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Original Plate And Method Of Manufacturing The Same
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Pattern Forming Method, Photomask Substrate Creation Method, Photomask Creation Method, And Photomask
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Pattern Data Generation Method, Pattern Data Generation Device, And Pattern Data Generation Program
App 20150261904 - KOBAYASHI; Sachiko ; et al. | 2015-09-17 |
Sub-resolution assist feature arranging method and computer program product and manufacturing method of semiconductor device
Grant 8,809,072 - Kodama , et al. August 19, 2 | 2014-08-19 |
Simulation model creating method, computer program product, and method of manufacturing a semiconductor device
Grant 8,381,138 - Matsunawa , et al. February 19, 2 | 2013-02-19 |
Simulation Model Creating Method, Computer Program Product, And Method Of Manufacturing A Semiconductor Device
App 20120324407 - MATSUNAWA; Tetsuaki ; et al. | 2012-12-20 |
Simulation method and simulation program
Grant 8,230,369 - Mimotogi , et al. July 24, 2 | 2012-07-24 |
Lithography process window analyzing method and analyzing program
Grant 8,154,710 - Mimotogi , et al. April 10, 2 | 2012-04-10 |
Projection exposure method
Grant 8,077,292 - Kitamura , et al. December 13, 2 | 2011-12-13 |
Sub-resolution Assist Feature Arranging Method And Computer Program Product And Manufacturing Method Of Semiconductor Device
App 20110294239 - KODAMA; Chikaaki ; et al. | 2011-12-01 |
Simulation model creating method, mask data creating method and semiconductor device manufacturing method
Grant 8,055,366 - Mimotogi , et al. November 8, 2 | 2011-11-08 |
Evaluating Apparatus, Evaluating Method, And Computer Program Product
App 20110224934 - Miyoshi; Seiro ; et al. | 2011-09-15 |
Method of evaluating a photo mask and method of manufacturing a semiconductor device
Grant 7,912,275 - Yamamoto , et al. March 22, 2 | 2011-03-22 |
Creating method of simulation model, manufacturing method of photo mask, manufacturing method of semiconductor device, and recording medium
Grant 7,840,390 - Satake , et al. November 23, 2 | 2010-11-23 |
Mask pattern preparation method, semiconductor device manufacturing method and recording medium
Grant 7,793,252 - Kotani , et al. September 7, 2 | 2010-09-07 |
Pattern-correction Supporting Method, Method Of Manufacturing Semiconductor Device And Pattern-correction Supporting Program
App 20100167190 - TAKAHATA; Kazuhiro ; et al. | 2010-07-01 |
Photomask quality estimation system and method for use in manufacturing of semiconductor device, and method for manufacturing the semiconductor device
App 20100112812 - Arisawa; Yukiyasu ; et al. | 2010-05-06 |
Mask data correction method, photomask manufacturing method, computer program, optical image prediction method, resist pattern shape prediction method, and semiconductor device manufacturing method
Grant 7,685,556 - Fukuhara , et al. March 23, 2 | 2010-03-23 |
Photomask quality estimation system and method for use in manufacturing of semiconductor device, and method for manufacturing the semiconductor device
Grant 7,636,910 - Arisawa , et al. December 22, 2 | 2009-12-22 |
Projection Exposure Method
App 20090244504 - Kitamura; Yosuke ; et al. | 2009-10-01 |
Lithography Process Window Analyzing Method And Analyzing Program
App 20090244512 - Mimotogi; Shoji ; et al. | 2009-10-01 |
Light intensity distribution simulation method and computer program product
Grant 7,596,776 - Tanaka , et al. September 29, 2 | 2009-09-29 |
Simulation Model Creating Method, Mask Data Creating Method And Semiconductor Device Manufacturing Method
App 20090240362 - Mimotogi; Shoji ; et al. | 2009-09-24 |
Simulation Method And Simulation Program
App 20090217233 - Mimotogi; Akiko ; et al. | 2009-08-27 |
Exposure method, exposure quantity calculating system using the exposure method and semiconductor device manufacturing method using the exposure method
Grant 7,575,835 - Sato , et al. August 18, 2 | 2009-08-18 |
Method Of Evaluating A Photo Mask And Method Of Manufacturing A Semiconductor Device
App 20090202924 - YAMAMOTO; Hiroki ; et al. | 2009-08-13 |
Mask pattern data producing method, patterning method, reticle correcting method, reticle manufacturing method, and semiconductor apparatus manufacturing method
Grant 7,560,197 - Nakamura , et al. July 14, 2 | 2009-07-14 |
Lithography simulation method, mask pattern preparation method, semiconductor device manufacturing method and recording medium
App 20090019418 - Kotani; Toshiya ; et al. | 2009-01-15 |
Projection exposure mask acceptance decision system, projection exposure mask acceptance decision method, method for manufacturing semiconductor device, and computer program project
Grant 7,446,852 - Arisawa , et al. November 4, 2 | 2008-11-04 |
Lithography simulation method and recording medium
Grant 7,426,712 - Kotani , et al. September 16, 2 | 2008-09-16 |
Simulator of lithography tool for correcting focus error and critical dimension, simulation method for correcting focus error and critical dimension, and computer medium for storing computer program for simulator
Grant 7,336,341 - Mimotogi , et al. February 26, 2 | 2008-02-26 |
Method for a predicting a pattern shape by using an actual measured dissolution rate of a photosensitive resist
Grant 7,319,944 - Nakamura , et al. January 15, 2 | 2008-01-15 |
Creating method of simulation model, manufacturing method of photo mask, manufacturing method of semiconductor device, and recording medium
