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Patent applications and USPTO patent grants for Meul; Hans-Willi.The latest application filed is for "method for manufacturing a laterally limited, single-crystal region on a substrate and the employment thereof for the manufacture of an mos transistor and a bipolar transistor".
Patent | Date |
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Method for manufacturing a laterally limited, single-crystal region on a substrate and the employment thereof for the manufacture of an MOS transistor and a bipolar transistor Grant 5,498,567 - Klose , et al. March 12, 1 | 1996-03-12 |
Method for manufacturing a laterally limited, single-crystal region on a substrate and the employment thereof for the manufacture of an MOS transistor and a bipolar transistor Grant 5,422,303 - Klose , et al. June 6, 1 | 1995-06-06 |
Method for manufacturing a laterally limited, single-crystal region on a substrate and the employment thereof for the manufacture of an MOS transistor and a bipolar transistor Grant 5,326,718 - Klose , et al. July 5, 1 | 1994-07-05 |
Method for manufacturing an electrically conductive tip composed of a doped semiconductor material Grant 5,188,977 - Stengl , et al. February 23, 1 | 1993-02-23 |
Method for manufacturing a fully self-adjusted bipolar transistor Grant 4,829,015 - Schaber , et al. May 9, 1 | 1989-05-09 |
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