loadpatents
name:-0.069651126861572
name:-0.062533855438232
name:-0.000579833984375
Medeiros; David R. Patent Filings

Medeiros; David R.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Medeiros; David R..The latest application filed is for "organic graded spin on barc compositions for high na lithography".

Company Profile
0.51.50
  • Medeiros; David R. - Yorktown Heights NY US
  • Medeiros; David R. - Hopewell Junction NY
  • Medeiros; David R. - West Stockbridge MA
  • Medeiros; David R - Ossining NY
  • Medeiros; David R - West Stockbridge MA
  • Medeiros; David R. - Armonk NY
  • Medeiros; David R. - Ossining NY
  • Medeiros; David R. - Kitchawan NY
  • Medeiros; David R. - Dobbs Ferry NY
  • Medeiros; David R. - Stockbridge MA
  • Medeiros; David R. - Ossining Road NY
  • Medeiros; David R. - Yorktown NY
  • Medeiros; David R. - Cambridge MA
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Organic graded spin on BARC compositions for high NA lithography
Grant 8,652,762 - Goldfarb , et al. February 18, 2
2014-02-18
Low temperature melt-processing of organic-inorganic hybrid
Grant 8,574,953 - DeHaven , et al. November 5, 2
2013-11-05
Antireflective hardmask composition and a method of preparing a patterned material using same
Grant 8,323,871 - Burns , et al. December 4, 2
2012-12-04
Organic Graded Spin On Barc Compositions For High Na Lithography
App 20120205787 - Goldfarb; Dario L. ;   et al.
2012-08-16
Low Temperature Melt-processing Of Organic-inorganic Hybrid
App 20120126216 - DeHaven; Patrick W. ;   et al.
2012-05-24
Organic graded spin on BARC compositions for high NA lithography
Grant 8,137,874 - Goldfarb , et al. March 20, 2
2012-03-20
Low temperature melt-processing of organic-inorganic hybrid
Grant 8,123,997 - DeHaven , et al. February 28, 2
2012-02-28
Self-segregating multilayer imaging stack with built-in antireflective properties
Grant 8,084,193 - Cheng , et al. December 27, 2
2011-12-27
Self-Segregating Multilayer Imaging Stack With Built-In Antireflective Properties
App 20110300483 - Cheng; Joy ;   et al.
2011-12-08
Self-Segregating Multilayer Imaging Stack With Built-In Antireflective Properties
App 20110294068 - Cheng; Joy ;   et al.
2011-12-01
Antireflective Hardmask Composition and a Method of Preparing a Patterned Material Using Same
App 20110207047 - Burns; Sean D. ;   et al.
2011-08-25
Use of mixed bases to enhance patterned resist profiles on chrome or sensitive substrates
Grant 7,960,095 - Moreau , et al. June 14, 2
2011-06-14
Bleachable materials for lithography
Grant 7,875,408 - Hoffnagle , et al. January 25, 2
2011-01-25
High performance CMOS devices comprising gapped dual stressors with dielectric gap fillers, and methods of fabricating the same
Grant 7,847,357 - Doris , et al. December 7, 2
2010-12-07
Graded spin-on organic antireflective coating for photolithography
Grant 7,816,069 - Brodsky , et al. October 19, 2
2010-10-19
Method for tuning epitaxial growth by interfacial doping and structure including same
Grant 7,790,593 - Babich , et al. September 7, 2
2010-09-07
Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof
Grant 7,736,833 - Angelopoulos , et al. June 15, 2
2010-06-15
Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof
Grant 7,709,177 - Angelopoulos , et al. May 4, 2
2010-05-04
Antireflective hardmask and uses thereof
Grant 7,648,820 - Babich , et al. January 19, 2
2010-01-19
Self-segregating Multilayer Imaging Stack With Built-in Antireflective Properties
App 20100009132 - Cheng; Joy ;   et al.
