MITAN; Martin M.

Patent Applications and Registrations

Patent applications and USPTO patent grants for MITAN; Martin M..The latest application filed is for "plasma nitridation for gate oxide scaling of ge and sige transistors".

Company Profile

3.4.9

MITAN; Martin M. - Beaverton OR
Mitan; Martin M. - Hillsboro OR

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Plasma Nitridation For Gate Oxide Scaling Of Ge And Sige Transistors App 20210408239 - CHOUKSEY; Siddharth ; et al.	2021-12-30
Selective Gate Spacers For Semiconductor Devices App 20210143265 - Clendenning; Scott B. ; et al.	2021-05-13
Fabrication of multi-channel nanowire devices with self-aligned internal spacers and SOI FinFETs using selective silicon nitride capping Grant 10,998,423 - Le , et al. May 4, 2	2021-05-04
Selective gate spacers for semiconductor devices Grant 10,971,600 - Clendenning , et al. April 6, 2	2021-04-06
Self-aligned Gate Endcap (sage) Architectures Without Fin End Gap App 20210091075 - LIAO; Szuya S. ; et al.	2021-03-25
Channel Formation For Three Dimensional Transistors App 20200411697 - KU; Chieh-Jen ; et al.	2020-12-31
Fabrication Of Multi-channel Nanowire Devices With Self-aligned Internal Spacers And Soi Finfets Using Selective Silicon Nitride App 20200287022 - LE; Van H. ; et al.	2020-09-10
Fabrication of multi-channel nanowire devices with self-aligned internal spacers and SOI FinFETs using selective silicon nitride capping Grant 10,720,508 - Le , et al.	2020-07-21
Selective Gate Spacers For Semiconductor Devices App 20200020786 - Clendenning; Scott B. ; et al.	2020-01-16
Selective gate spacers for semiconductor devices Grant 10,396,176 - Clendenning , et al. A	2019-08-27
Fabrication Of Multi-channel Nanowire Devices With Self-aligned Internal Spacers And Soi Finfets Using Selective Silicon Nitride Capping App 20180226490 - LE; Van H. ; et al.	2018-08-09
Selective Gate Spacers For Semiconductor Devices App 20180219080 - CLENDENNING; Scott B. ; et al.	2018-08-02
Bottom-up Fill (buf) Of Metal Features For Semiconductor Structures App 20180130707 - CLENDENNING; Scott B. ; et al.	2018-05-10

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