Minamide; Ayumi

Patent Applications and Registrations

Patent applications and USPTO patent grants for Minamide; Ayumi.The latest application filed is for "manufacturing method of photomask, method for optical proximity correction, and manufacturing method of semiconductor device".

Company Profile

0.10.5

Minamide; Ayumi - Kanagawa JP
Minamide; Ayumi - Tokyo JP
Minamide, Ayumi - Hyogo JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Manufacturing method of photomask, method for optical proximity correction, and manufacturing method of semiconductor device Grant 8,835,083 - Minamide , et al. September 16, 2	2014-09-16
Manufacturing Method Of Photomask, Method For Optical Proximity Correction, And Manufacturing Method Of Semiconductor Device App 20140030657 - MINAMIDE; Ayumi ; et al.	2014-01-30
Manufacturing method of photomask, method for optical proximity correction, and manufacturing method of semiconductor device Grant 8,563,200 - Minamide , et al. October 22, 2	2013-10-22
Photomask, manufacturing apparatus and method of semiconductor device using the same, and photomask feature layout method Grant 8,426,087 - Minamide , et al. April 23, 2	2013-04-23
Manufacturing Method Of Photomask, Method For Optical Proximity Correction, And Manufacturing Method Of Semiconductor Device App 20120183891 - MINAMIDE; Ayumi ; et al.	2012-07-19
Photomask, Manufacturing Apparatus And Method Of Semiconductor Device Using The Same, And Photomask Feature Layout Method App 20120052419 - MINAMIDE; Ayumi ; et al.	2012-03-01
Photomask, apparatus for manufacturing semiconductor device having the photomask, and method of manufacturing semiconductor device using the photomask Grant 8,119,308 - Minamide , et al. February 21, 2	2012-02-21
Photomask, Apparatus For Manufacturing Semiconductor Device Having The Photomask, And Method Of Manufacturing Semiconductor Device Using The Photomask App 20090239159 - MINAMIDE; Ayumi ; et al.	2009-09-24
Manufacturing method for semiconductor device App 20030203618 - Minamide, Ayumi ; et al.	2003-10-30
Material for forming a fine pattern and method for manufacturing a semiconductor device using the same Grant 6,579,657 - Ishibashi , et al. June 17, 2	2003-06-17
Registration accuracy measurement mark, method of repairing defect of the mark, photomask having the mark, method of manufacturing the photo mask and method of exposure thereof Grant 6,323,560 - Narimatsu , et al. November 27, 2	2001-11-27
Registration accuracy measurement mark, method of repairing defect of the mark, photomask having the mark, method of manufacturing the photomask and method of exposure thereof Grant 6,068,952 - Narimatsu , et al. May 30, 2	2000-05-30
Semiconductor device and method for manufacturing the same Grant 5,858,620 - Ishibashi , et al. January 12, 1	1999-01-12

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