Mikami; Masaki

Patent Applications and Registrations

Patent applications and USPTO patent grants for Mikami; Masaki.The latest application filed is for "method for manufacturing multilayer film-deposited substrate and multilayer film-deposited substrate".

Company Profile

1.20.16

Mikami; Masaki - Tokyo JP
Mikami; Masaki - Chiyoda-ku JP
Mikami, Masaki - Sendai-Shi JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method for manufacturing multilayer film-deposited substrate and multilayer film-deposited substrate Grant 10,775,692 - Ishikawa , et al. Sept	2020-09-15
Method For Manufacturing Multilayer Film-deposited Substrate And Multilayer Film-deposited Substrate App 20180059530 - Ishikawa; Yunosuke ; et al.	2018-03-01
Reflective mask blank for EUV lithography and process for its production, as well as substrate with reflective layer for such mask blank and process for its production Grant 9,720,316 - Mikami August 1, 2	2017-08-01
Reflective mask blank for EUV lithography, or reflective layer-coated substrate for EUV lithography, and process for its production Grant 9,448,469 - Mikami September 20, 2	2016-09-20
Reflective mask blank for EUV lithography and process for its production Grant 9,423,684 - Maeshige , et al. August 23, 2	2016-08-23
Reflective Mask Blank For Euv Lithography And Process For Its Production, As Well As Substrate With Reflective Layer For Such Mask Blank And Process For Its Production App 20160109792 - MIKAMI; Masaki	2016-04-21
Reflective mask blank for EUV lithography, and process for its production Grant 9,207,529 - Kinoshita , et al. December 8, 2	2015-12-08
Reflective Mask Blank For Euv Lithography, Or Reflective Layer-coated Substrate For Euv Lithography, And Process For Its Production App 20150160548 - Mikami; Masaki	2015-06-11
Reflective mask blank for EUV lithography and process for its production, as well as substrate with reflective layer for such mask blank and process for its production Grant 9,052,601 - Mikami June 9, 2	2015-06-09
Reflective layer-equipped substrate for EUV lithography, reflective mask blank for EUV lithography, reflective mask for EUV lithography, and process for production of the reflective layer-equipped substrate Grant 8,993,201 - Mikami , et al. March 31, 2	2015-03-31
Optical member for EUV lithography Grant 8,986,910 - Mikami March 24, 2	2015-03-24
Optical member for EUV lithography, and process for production of reflective layer-equipped substrate Grant 8,927,179 - Mikami January 6, 2	2015-01-06
Substrate with reflective layer for EUV lithography and reflective mask blank for EUV lithography Grant 8,828,626 - Mikami , et al. September 9, 2	2014-09-09
Reflective Mask Blank For Euv Lithography And Process For Its Production App 20140212794 - MAESHIGE; Kazunobu ; et al.	2014-07-31
Reflective Mask Blank For Euv Lithography, And Process For Its Production App 20140186752 - KINOSHITA; Takeru ; et al.	2014-07-03
Reflective Mask Blank For Euv Lithography And Process For Its Production, As Well As Substrate With Reflective Layer For Such Mask Blank And Process For Its Production App 20140017601 - MIKAMI; Masaki	2014-01-16
Multilayer mirror for EUV lithography and process for its production Grant 8,580,465 - Mikami , et al. November 12, 2	2013-11-12
Substrate With Reflective Layer For Euv Lithography And Reflective Mask Blank For Euv Lithography App 20130115547 - Mikami; Masaki ; et al.	2013-05-09
Reflective Layer-equipped Substrate For Euv Lithography, Reflective Mask Blank For Euv Lithography, Reflective Mask For Euv Lithography, And Process For Production Of The Reflective Layer-equipped Substrate App 20120231378 - Mikami; Masaki ; et al.	2012-09-13
Optical Member For Euv Lithography App 20120225375 - MIKAMI; Masaki	2012-09-06
Optical Member For Euv Lithography, And Process For Production Of Reflective Layer-equipped Substrate App 20120219890 - MIKAMI; Masaki	2012-08-30
Multilayer Mirror For Euv Lithography And Process For Its Production App 20120196208 - MIKAMI; Masaki ; et al.	2012-08-02
Reflective mask blank for EUV lithography Grant 8,088,538 - Hayashi , et al. January 3, 2	2012-01-03
Reflective mask blank for EUV lithography Grant 7,906,259 - Hayashi , et al. March 15, 2	2011-03-15
Reflective mask blank for EUV lithography and substrate with functional film for the same Grant 7,833,682 - Hayashi , et al. November 16, 2	2010-11-16
Reflective mask blank for EUV lithography and substrate with a conductive film for the mask blank Grant 7,736,821 - Hayashi , et al. June 15, 2	2010-06-15
Reflective Mask Blank For Euv Lithography App 20100035165 - HAYASHI; KAZUYUKI ; et al.	2010-02-11
Reflective Mask Blank For Euv Lithography App 20090011341 - Hayashi; Kazuyuki ; et al.	2009-01-08
Reflective Mask Blank For Euv Lithography And Substrate With Functional Film For The Same App 20080318140 - Hayashi; Kazuyuki ; et al.	2008-12-25
Reflective Mask Blank For Euv Lithography And Substrate With A Conductive Film For The Mask Blank App 20070160874 - Hayashi; Kazuyuki ; et al.	2007-07-12
Notification information display apparatus notification information display system and recording medium Grant 6,678,866 - Sugimoto , et al. January 13, 2	2004-01-13
Magnetic recording medium and production method thereof and magenetic recording device App 20020146594 - Takahashi, Migaku ; et al.	2002-10-10

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