McCullough; Andrew W.

Patent Applications and Registrations

Patent applications and USPTO patent grants for McCullough; Andrew W..The latest application filed is for "maskless lithography systems and methods utilizing spatial light modulator arrays".

Company Profile

0.17.13

McCullough; Andrew W. - Newtown CT

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Maskless lithography systems and methods utilizing spatial light modulator arrays Grant 7,403,266 - Bleeker , et al. July 22, 2	2008-07-22
Method and apparatus for cooling a reticle during lithographic exposure Grant 7,105,836 - del Puerto , et al. September 12, 2	2006-09-12
Illumination system with spatially controllable partial coherence compensating for line width variances Grant 7,092,070 - McCullough , et al. August 15, 2	2006-08-15
Maskless lithography systems and methods utilizing spatial light modulator arrays App 20060114438 - Bleeker; Arno ; et al.	2006-06-01
Non absorbing reticle and method of making same Grant 7,029,804 - McCullough April 18, 2	2006-04-18
Non absorbing reticle and method of making same Grant 7,014,963 - McCullough March 21, 2	2006-03-21
Use of multiple reticles in lithographic printing tools Grant 6,967,713 - McCullough , et al. November 22, 2	2005-11-22
Maskless lithography systems and methods utilizing spatial light modulator arrays App 20050046819 - Bleeker, Arno ; et al.	2005-03-03
Illumination system with spatially controllable partial coherence compensating for line width variances App 20050041231 - McCullough, Andrew W. ; et al.	2005-02-24
Use of multiple reticles in lithographic printing tools App 20050030514 - McCullough, Andrew W. ; et al.	2005-02-10
Non absorbing reticle and method of making same App 20050025279 - McCullough, Andrew W.	2005-02-03
Maskless lithography systems and methods utilizing spatial light modulator arrays App 20040239908 - Bleeker, Arno ; et al.	2004-12-02
Illumination system with spatially controllable partial coherence compensation for line width variances in a photolithographic system Grant 6,822,728 - McCullough , et al. November 23, 2	2004-11-23
Use of multiple reticles in lithographic printing tools Grant 6,800,408 - McCullough , et al. October 5, 2	2004-10-05
Non absorbing reticle and method of making same App 20040131954 - McCullough, Andrew W.	2004-07-08
Method and apparatus for cooling a reticle during lithographic exposure App 20040079518 - del Puerto, Santiago ; et al.	2004-04-29
Illumination system with spatially controllable partial coherence compensation for line width variances in a photolithographic system App 20040057033 - McCullough, Andrew W. ; et al.	2004-03-25
Use of multiple reticles in lithographic printing tools App 20040043311 - McCullough, Andrew W. ; et al.	2004-03-04
Non absorbing reticle and method of making same Grant 6,686,101 - McCullough February 3, 2	2004-02-03
Use of multiple reticles in lithographic printing tools Grant 6,628,372 - McCullough , et al. September 30, 2	2003-09-30
Illumination system with spatially controllable partial coherence compensating for line width variances in a photolithographic system Grant 6,628,370 - McCullough , et al. September 30, 2	2003-09-30
Non absorbing reticle and method of making same App 20020182519 - McCullough, Andrew W.	2002-12-05
Non absorbing reticle and method of making same Grant 6,444,372 - McCullough September 3, 2	2002-09-03
Use of multiple reticles in lithographic printing tools App 20020115004 - McCullough, Andrew W. ; et al.	2002-08-22
Method and system of varying optical imaging performance in the presence of refractive index variations App 20020085185 - Helmus, June L. ; et al.	2002-07-04
Illumination system with spatially controllable partial coherence Grant 6,259,513 - Gallatin , et al. July 10, 2	2001-07-10
Dynamically adjustable high resolution adjustable slit Grant 6,097,474 - McCullough , et al. August 1, 2	2000-08-01
Method of controlling illumination field to reduce line width variation Grant 6,013,401 - McCullough , et al. January 11, 2	2000-01-11
Adjustable slit Grant 5,966,202 - McCullough October 12, 1	1999-10-12
Method for adjusting an illumination field based on selected reticle feature Grant 5,895,737 - McCullough , et al. April 20, 1	1999-04-20

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