - Hasegawa , et al. December 1, 2 | 2015-12-01 |
Electric Resistance Welding Operation Management Device, Electric Resistance Welding Operation Management Method, And Computer Program
App 20150090697 - Hasegawa; Noboru ; et al. | 2015-04-02 |
Split Valve
App 20150053881 - MIURA; Takao | 2015-02-26 |
Conveying Apparatus
App 20150041286 - MIURA; Takao | 2015-02-12 |
Operation Management Device, Operation Management Method, And Operation Management Program For High-frequency Resistance Welding And Induction Welding
App 20120325805 - Hasegawa; Noboru ; et al. | 2012-12-27 |
Process for manufacturing semiconductor devices separated by an air-bridge
Grant 5,705,425 - Miura , et al. January 6, 1 | 1998-01-06 |
Radiation sensitive resin composition
Grant 5,609,988 - Miyamoto , et al. March 11, 1 | 1997-03-11 |
Chemically amplified resist
Grant 5,580,695 - Murata , et al. December 3, 1 | 1996-12-03 |
Reflection preventing film and process for forming resist pattern using the same
Grant 5,525,457 - Nemoto , et al. June 11, 1 | 1996-06-11 |
Radiation sensitive resin composition
Grant 5,494,777 - Shiraki , et al. February 27, 1 | 1996-02-27 |
Radiation-sensitive composition
Grant 5,482,816 - Murata , et al. * January 9, 1 | 1996-01-09 |
Reflection preventing film and process for forming resist pattern using the same
Grant 5,410,005 - Nemoto , et al. April 25, 1 | 1995-04-25 |
Negative type radiation-sensitive resin composition
Grant 5,376,498 - Kajita , et al. December 27, 1 | 1994-12-27 |
Semiconductor wafer and process for producing same
Grant 5,233,218 - Miura August 3, 1 | 1993-08-03 |
Semiconductor device having trench isolation
Grant 5,148,247 - Miura , et al. September 15, 1 | 1992-09-15 |
I-line radiation-sensitive alkali-soluble resin composition utilizing 1,2-quinone diazide compound and hydroxy-chalcone additive
Grant 5,110,706 - Yumoto , et al. May 5, 1 | 1992-05-05 |
Semiconductor device using SOI substrate
Grant 5,017,998 - Miura , et al. May 21, 1 | 1991-05-21 |
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