McKerrow; Andrew John

Patent Applications and Registrations

Patent applications and USPTO patent grants for McKerrow; Andrew John.The latest application filed is for "conformal damage-free encapsulation of chalcogenide materials".

Company Profile

7.12.11

McKerrow; Andrew John - Lake Oswego OR
McKerrow; Andrew John - Dallas TX

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Conformal Damage-free Encapsulation Of Chalcogenide Materials App 20220115592 - Sims; James Samuel ; et al.	2022-04-14
Conformal damage-free encapsulation of chalcogenide materials Grant 11,239,420 - Sims , et al. February 1, 2	2022-02-01
Suppressing interfacial reactions by varying the wafer temperature throughout deposition Grant 11,075,127 - Varadarajan , et al. July 27, 2	2021-07-27
Configuration and method of operation of an electrodeposition system for improved process stability and performance Grant 10,745,817 - Ganesan , et al. A	2020-08-18
Conformal Damage-free Encapsulation Of Chalcogenide Materials App 20200066987 - Sims; James Samuel ; et al.	2020-02-27
Suppressing Interfacial Reactions By Varying The Wafer Temperature Throughout Deposition App 20200066607 - Varadarajan; Seshasayee ; et al.	2020-02-27
Method for reducing the wet etch rate of a sin film without damaging the underlying substrate Grant 10,454,029 - McKerrow , et al. Oc	2019-10-22
Suppressing interfacial reactions by varying the wafer temperature throughout deposition Grant 10,347,547 - Varadarajan , et al. July 9, 2	2019-07-09
Methods and apparatus for depositing silicon oxide on metal layers Grant 10,319,582 - Varadarajan , et al.	2019-06-11
Clean resistant windows for ultraviolet thermal processing Grant 10,240,236 - Lee , et al.	2019-03-26
Methods And Apparatus For Depositing Silicon Oxide On Metal Layers App 20180315597 - Varadarajan; Bhadri N. ; et al.	2018-11-01
Method for depositing ALD films using halide-based precursors Grant 10,020,188 - Sims , et al. July 10, 2	2018-07-10
Method For Reducing The Wet Etch Rate Of A Sin Film Without Damaging The Underlying Substrate App 20180138405 - McKerrow; Andrew John ; et al.	2018-05-17
Method For Depositing Ald Films Using Halide-based Precursors App 20180102245 - Sims; James S. ; et al.	2018-04-12
Suppressing Interfacial Reactions By Varying The Wafer Temperature Throughout Deposition App 20180047645 - Varadarajan; Seshasayee ; et al.	2018-02-15
Configuration And Method Of Operation Of An Electrodeposition System For Improved Process Stability And Performance App 20180038007 - Ganesan; Kousik ; et al.	2018-02-08
Method for depositing metals free ald silicon nitride films using halide-based precursors Grant 9,824,884 - Sims , et al. November 21, 2	2017-11-21
Low-k damage repair and pore sealing agents with photosensitive end groups Grant 9,502,255 - Antonelli , et al. November 22, 2	2016-11-22
Clean Resistant Windows For Ultraviolet Thermal Processing App 20160258057 - Lee; James ; et al.	2016-09-08
Low-k Damage Repair And Pore Sealing Agents With Photosensitive End Groups App 20160111288 - Antonelli; George Andrew ; et al.	2016-04-21
Method to increase mechanical fracture robustness of porous low k dielectric materials Grant 7,342,315 - Tsui , et al. March 11, 2	2008-03-11
Method to increase mechanical fracture robustness of porous low k dielectric materials App 20050196955 - Tsui, Ting Yiu ; et al.	2005-09-08
Method for fabricating semiconductor devices that uses efficient plasmas Grant 6,806,103 - Tsui , et al. October 19, 2	2004-10-19

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