App 20080004852 - Satake; Masaki ; et al. | 2008-01-03 |
Light intensity distribution simulation method and computer program product
App 20070234269 - Tanaka; Satoshi ; et al. | 2007-10-04 |
Projection exposure mask acceptance decision system, projection exposure mask acceptance decision method, method for manufacturing semiconductor device, and computer program product
App 20070182941 - Arisawa; Yukiyasu ; et al. | 2007-08-09 |
Exposure method for correcting a focal point, and a method for manufacturing a semiconductor device
Grant 7,248,349 - Sato , et al. July 24, 2 | 2007-07-24 |
Method for evaluating photo mask and method for manufacturing semiconductor device
Grant 7,229,721 - Mimotogi , et al. June 12, 2 | 2007-06-12 |
Lithography simulation method, mask pattern preparation method, semiconductor device manufacturing method and recording medium
App 20070019058 - Kotani; Toshiya ; et al. | 2007-01-25 |
Photomask quality estimation system and method for use in manufacturing of semiconductor device, and method for manufacturing the semiconductor device
App 20070005280 - Arisawa; Yukiyasu ; et al. | 2007-01-04 |
Exposure method, exposure quantity calculating system using the exposure method and semiconductor device manufacturing method using the exposure method
App 20060292460 - Sato; Takashi ; et al. | 2006-12-28 |
Exposure method, exposure quantity calculating system using the exposure method and semiconductor device manufacturing method using the exposure method
Grant 7,118,834 - Sato , et al. October 10, 2 | 2006-10-10 |
Method of manufacturing a photo mask and method of manufacturing a semiconductor device
Grant 7,090,949 - Nojima , et al. August 15, 2 | 2006-08-15 |
Exposure analyzing system, method for analyzing exposure condition, and method for manufacturing semiconductor device
App 20060172207 - Asaba; Megumi ; et al. | 2006-08-03 |
Pattern designing method, photomask manufacturing method, resist pattern forming method and semiconductor device manufacturing method
App 20060073425 - Miyazaki; Maki ; et al. | 2006-04-06 |
Exposure method for correcting a focal point, and a method for manufacturing a semiconductor device
App 20060061756 - Sato; Takashi ; et al. | 2006-03-23 |
Method for evaluating lithography process margins
Grant 6,988,016 - Mimotogi January 17, 2 | 2006-01-17 |
Exposure system and method for manufacturing semiconductor device
App 20060001846 - Kono; Takuya ; et al. | 2006-01-05 |
Method for inspecting exposure apparatus, exposure method for correcting focal point, and method for manufacturing semiconductor device
Grant 6,967,719 - Sato , et al. November 22, 2 | 2005-11-22 |
Mask pattern data producing method, patterning method, reticle correcting method, reticle manufacturing method, and semiconductor apparatus manufacturing method
App 20050196684 - Nakamura, Hiroko ; et al. | 2005-09-08 |
Mask data correction method, photomask manufacturing method, computer program, optical image prediction method, resist pattern shape prediction method, and semiconductor device manufacturing method
App 20050188341 - Fukuhara, Kazuya ; et al. | 2005-08-25 |
Simulator of lithography tool, simulation method, and computer program product for simulator
App 20050183056 - Mimotogi, Shoji ; et al. | 2005-08-18 |
Critical pattern extracting method, critical pattern extracting program, and method of manufacturing semiconductor device
App 20050166172 - Kawamura, Daisuke ; et al. | 2005-07-28 |
Method of forming contact hole and method of manufacturing semiconductor device
App 20050153540 - Mimotogi, Shoji ; et al. | 2005-07-14 |
Pattern designing method, photomask manufacturing method, resist pattern forming method and semiconductor device manufacturing method
App 20050058914 - Miyazaki, Maki ; et al. | 2005-03-17 |
Exposure method, exposure quantity calculating system using the exposure method and semiconductor device manufacturing method using the exposure method
App 20040253553 - Sato, Takashi ; et al. | 2004-12-16 |
Computer implemented method for development profile simulation, computer program product for controlling a computer system so as to simulate development profile, and computer implemented method for mask pattern data correction
App 20040236548 - Nakamura, Hiroko ; et al. | 2004-11-25 |
Method of manufacturing a photo mask and method of manufacturing a semiconductor device
App 20040146788 - Nojima, Shigeki ; et al. | 2004-07-29 |
Method for evaluating photo mask and method for manufacturing semiconductor device
App 20040137340 - Mimotogi, Shoji ; et al. | 2004-07-15 |
Method for evaluating lithography process margins
App 20040123267 - Mimotogi, Shoji | 2004-06-24 |
Method of manufacturing photomask
Grant 6,649,310 - Itoh , et al. November 18, 2 | 2003-11-18 |
Resist pattern forming method
Grant 6,632,592 - Mimotogi October 14, 2 | 2003-10-14 |
Method for inspecting exposure apparatus, exposure method for correcting focal point, and method for manufacturing semiconductor device
App 20030117627 - Sato, Takashi ; et al. | 2003-06-26 |
Method of manufacturing photomask
App 20020025480 - Itoh, Masamitsu ; et al. | 2002-02-28 |
Profile simulation method
Grant 5,889,686 - Mimotogi , et al. March 30, 1 | 1999-03-30 |
Profile simulation method and pattern design method
Grant 5,745,388 - Mimotogi , et al. April 28, 1 | 1998-04-28 |
Photomask, exposing method using photomask, and manufacturing method of photomask
Grant 5,733,687 - Tanaka , et al. March 31, 1 | 1998-03-31 |
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