loadpatents
name:-0.03144907951355
name:-0.020276069641113
name:-0.00054502487182617
Mise; Nobuyuki Patent Filings

Mise; Nobuyuki

Patent Applications and Registrations

Patent applications and USPTO patent grants for Mise; Nobuyuki.The latest application filed is for "fuel battery cell, fuel battery system, leak detection method".

Company Profile
0.19.21
  • Mise; Nobuyuki - Tokyo JP
  • Mise; Nobuyuki - Kanagawa N/A JP
  • Mise; Nobuyuki - Tsukuba JP
  • Mise; Nobuyuki - Kokubunji N/A JP
  • Mise; Nobuyuki - Tsukuba-shi JP
  • Mise; Nobuyuki - Niihari JP
  • Mise; Nobuyuki - Chiyoda JP
  • Mise, Nobuyuki - Tsuchiura JP
  • Mise; Nobuyuki - Chiyodacho-inayoshi JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Fuel cell
Grant 11,417,892 - Sakuma , et al. August 16, 2
2022-08-16
Fuel Battery Cell, Fuel Battery System, Leak Detection Method
App 20220181658 - DEGAWA; Munenori ;   et al.
2022-06-09
Fuel Cell
App 20210408556 - SAKUMA; Noriyuki ;   et al.
2021-12-30
CMOS semiconductor device and method for manufacturing the same
Grant 8,698,249 - Mise , et al. April 15, 2
2014-04-15
Method of manufacturing semiconductor device, and semiconductor device
Grant 8,466,053 - Matsuki , et al. June 18, 2
2013-06-18
Method of manufacturing semiconductor device and substrate processing system
Grant 8,404,603 - Ogawa , et al. March 26, 2
2013-03-26
Cmos Semiconductor Device And Method For Manufacturing The Same
App 20130034953 - Mise; Nobuyuki ;   et al.
2013-02-07
Method of manufacturing semiconductor device and semiconductor device
Grant 8,288,221 - Eimori , et al. October 16, 2
2012-10-16
Method Of Manufacturing Semiconductor Device, And Semiconductor Device
App 20110241087 - MATSUKI; Takeo ;   et al.
2011-10-06
Semiconductor device and manufacturing method of the semiconductor device
Grant 7,968,396 - Watanabe , et al. June 28, 2
2011-06-28
Method of nickel disilicide formation and method of nickel disilicate source/drain formation
Grant 7,947,560 - Watanabe , et al. May 24, 2
2011-05-24
Method Of Manufacturing Semiconductor Device And Substrate Processing System
App 20110003482 - Ogawa; Arito ;   et al.
2011-01-06
Manufacturing method of semiconductor device
Grant 7,863,127 - Mise , et al. January 4, 2
2011-01-04
Cmos Semiconductor Device And Method For Manufacturing The Same
App 20100258878 - Mise; Nobuyuki ;   et al.
2010-10-14
Semiconductor device and manufacturing method of the semiconductor device
App 20100072551 - Watanabe; Yukimune ;   et al.
2010-03-25
Metal insulator semiconductor transistor using a gate insulator including a high dielectric constant film
Grant 7,671,426 - Mise , et al. March 2, 2
2010-03-02
Method Of Manufacturing Semiconductor Device And Semiconductor Device
App 20100038729 - EIMORI; Takahisa ;   et al.
2010-02-18
Semiconductor device and manufacturing method of the semiconductor device
Grant 7,645,655 - Watanabe , et al. January 12, 2
2010-01-12
Manufacturing Method Of Semiconductor Device
App 20090291538 - MISE; Nobuyuki ;   et al.
2009-11-26
Semiconductor device and manufacturing method thereof
App 20090173998 - Mise; Nobuyuki ;   et al.
2009-07-09
Semiconductor device and manufacturing method thereof
Grant 7,507,632 - Mise , et al. March 24, 2
2009-03-24
Semiconductor device and manufacturing method thereof
App 20080083956 - Mise; Nobuyuki ;   et al.
2008-04-10
Semiconductor device and manufacturing method of the same
App 20080067590 - Mise; Nobuyuki ;   et al.
2008-03-20
Method for forming silicide and method for fabricating semiconductor device
App 20070202692 - Watanabe; Yukimune ;   et al.
2007-08-30
Semiconductor device and manufacturing method of the semiconductor device
App 20060284220 - Watanabe; Yukimune ;   et al.
2006-12-21
Semiconductor device and manufacturing method of the semiconductor device
App 20060281273 - Watanabe; Yukimune ;   et al.
2006-12-14
Process monitoring methods in a plasma processing apparatus, monitoring units, and a sample processing method using the monitoring units
App 20060000800 - Usui; Tatehito ;   et al.
2006-01-05
Process monitoring methods in a plasma processing apparatus, monitoring units, and a sample processing method using the monitoring units
Grant 6,967,109 - Usui , et al. November 22, 2
2005-11-22
Etching method of hardly-etched material and semiconductor fabricating method and apparatus using the method
Grant 6,835,665 - Mise , et al. December 28, 2
2004-12-28
Process monitoring methods in a plasma processing apparatus, monitoring units, and a sample processing method using the monitoring units
App 20040235310 - Usui, Tatehito ;   et al.
2004-11-25
Process monitoring methods in a plasma processing apparatus, monitoring units, and a sample processing method using the monitoring units
Grant 6,759,253 - Usui , et al. July 6, 2
2004-07-06
Ion current density measuring method and instrument, and semiconductor device manufacturing method
App 20040092044 - Mise, Nobuyuki ;   et al.
2004-05-13
Ion current density measuring method and instrument, and semiconductor device manufacturing method
Grant 6,656,752 - Mise , et al. December 2, 2
2003-12-02
Etching method of hardly-etched material and semiconductor fabricating method and apparatus using the method
App 20030170998 - Mise, Nobuyuki ;   et al.
2003-09-11
Process monitoring methods in a plasma processing apparatus, monitoring units, and a sample processing method using the monitoring units
App 20010014520 - Usui, Tatehito ;   et al.
2001-08-16
Plasma treatment method and apparatus
Grant 5,242,539 - Kumihashi , et al. September 7, 1
1993-09-07

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.

© 2024 USPTO.report | Privacy Policy | Resources | RSS Feed of Trademarks | Trademark Filings Twitter Feed