Menezes; Marlon E.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Menezes; Marlon E..The latest application filed is for "low temperature process for depositing a high extinction coefficient non-peeling optical absorber for a scanning laser surface anneal of implanted dopants".

Company Profile

0.5.5

Menezes; Marlon E. - Mountain View CA

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Patent Activity

Patent	Date
Low temperature process for depositing a high extinction coefficient non-peeling optical absorber for a scanning laser surface anneal of implanted dopants Grant 8,338,316 - Parihar , et al. December 25, 2	2012-12-25
Low Temperature Process For Depositing A High Extinction Coefficient Non-peeling Optical Absorber For A Scanning Laser Surface Anneal Of Implanted Dopants App 20110223773 - Parihar; Vijay ; et al.	2011-09-15
Low temperature process for depositing a high extinction coefficient non-peeling optical absorber for a scanning laser surface anneal of implanted dopants Grant 7,968,473 - Parihar , et al. June 28, 2	2011-06-28
Post deposition plasma treatment to increase tensile stress of HDP-CVD SIO.sub.2 Grant 7,745,351 - Chen , et al. June 29, 2	2010-06-29
Dynamic surface annealing of implanted dopants with low temperature HDPCVD process for depositing a high extinction coefficient optical absorber layer Grant 7,588,990 - Parihar , et al. September 15, 2	2009-09-15
Post Deposition Plasma Treatment To Increase Tensile Stress Of Hdp-cvd Sio2 App 20090035918 - Chen; Xiaolin ; et al.	2009-02-05
Post deposition plasma treatment to increase tensile stress of HDP-CVD SIO.sub.2 Grant 7,465,680 - Chen , et al. December 16, 2	2008-12-16
Low Temperature Process For Depositing A High Extinction Coefficient Non-peeling Optical Absorber For A Scanning Laser Surface Anneal Of Implanted Dopants App 20080108210 - Parihar; Vijay ; et al.	2008-05-08
Dynamic Surface Annealing Of Implanted Dopants With Low Temperature Hdpcvd Process For Depositing A High Extinction Coefficient Optical Absorber Layer App 20080057681 - Parihar; Vijay ; et al.	2008-03-06
Post deposition plasma treatment to increase tensile stress of HDP-CVD SIO2 App 20070054504 - Chen; Xiaolin ; et al.	2007-03-08

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