Mintz; Donald M.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Mintz; Donald M..The latest application filed is for "ultrasonic enhancement for solvent purge of a liquid delivery system".

Company Profile

0.15.0

Mintz; Donald M. - Sunnyvale CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Ultrasonic enhancement for solvent purge of a liquid delivery system Grant 6,418,960 - Mintz , et al. July 16, 2	2002-07-16
Embossed semiconductor fabrication parts Grant 6,162,297 - Mintz , et al. December 19, 2	2000-12-19
High frequency semiconductor wafer processing apparatus and method Grant 5,849,136 - Mintz , et al. December 15, 1	1998-12-15
Lid and door for a vacuum chamber and pretreatment therefor Grant 5,762,748 - Banholzer , et al. June 9, 1	1998-06-09
High-frequency semiconductor wafer processing apparatus and method Grant 5,618,382 - Mintz , et al. April 8, 1	1997-04-08
Lid and door for a vacuum chamber and pretreatment therefor Grant 5,565,058 - Banholzer , et al. October 15, 1	1996-10-15
Lid and door for a vacuum chamber and pretreatment therefor Grant 5,401,319 - Banholzer , et al. March 28, 1	1995-03-28
Method for preparing a shield to reduce particles in a physical vapor deposition chamber Grant 5,391,275 - Mintz February 21, 1	1995-02-21
High-frequency semiconductor wafer processing method using a negative self-bias Grant 5,223,457 - Mintz , et al. June 29, 1	1993-06-29
Method for preparing a shield to reduce particles in a physical vapor deposition chamber Grant 5,202,008 - Talieh , et al. April 13, 1	1993-04-13
Apparatus for manufacturing planarized aluminum films Grant 4,865,712 - Mintz * September 12, 1	1989-09-12
Apparatus and method for manufacturing planarized aluminum films Grant 4,661,228 - Mintz April 28, 1	1987-04-28
Targets for magnetron sputter device having separate confining magnetic fields to separate targets subject to separate discharges Grant 4,657,654 - Mintz * April 14, 1	1987-04-14
Magnetron sputter device having separate confining magnetic fields to separate targets and magnetically enhanced R.F. bias Grant 4,627,904 - Mintz December 9, 1	1986-12-09
Apparatus for and the method of controlling magnetron sputter device having separate confining magnetic fields to separate targets subject to separate discharges Grant 4,595,482 - Mintz June 17, 1	1986-06-17

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