| Patent | Date |
|---|
Unifying realtime and static data for presenting over a web service
Grant 10,516,767 - Singhee , et al. Dec | 2019-12-24 |
Interactive learning
Grant 10,169,716 - Gaucher , et al. J | 2019-01-01 |
System and method for interpreting interpersonal communication
Grant 10,095,918 - Gil , et al. October 9, 2 | 2018-10-09 |
Method and program product for designing source and mask for lithography
Grant 9,857,676 - Inoue , et al. January 2, 2 | 2018-01-02 |
System And Method For Interpreting Interpersonal Communication
App 20170323153 - GIL; Dario ; et al. | 2017-11-09 |
Unifying Realtime And Static Data For Presenting Over A Web Service
App 20170302764 - Singhee; Amith ; et al. | 2017-10-19 |
System and method for interpreting interpersonal communication
Grant 9,760,766 - Gil , et al. September 12, 2 | 2017-09-12 |
Interactive learning
Grant 9,665,831 - Gaucher , et al. May 30, 2 | 2017-05-30 |
Source, target and mask optimization by incorporating contour based assessments and integration over process variations
Grant 9,651,856 - Inoue , et al. May 16, 2 | 2017-05-16 |
System And Method For Interpreting Interpersonal Communication
App 20170004356 - GIL; DARIO ; et al. | 2017-01-05 |
Detecting The Mood Of A Group
App 20160328987 - Gil; Dario ; et al. | 2016-11-10 |
Detecting The Mood Of A Group
App 20160328988 - Gil; Dario ; et al. | 2016-11-10 |
Synthesizing low mask error enhancement factor lithography solutions
Grant 9,395,622 - Inoue , et al. July 19, 2 | 2016-07-19 |
Interactive Learning
App 20160117603 - Gaucher; Brian P. ; et al. | 2016-04-28 |
Interactive Learning
App 20160117601 - Gaucher; Brian P. ; et al. | 2016-04-28 |
Source, Target And Mask Optimization By Incorporating Contour Based Assessments And Integration Over Process Variations
App 20160109795 - INOUE; TADANOBU ; et al. | 2016-04-21 |
Method And Program Product For Designing Source And Mask For Lithography
App 20160103389 - Inoue; Tadanobu ; et al. | 2016-04-14 |
Source, target and mask optimization by incorporating countour based assessments and integration over process variations
Grant 9,250,535 - Inoue , et al. February 2, 2 | 2016-02-02 |
Synthesizing Low Mask Error Enhancement Factor Lithography Solutions
App 20150234970 - Inoue; Tadanobu ; et al. | 2015-08-20 |
Mask design method, program, and mask design system
Grant 8,959,462 - Inoue , et al. February 17, 2 | 2015-02-17 |
Source-mask optimization for a lithography process
Grant 8,954,898 - Inoue , et al. February 10, 2 | 2015-02-10 |
Source, Target And Mask Optimization By Incorporating Countour Based Assessments And Integration Over Process Variations
App 20140268075 - Inoue; Tadanobu ; et al. | 2014-09-18 |
Source-mask Optimization For A Lithography Process
App 20140282291 - Inoue; Tadanobu ; et al. | 2014-09-18 |
Mask Design Method, Program, And Mask Design System
App 20130263063 - Inoue; Tadanobu ; et al. | 2013-10-03 |
System and method for projection lithography with immersed image-aligned diffractive element
Grant 8,537,444 - Gil , et al. September 17, 2 | 2013-09-17 |
Determining manufacturability of lithographic mask based on manufacturing shape penalty of aspect ratio of edge that takes into account pair of connected edges of the edge
Grant 8,539,390 - Inoue , et al. September 17, 2 | 2013-09-17 |
Method for generating a plurality of optimized wavefronts for a multiple exposure lithographic process
Grant 8,495,528 - Bagheri , et al. July 23, 2 | 2013-07-23 |
Wavefront engineering of mask data for semiconductor device design
Grant 8,453,076 - Inoue , et al. May 28, 2 | 2013-05-28 |
System And Method For Projection Lithography With Immersed Image-aligned Diffractive Element
App 20130071774 - Gil; Dario ; et al. | 2013-03-21 |
Method for optimizing source and mask to control line width roughness and image log slope
Grant 8,372,565 - Tian , et al. February 12, 2 | 2013-02-12 |
Method to match exposure tools using a programmable illuminator
Grant 8,351,037 - Azpiroz , et al. January 8, 2 | 2013-01-08 |
Dynamic provisional decomposition of lithographic patterns having different interaction ranges
Grant 8,266,554 - Bagheri , et al. September 11, 2 | 2012-09-11 |
Determining manufacturability of lithographic mask based on manufacturing shape penalty of aspect ratio of edge that takes into account pair of connected edges of the edge
App 20120196210 - Inoue; Tadanobu ; et al. | 2012-08-02 |
Method For Generating A Plurality Of Optimized Wavefronts For A Multiple Exposure Lithographic Process
App 20120077130 - Bagheri; Saeed ; et al. | 2012-03-29 |
Method For Optimizing Source And Mask To Control Line Width Roughness And Image Log Slope
App 20120052418 - Tian; Kehan ; et al. | 2012-03-01 |
Dynamic Provisional Decomposition Of Lithographic Patterns Having Different Interaction Ranges
App 20120047471 - Bagheri; Saeed ; et al. | 2012-02-23 |
Method To Match Exposure Tools Using A Programmable Illuminator
App 20120008134 - Azpiroz; Jaione Tirapu ; et al. | 2012-01-12 |
Determining manufacturability of lithographic mask by reducing target edge pairs used in determining a manufacturing penalty of the lithographic mask
Grant 8,056,023 - Inoue , et al. November 8, 2 | 2011-11-08 |
Determining manufacturability of lithographic mask by selecting target edge pairs used in determining a manufacturing penalty of the lithographic mask
Grant 8,056,026 - Inoue , et al. November 8, 2 | 2011-11-08 |
Determining manufacturability of lithographic mask using continuous derivatives characterizing the manufacturability on a continuous scale
Grant 8,028,254 - Inoue , et al. September 27, 2 | 2011-09-27 |
Wavefront engineering of mask data for semiconductor device design
App 20110231803 - Inoue; Tadanobu ; et al. | 2011-09-22 |
Determining Manufacturability Of Lithographic Mask Using Continuous Derivatives Characterizing The Manufacturability On A Continuous Scale
App 20100153903 - Inoue; Tadanobu ; et al. | 2010-06-17 |
Determining manufacturability of lithographic mask by reducing target edge pairs used in determining a manufacturing penalty of the lithographic mask
App 20100153901 - Inoue; Tadanobu ; et al. | 2010-06-17 |
Determining Manufacturability Of Lithographic Mask By Selecting Target Edge Pairs Used In Determining A Manufacturing Penalty Of The Lithographic Mask
App 20100153902 - Inoue; Tadanobu ; et al. | 2010-06-17 |
System And Method For Projection Lithography With Immersed Image-aligned Diffractive Element
App 20100003605 - Gil; Dario ; et al. | 2010-01-07 |
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