loadpatents
name:-0.021106004714966
name:-0.60969686508179
name:-0.02255392074585
McStay; Irene Patent Filings

McStay; Irene

Patent Applications and Registrations

Patent applications and USPTO patent grants for McStay; Irene.The latest application filed is for "sacrificial collar method for improved deep trench processing".

Company Profile
0.8.4
  • McStay; Irene - Hopewell Junction NY
  • McStay; Irene - Hopewell Jct NY
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Sacrificial collar method for improved deep trench processing
Grant 6,905,944 - Chudzik , et al. June 14, 2
2005-06-14
Sacrificial Collar Method For Improved Deep Trench Processing
App 20040224478 - Chudzik, Michael Patrick ;   et al.
2004-11-11
Method of area enhancement in capacitor plates
Grant 6,709,947 - Wrschka , et al. March 23, 2
2004-03-23
Control of separation between transfer gate and storage node in vertical DRAM
Grant 6,706,634 - Seitz , et al. March 16, 2
2004-03-16
Low resistivity deep trench fill for DRAM and EDRAM applications
Grant 6,620,724 - Schroeder , et al. September 16, 2
2003-09-16
Method for surface roughness enhancement in semiconductor capacitor manufacturing
Grant 6,613,642 - Rahn , et al. September 2, 2
2003-09-02
Method For Surface Roughness Enhancement In Semiconductor Capacitor Manufacturing
App 20030114005 - Rahn, Stephen ;   et al.
2003-06-19
Process flow for capacitance enhancement in a DRAM trench
Grant 6,555,430 - Chudzik , et al. April 29, 2
2003-04-29
Negative ion implant mask formation for self-aligned, sublithographic resolution patterning for single-sided vertical device formation
Grant 6,498,061 - Divakaruni , et al. December 24, 2
2002-12-24
Process flow for sacrificial collar with poly mask
Grant 6,458,647 - Tews , et al. October 1, 2
2002-10-01
Method for surface area enhancement of capacitors by film growth and self masking
App 20020106857 - Jammy, Rajarao ;   et al.
2002-08-08
Negative Ion implant mask formation for self-aligned, sublithographic resolution patterning for single-sided vertical device formation
App 20020068399 - Divakaruni, Rama ;   et al.
2002-06-06

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