Meng; Xiangguo
Patent Applications and Registrations
Patent applications and USPTO patent grants for Meng; Xiangguo.The latest application filed is for "manufacturing method for integrating gate dielectric layers of different thicknesses".
- Meng; Xiangguo - Shanghai CN
- Meng; Xiangguo - Suzhou CN
Trademarks
| Patent | Date |
|---|---|
| Manufacturing Method For Integrating Gate Dielectric Layers Of Different Thicknesses App 20220139711 - LU; Lian ; et al. | 2022-05-05 |
| Car Grant D920,161 - Li , et al. May 25, 2 | 2021-05-25 |
| Methods and systems for using oxidation layers to improve device surface uniformity Grant 9,449,866 - Li , et al. September 20, 2 | 2016-09-20 |
| METHODS AND SYSTEMS FOR IMPROVED UNIFORMITY OF SiGe THICKNESS App 20160218005 - Li; Quanbo ; et al. | 2016-07-28 |
| Methods and systems for improved uniformity of SiGe thickness Grant 9,390,915 - Li , et al. July 12, 2 | 2016-07-12 |
| Methods And Systems For Using Oxidation Layers To Improve Device Surface Uniformity App 20150270127 - Li; Quanbo ; et al. | 2015-09-24 |
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