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Patent applications and USPTO patent grants for McCoy; John H..The latest application filed is for "inspection tool for testing and adjusting a projection unit of a lithography system".
Patent | Date |
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Inspection tool for testing and adjusting a projection unit of a lithography system Grant H2,114 - Novak , et al. February 1, 2 | 2005-02-01 |
Semiconductor wafer alignment using backside illumination Grant 6,376,329 - Sogard , et al. April 23, 2 | 2002-04-23 |
Direct reticle to wafer alignment using fluorescence for integrated circuit lithography Grant 5,838,450 - McCoy , et al. November 17, 1 | 1998-11-17 |
Wafer inspection method and apparatus using diffracted light Grant 5,777,729 - Aiyer , et al. July 7, 1 | 1998-07-07 |
Alignment system with large area search for wafer edge and global marks Grant 5,648,854 - McCoy , et al. July 15, 1 | 1997-07-15 |
Multiple reticle stitching for scanning exposure system Grant 5,437,946 - McCoy August 1, 1 | 1995-08-01 |
Alignment system and method with micromovement stage Grant 4,019,109 - McCoy , et al. April 19, 1 | 1977-04-19 |
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