Mellies; Raimund

Patent Applications and Registrations

Patent applications and USPTO patent grants for Mellies; Raimund.The latest application filed is for "aqueous, nitrogen-free cleaning composition and its use for removing residues and contaminants from semiconductor substrates suitable for manufacturing microelectronic devices".

Company Profile

0.11.10

Mellies; Raimund - Salzbergen N/A DE
Mellies; Raimund - Dieburg N/A DE
Mellies; Raimund - Salzberge DE

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Aqueous, nitrogen-free cleaning composition and its use for removing residues and contaminants from semiconductor substrates suitable for manufacturing microelectronic devices Grant 9,275,851 - Klipp , et al. March 1, 2	2016-03-01
Aqueous alkaline cleaning compositions and methods of their use Grant 8,969,275 - Mellies , et al. March 3, 2	2015-03-03
Aqueous alkaline cleaning compositions and methods of their use Grant 8,927,476 - Mellies , et al. January 6, 2	2015-01-06
Stabilized etching solutions for CU and CU/NI layers Grant 8,652,972 - Fluegge , et al. February 18, 2	2014-02-18
Aqueous, Nitrogen-free Cleaning Composition And Its Use For Removing Residues And Contaminants From Semiconductor Substrates Suitable For Manufacturing Microelectronic Devices App 20140011359 - Klipp; Andreas ; et al.	2014-01-09
Aqueous Alkaline Cleaning Compositions And Methods Of Their Use App 20130157919 - Mellies; Raimund ; et al.	2013-06-20
Aqueous Alkaline Cleaning Compositions And Methods Of Their Use App 20120094886 - Mellies; Raimund ; et al.	2012-04-19
Aqueous solution for removing post-etch residue Grant 7,919,445 - Mellies April 5, 2	2011-04-05
Electroless Deposition Of Barrier Layers App 20110059611 - Mellies; Raimund	2011-03-10
Stabilized Etching Solutions For Cu And Cu/ni Layers App 20100304573 - Fluegge; Martin ; et al.	2010-12-02
Composition for the removal of sidewall residues Grant 7,531,492 - Mellies , et al. May 12, 2	2009-05-12
Composition For The Removal Of Sidewall Residues App 20080280803 - MELLIES; Raimund ; et al.	2008-11-13
Composition for the removing of sidewall residues Grant 7,417,016 - Mellies , et al. August 26, 2	2008-08-26
Aqueous solution for removing post-etch residue App 20070161243 - Mellies; Raimund	2007-07-12
Composition for the removing of sidewall residues App 20060086372 - Mellies; Raimund ; et al.	2006-04-27

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