2010-01-14
High Performance Cmos Devices Comprising Gapped Dual Stressors With Dielectric Gap Fillers, And Methods Of Fabricating The Same
App 20090321847 - Doris; Bruce B. ;   et al.
2009-12-31
Ultrathin polymeric photoacid generator layer and method of fabricating at least one of a device and a mask by using said layer
Grant 7,638,266 - Angelopoulos , et al. December 29, 2
2009-12-29
High performance CMOS devices comprising gapped dual stressors with dielectric gap fillers, and methods of fabricating the same
Grant 7,598,540 - Doris , et al. October 6, 2
2009-10-06
Graded spin-on organic antireflective coating for photolithography
Grant 7,588,879 - Brodsky , et al. September 15, 2
2009-09-15
Organic Graded Spin On Barc Compositions For High Na Lithography
App 20090186294 - Goldfarb; Dario L. ;   et al.
2009-07-23
Negative resists based on acid-catalyzed elimination of polar molecules
Grant 7,563,558 - Allen , et al. July 21, 2
2009-07-21
Method Of Forming A Dual-damascene Structure Using An Underlayer
App 20090093114 - Burns; Sean David ;   et al.
2009-04-09
Low Temperature Melt-processing Of Organic-inorganic Hybrid
App 20080292825 - DeHaven; Patrick W. ;   et al.
2008-11-27
Low temperature melt-processing of organic-inorganic hybrid
Grant 7,456,045 - DeHaven , et al. November 25, 2
2008-11-25
Negative Resists Based on Acid-Catalyzed Elimination of Polar Molecules
App 20080233517 - Allen; Robert David ;   et al.
2008-09-25
Use of Mixed Bases to Enhance Patterned Resist Profiles on Chrome or Sensitive Substrates
App 20080227030 - Moreau; Wayne M. ;   et al.
2008-09-18
Graded Spin-on Organic Antireflective Coating for Photolithography
App 20080213707 - Brodsky; Colin J. ;   et al.
2008-09-04
Bleachable materials for lithography
App 20080182178 - Hoffnagle; John A. ;   et al.
2008-07-31
Negative resists based on acid-catalyzed elimination of polar molecules
Grant 7,393,624 - Allen , et al. July 1, 2
2008-07-01
Method For Tuning Epitaxial Growth By Interfacial Doping And Structure Including Same
App 20080153270 - Babich; Katherina E. ;   et al.
2008-06-26
Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof
App 20080124650 - Angelopoulos; Marie ;   et al.
2008-05-29
Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof
App 20080124649 - Angelopoulos; Marie ;   et al.
2008-05-29
Method For Tuning Epitaxial Growth By Interfacial Doping And Structure Including Same
App 20080093640 - Babich; Katherina E. ;   et al.
2008-04-24
Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof
Grant 7,361,444 - Angelopoulos , et al. April 22, 2
2008-04-22
Method for tuning epitaxial growth by interfacial doping and structure including same
Grant 7,329,596 - Babich , et al. February 12, 2
2008-02-12
Graded spin-on organic antireflective coating for photolithography
App 20080008955 - Brodsky; Colin J. ;   et al.
2008-01-10
High sensitivity resist compositions for electron-based lithography
Grant 7,314,700 - Huang , et al. January 1, 2
2008-01-01
Method for fabricating an ultralow dielectric constant material as an intralevel or interlevel dielectric in a semiconductor device and electronic device made
Grant 7,312,524 - Gates , et al. December 25, 2
2007-12-25
High performance CMOS devices comprising gapped dual stressors with dielectric gap fillers, and methods of fabricating the same
App 20070284617 - Doris; Bruce B. ;   et al.
2007-12-13
Advanced chemically amplified resist for sub 30 nm dense feature resolution
Grant 7,300,741 - Huang , et al. November 27, 2
2007-11-27
Negative resists based on a acid-catalyzed elimination of polar molecules
Grant 7,300,739 - Allen , et al. November 27, 2
2007-11-27
Negative resists based on acid-catalyzed elimination of polar molecules
App 20070259274 - Allen; Robert David ;   et al.
