METZNER; Craig R.

Patent Applications and Registrations

Patent applications and USPTO patent grants for METZNER; Craig R..The latest application filed is for "apparatus for the deposition of high dielectric constant films".

Company Profile

0.15.19

METZNER; Craig R. - Fremont CA
Metzner; Craig R. - Simi Valley CA US

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Apparatus For The Deposition Of High Dielectric Constant Films App 20130333621 - RONSSE; Bobby M. ; et al.	2013-12-19
Apparatus for the deposition of high dielectric constant films Grant 8,496,780 - Ronsse , et al. July 30, 2	2013-07-30
Advanced FI blade for high temperature extraction Grant 8,382,180 - Kanawade , et al. February 26, 2	2013-02-26
Apparatuses for atomic layer deposition Grant 8,343,279 - Myo , et al. January 1, 2	2013-01-01
Methods for atomic layer deposition of hafnium-containing high-K dielectric materials Grant 8,282,992 - Myo , et al. October 9, 2	2012-10-09
Surface pre-treatment for enhancement of nucleation of high dielectric constant materials Grant 8,071,167 - Kher , et al. December 6, 2	2011-12-06
Surface Pre-treatment For Enhancement Of Nucleation Of High Dielectric Constant Materials App 20100239758 - Kher; Shreyas S. ; et al.	2010-09-23
Gas manifolds for use during epitaxial film formation Grant 7,674,337 - Ishikawa , et al. March 9, 2	2010-03-09
ALD metal oxide deposition process using direct oxidation Grant 7,569,500 - Metzner , et al. August 4, 2	2009-08-04
ALD metal oxide deposition process using direct oxidation Grant 7,569,501 - Metzner , et al. August 4, 2	2009-08-04
System and method for forming a gate dielectric Grant 7,531,468 - Metzner , et al. May 12, 2	2009-05-12
Advanced Fi Blade For High Temperature Extraction App 20090110520 - Kanawade; Dinesh ; et al.	2009-04-30
Modular Cvd Epi 300mm Reactor App 20080072820 - Burrows; Brian H. ; et al.	2008-03-27
System And Method For Forming A Gate Dielectric App 20080057737 - METZNER; CRAIG R. ; et al.	2008-03-06
Methods For Atomic Layer Deposition Of Hafnium-containing High-k Dielectric Materials App 20080044569 - Myo; Nyi Oo ; et al.	2008-02-21
System and method for forming a gate dielectric Grant 7,304,004 - Metzner , et al. December 4, 2	2007-12-04
Gas Manifolds For Use During Epitaxial Film Formation App 20070259112 - Ishikawa; David ; et al.	2007-11-08
Ald Metal Oxide Deposition Process Using Direct Oxidation App 20070059948 - Metzner; Craig R. ; et al.	2007-03-15
Surface Pre-treatment For Enhancement Of Nucleation Of High Dielectric Constant Materials App 20060264067 - Kher; Shreyas S. ; et al.	2006-11-23
Ald Metal Oxide Deposition Process Using Direct Oxidation App 20060223339 - Metzner; Craig R. ; et al.	2006-10-05
Apparatus for the deposition of high dielectric constant films App 20060196421 - Ronsse; Bobby M. ; et al.	2006-09-07
ALD metal oxide deposition process using direct oxidation Grant 7,067,439 - Metzner , et al. June 27, 2	2006-06-27
Apparatuses and methods for atomic layer deposition of hafnium-containing high-k dielectric materials App 20050271812 - Myo, Nyi Oo ; et al.	2005-12-08
System and method for forming a gate dielectric Grant 6,858,547 - Metzner , et al. February 22, 2	2005-02-22
System and method for forming a gate dielectric App 20050009371 - Metzner, Craig R. ; et al.	2005-01-13
Surface pre-treatment for enhancement of nucleation of high dielectric constant materials App 20030232501 - Kher, Shreyas S. ; et al.	2003-12-18
ALD metal oxide deposition process using direct oxidation App 20030232511 - Metzner, Craig R. ; et al.	2003-12-18
System and method for forming a gate dielectric App 20030232506 - Metzner, Craig R. ; et al.	2003-12-18
Apparatus for the deposition of high dielectric constant films App 20030101938 - Ronsse, Bobby M. ; et al.	2003-06-05
Deposition reactor having vaporizing, mixing and cleaning capabilities App 20020192370 - Metzner, Craig R. ; et al.	2002-12-19
Deposition reactor having vaporizing, mixing and cleaning capabilities Grant 6,454,860 - Metzner , et al. September 24, 2	2002-09-24
Deposition Reactor Having Vaporizing, Mixing And Cleaning Capabilities App 20010035127 - METZNER, CRAIG R. ; et al.	2001-11-01

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