loadpatents
name:-0.011076211929321
name:-0.010509967803955
name:-0.00045013427734375
Meier; Stephen F. Patent Filings

Meier; Stephen F.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Meier; Stephen F..The latest application filed is for "method and system for design of enhanced edge slope patterns for charged particle beam lithography".

Company Profile
0.11.8
  • Meier; Stephen F. - Sunnyvale CA
  • Meier; Stephen F. - Fremont CA
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Method and system for design of enhanced edge slope patterns for charged particle beam lithography
Grant 9,612,530 - Fujimura , et al. April 4, 2
2017-04-04
Method and System for Design of Enhanced Edge Slope Patterns for Charged Particle Beam Lithography
App 20160195805 - Fujimura; Akira ;   et al.
2016-07-07
Method and System for Design of Enhanced Edge Slope Patterns for Charged Particle Beam Lithography
App 20150338737 - Fujimura; Akira ;   et al.
2015-11-26
Method and system for design of enhanced edge slope patterns for charged particle beam lithography
Grant 9,057,956 - Fujimura , et al. June 16, 2
2015-06-16
Method and system for forming high accuracy patterns using charged particle beam lithography
Grant 9,043,734 - Fujimura , et al. May 26, 2
2015-05-26
Method and System for Forming High Accuracy Patterns Using Charged Particle Beam Lithography
App 20140223393 - Fujimura; Akira ;   et al.
2014-08-07
Method And System For Design Of Enhanced Accuracy Patterns For Charged Particle Beam Lithography
App 20130252143 - Fujimura; Akira ;   et al.
2013-09-26
Method and system for forming high accuracy patterns using charged particle beam lithography
Grant 8,473,875 - Fujimura , et al. June 25, 2
2013-06-25
Method And System For Design Of Enhanced Edge Slope Patterns For Charged Particle Beam Lithography
App 20120221981 - Fujimura; Akira ;   et al.
2012-08-30
Method And System For Design Of Enhanced Accuracy Patterns For Charged Particle Beam Lithography
App 20120221980 - Fujimura; Akira ;   et al.
2012-08-30
Method and System for Forming High Accuracy Patterns Using Charged Particle Beam Lithography
App 20120096412 - Fujimura; Akira ;   et al.
2012-04-19
Method and system for infrared detection of electrical short defects
Grant 6,714,017 - Enachescu , et al. March 30, 2
2004-03-30
Method and system for infrared detection of electrical short defects
App 20020093354 - Enachescu, Marius ;   et al.
2002-07-18
Method and apparatus for estimating internal power consumption of an electronic circuit represented as netlist
Grant 6,345,379 - Khouja , et al. February 5, 2
2002-02-05
Method and apparatus for estimating internal power consumption of an electronic circuit represented as netlist
Grant 5,696,694 - Khouja , et al. December 9, 1
1997-12-09
Method for electronic memory management during estimation of average power consumption of an electronic circuit
Grant 5,682,320 - Khouja , et al. October 28, 1
1997-10-28
Method for estimating power consumption of a cyclic sequential electronic circuit
Grant 5,668,732 - Khouja , et al. September 16, 1
1997-09-16

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