2007-11-08
Low temperature melt-processing of organic-inorganic hybrid
Grant 7,291,516 - DeHaven , et al. November 6, 2
2007-11-06
Advanced Chemically Amplified Resist For Sub 30nm Dense Feature Resolution
App 20070248908 - Huang; Wu-Song S. ;   et al.
2007-10-25
Lithographic antireflective hardmask compositions and uses thereof
Grant 7,223,517 - Babich , et al. May 29, 2
2007-05-29
Antireflective Hardmask and Uses Thereof
App 20070105363 - Babich; Katherina E. ;   et al.
2007-05-10
Method for tuning epitaxial growth by interfacial doping and structure including same
App 20070090487 - Babich; Katherina E. ;   et al.
2007-04-26
Use of an energy source to convert precursors into patterned semiconductors
Grant 7,176,484 - Afzali-Ardakani , et al. February 13, 2
2007-02-13
Antireflective hardmask and uses thereof
Grant 7,172,849 - Babich , et al. February 6, 2
2007-02-06
Negative Resists Based On A Acid-catalyzed Elimination Of Polar Molecules
App 20070026339 - Allen; Robert David ;   et al.
2007-02-01
Low temperature melt-processing of organic-inorganic hybrid
App 20060270100 - DeHaven; Patrick W. ;   et al.
2006-11-30
Photoresist composition
Grant 7,135,595 - Allen , et al. November 14, 2
2006-11-14
Low temperature melt-processing of organic-inorganic hybrid
App 20060234480 - Dehaven; Patrick W. ;   et al.
2006-10-19
Low temperature melt-processing of organic-inorganic hybrid
Grant 7,105,360 - Dehaven , et al. September 12, 2
2006-09-12
Process for forming features of 50 nm or less half-pitch with chemically amplified resist imaging
Grant 7,090,963 - Medeiros , et al. August 15, 2
2006-08-15
photoresist composition
App 20060128914 - Allen; Robert David ;   et al.
2006-06-15
High sensitivity resist compositions for electron-based lithography
App 20060127800 - Huang; Wu-Song ;   et al.
2006-06-15
Synthesis and application of photosensitive pentacene precursor in organic thin film transistors
Grant 7,053,401 - Ardakani , et al. May 30, 2
2006-05-30
Method for fabricating an ultralow dielectric constant material as an intralevel or interlevel dielectric in a semiconductor device and electronic device made
App 20060110937 - Gates; Stephen M. ;   et al.
2006-05-25
Method for fabricating an ultralow dielectric constant material as an intralevel or interlevel dielectric in a semiconductor device and electronic device made
Grant 7,049,247 - Gates , et al. May 23, 2
2006-05-23
Photoresist composition
Grant 7,014,980 - Allen , et al. March 21, 2
2006-03-21
Ultrathin polymeric photoacid generator layer and method of fabricating at least one of a device and a mask by using said layer
App 20060035167 - Angelopoulos; Marie ;   et al.
2006-02-16
Method for fabricating an ultralow dielectric constant material as an intralevel or interlevel dielectric in a semiconductor device and electronic device made
App 20050245096 - Gates, Stephen M. ;   et al.
2005-11-03
Underlayer compositions for multilayer lithographic processes
Grant 6,927,015 - Khojasteh , et al. August 9, 2
2005-08-09
Antireflective hardmask and uses thereof
App 20050042538 - Babich, Katherina ;   et al.
2005-02-24
Lithographic antireflective hardmask compositions and uses thereof
App 20050031964 - Babich, Katherina ;   et al.
2005-02-10
Underlayer compositions for multilayer lithographic processes
App 20050019704 - Khojasteh, Mahmoud M. ;   et al.
