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Lithographic apparatus and device manufacturing method having liquid evaporation control Grant 7,804,575 - Cadee , et al. September 28, 2 | 2010-09-28 |
Method and arrangement for predicting thermally-induced deformation of a substrate, and a semiconductor device Grant 7,710,539 - Menchtchikov , et al. May 4, 2 | 2010-05-04 |
Method and arrangement for correcting thermally-induced field deformations of a lithographically exposed substrate Grant 7,710,538 - Menchtchikov , et al. May 4, 2 | 2010-05-04 |
Optimized correction of wafer thermal deformations in a lithographic process Grant 7,595,496 - Ottens , et al. September 29, 2 | 2009-09-29 |
Method And Arrangement For Correcting Thermally-induced Field Deformations Of A Lithographically Exposed Substrate App 20090055114 - MENCHTCHIKOV; Boris ;   et al. | 2009-02-26 |
Method And Arrangement For Predicting Thermally-induced Deformation Of A Substrate, And A Semiconductor Device App 20090055115 - MENCHTCHIKOV; Boris ;   et al. | 2009-02-26 |
Method and arrangement for predicting thermally-induced deformation of a substrate, and a semiconductor device Grant 7,462,430 - Menchtchikov , et al. December 9, 2 | 2008-12-09 |
Method and arrangement for correcting thermally-induced field deformations of a lithographically exposed substrate Grant 7,462,429 - Menchtchikov , et al. December 9, 2 | 2008-12-09 |
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Method of calibrating a lithographic apparatus and device manufacturing method Grant 7,426,011 - Zaal , et al. September 16, 2 | 2008-09-16 |
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Lithographic apparatus and device manufacturing method Grant 7,304,715 - Cadee , et al. December 4, 2 | 2007-12-04 |
Optimized correction of water thermal deformations in a lithographic process App 20070257209 - Ottens; Joost Jeroen ;   et al. | 2007-11-08 |
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