Medvedyeva; Mariya Vyacheslavivna

Patent Applications and Registrations

Patent applications and USPTO patent grants for Medvedyeva; Mariya Vyacheslavivna.The latest application filed is for "method of determining information about a patterning process, method of reducing error in measurement data, method of calibrating a metrology process, method of selecting metrology targets".

Company Profile

5.4.6

Medvedyeva; Mariya Vyacheslavivna - Veldhoven NL
Medvedyeva; Mariya Vyacheslavivna - Eindhoven NL

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method Of Determining Information About A Patterning Process, Method Of Reducing Error In Measurement Data, Method Of Calibrating A Metrology Process, Method Of Selecting Metrology Targets App 20210191280 - Medvedyeva; Mariya Vyacheslavivna ; et al.	2021-06-24
Method of optimizing a metrology process Grant 10,585,354 - Tsiatmas , et al.	2020-03-10
Method of determining a value of a parameter of interest of a target formed by a patterning process Grant 10,585,048 - Rehman , et al.	2020-03-10
Method of determining an optimal focus height for a metrology apparatus Grant 10,571,363 - Medvedyeva , et al. Feb	2020-02-25
Beat patterns for alignment on small metrology targets Grant 10,488,768 - Fagginger Auer , et al. Nov	2019-11-26
Method Of Determining A Value Of A Parameter Of Interest Of A Target Formed By A Patterning Process App 20190323972 - REHMAN; Samee Ur ; et al.	2019-10-24
Method Of Determining An Optimal Focus Height For A Metrology Apparatus App 20190242782 - MEDVEDYEVA; Mariya Vyacheslavivna ; et al.	2019-08-08
Method Of Optimizing A Metrology Process App 20190243253 - TSIATMAS; Anagnostis ; et al.	2019-08-08
Method Of Processing Data, Method Of Obtaining Calibration Data App 20190204180 - MEDVEDYEVA; Mariya Vyacheslavivna ; et al.	2019-07-04
Beat Patterns For Alignment On Small Metrology Targets App 20190072860 - FAGGINGER AUER; Bastiaan Onne ; et al.	2019-03-07

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