2005-01-27
Photoresist composition
App 20050019696 - Allen, Robert David ;   et al.
2005-01-27
Process For Forming Features Of 50 Nm Or Less Half-pitch With Chemically Amplified Resist Imaging
App 20040265747 - Medeiros, David R. ;   et al.
2004-12-30
Underlayer compositions for multilayer lithographic processes
Grant 6,818,381 - Khojasteh , et al. November 16, 2
2004-11-16
Photoresist composition
Grant 6,806,026 - Allen , et al. October 19, 2
2004-10-19
Synthesis and application of photosensitive pentacene precursor in organic thin film transistors
App 20040119073 - Ardakami, Ali Afzali ;   et al.
2004-06-24
Use of an energy source to convert precursors into patterned semiconductors
App 20040110093 - Afzali-Ardakani, Ali ;   et al.
2004-06-10
Antireflective SiO-containing compositions for hardmask layer
Grant 6,730,454 - Pfeiffer , et al. May 4, 2
2004-05-04
Polymers and use thereof
Grant 6,689,540 - Aviram , et al. February 10, 2
2004-02-10
Multifunctional polymeric materials and use thereof
Grant 6,686,124 - Angelopoulos , et al. February 3, 2
2004-02-03
Supercritical fluid(SCF) silylation process
Grant 6,673,521 - Moreau , et al. January 6, 2
2004-01-06
Photoresist composition
App 20030224283 - Allen, Robert David ;   et al.
2003-12-04
Resist compositions comprising silyl ketals and methods of use thereof
Grant 6,641,971 - Huang , et al. November 4, 2
2003-11-04
Antireflective SiO-containing compositions for hardmask layer
App 20030198877 - Pfeiffer, Dirk ;   et al.
2003-10-23
Low temperature melt-processing of organic-inorganic hybrid
App 20030170918 - Dehaven, Patrick W. ;   et al.
2003-09-11
Ultralow dielectric constant material as an intralevel or interlevel dielectric in a semiconductor device and electronic device containing the same
Grant 6,541,398 - Grill , et al. April 1, 2
2003-04-01
Etch improved resist systems containing acrylate (or methacrylate) silane monomers
App 20030049561 - Angelopoulos, Marie ;   et al.
2003-03-13
Supercritical fluid(SCF) silylation process
App 20030036023 - Moreau, Wayne M. ;   et al.
2003-02-20
Process of drying a cast polymeric film disposed on a workpiece
Grant 6,509,136 - Goldfarb , et al. January 21, 2
2003-01-21
Process Of Drying A Cast Polymeric Film Disposed On A Workpiece
App 20030008238 - Goldfarb, Dario L. ;   et al.
2003-01-09
Resist compositions comprising silyl ketals and methods of use thereof
App 20020197556 - Huang, Wu-Song ;   et al.
2002-12-26
Ultralow dielectric constant material as an intralevel or interlevel dielectric in a semiconductor device and electronic device containing the same
App 20020180051 - Grill, Alfred ;   et al.
2002-12-05
Ultralow dielectric constant material as an intralevel or interlevel dielectric in a semiconductor device and electronic device containing the same
App 20020137359 - Grill, Alfred ;   et al.
2002-09-26
Ultralow dielectric constant material as an intralevel or interlevel dielectric in a semiconductor device and electronic device containing the same
Grant 6,441,491 - Grill , et al. August 27, 2
2002-08-27
Mask-making using resist having SIO bond-containing polymer
Grant 6,420,084 - Angelopoulos , et al. July 16, 2
2002-07-16
Polymers and use thereof
App 20020090574 - Aviram, Ari ;   et al.
2002-07-11
Underlayer compositions for multilayer lithographic processes
App 20020058204 - Khojasteh, Mahmoud M. ;   et al.
2002-05-16
Radiation sensitive compositions comprising polymer having acid labile groups
Grant 5,258,257 - Sinta , et al. November 2, 1
1993-11-02

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