Mieher; Walter

Patent Applications and Registrations

Patent applications and USPTO patent grants for Mieher; Walter.The latest application filed is for "method and system for determining in-plane distortions in a substrate".

Company Profile

0.5.7

Mieher; Walter - Los Gatos CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method and system for determining in-plane distortions in a substrate Grant 10,024,654 - Smith , et al. July 17, 2	2018-07-17
Optical metrology with reduced sensitivity to grating anomalies Grant 9,470,639 - Zhuang , et al. October 18, 2	2016-10-18
Method and System for Determining In-Plane Distortions in a Substrate App 20160290789 - Smith; Mark D. ; et al.	2016-10-06
Systems and Methods for Determining One or More Characteristics of a Specimen Using Radiation in the Terahertz Range App 20120281275 - Levy; Ady ; et al.	2012-11-08
Parametric profiling using optical spectroscopic systems Grant 7,826,071 - Shchegrov , et al. November 2, 2	2010-11-02
Systems And Methods For Determining One Or More Characteristics Of A Specimen Using Radiation In The Terahertz Range App 20100235114 - Levy; Ady ; et al.	2010-09-16
Parametric Profiling Using Optical Spectroscopic Systems App 20090135416 - Shchegrov; Andrei V. ; et al.	2009-05-28
Method For Determining Lithographic Focus And Exposure App 20080192221 - Mieher; Walter ; et al.	2008-08-14
Method for determining lithographic focus and exposure Grant 7,382,447 - Mieher , et al. June 3, 2	2008-06-03
Parametric profiling using optical spectroscopic systems Grant 7,280,230 - Shchegrov , et al. October 9, 2	2007-10-09
Parametric profiling using optical spectroscopic systems App 20040070772 - Shchegrov, Andrei V. ; et al.	2004-04-15
Method for determining lithographic focus and exposure App 20030048458 - Mieher, Walter ; et al.	2003-03-13

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