MIMURA; Hidekazu

Patent Applications and Registrations

Patent applications and USPTO patent grants for MIMURA; Hidekazu.The latest application filed is for "local polishing method, local polishing device, and corrective polishing apparatus using the local polishing device".

Company Profile

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MIMURA; Hidekazu - Tokyo JP
Mimura; Hidekazu - Suita JP
Mimura; Hidekazu - Osaka JP
Mimura; Hidekazu - Takatsuki JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Local Polishing Method, Local Polishing Device, And Corrective Polishing Apparatus Using The Local Polishing Device App 20210331283 - MIMURA; Hidekazu ; et al.	2021-10-28
Optical design method for X-ray focusing system using rotating mirror, and X-ray focusing system Grant 9,892,811 - Motoyama , et al. February 13, 2	2018-02-13
Optical Design Method For X-ray Focusing System Using Rotating Mirror, And X-ray Focusing System App 20160163409 - MOTOYAMA; Hiroto ; et al.	2016-06-09
Method and apparatus of precisely measuring intensity profile of X-ray nanobeam Grant 8,744,046 - Yamauchi , et al. June 3, 2	2014-06-03
Method And Apparatus Of Precisely Measuring Intensity Profile Of X-ray Nanobeam App 20110305317 - Yamauchi; Kazuto ; et al.	2011-12-15
High precision posture control method of X-ray mirror Grant 8,000,443 - Yamauchi , et al. August 16, 2	2011-08-16
X-ray condensing method and its device using phase restoration method Grant 7,936,860 - Yamauchi , et al. May 3, 2	2011-05-03
X-ray Condensing Method And Its Device Using Phase Restoration Method App 20100183122 - Yamauchi; Kazuto ; et al.	2010-07-22
High Precision Posture Control Method Of X-ray Mirror App 20100002838 - Yamauchi; Kazuto ; et al.	2010-01-07
Ultra precision profile measuring method Grant 7,616,324 - Yamauchi , et al. November 10, 2	2009-11-10
Ultra Precision Profile Measuring Method App 20090135431 - Yamauchi; Kazuto ; et al.	2009-05-28

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