McClure; Brent A.

Patent Applications and Registrations

Patent applications and USPTO patent grants for McClure; Brent A..The latest application filed is for "process for color filter array residual pigment removal".

Company Profile

0.11.10

McClure; Brent A. - Boise ID
McClure; Brent A. - Meridian ID

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Process for color filter array residual pigment removal Grant 8,129,079 - Hodge , et al. March 6, 2	2012-03-06
Capacitor constructions and methods of forming Grant 7,440,255 - McClure , et al. October 21, 2	2008-10-21
Process for color filter array residual pigment removal App 20080102385 - Hodge; Earnest ; et al.	2008-05-01
Process for color filter array residual pigment removal Grant 7,326,503 - Hodge , et al. February 5, 2	2008-02-05
Self masking contact using an angled implant Grant 7,233,038 - McClure June 19, 2	2007-06-19
Process for color filter array residual pigment removal App 20070042278 - Hodge; Earnest ; et al.	2007-02-22
Method of forming a contact in a pixel cell Grant 7,037,764 - McClure May 2, 2	2006-05-02
Reduced aspect ratio digit line contact process flow used during the formation of a semiconductor device Grant 7,015,528 - McClure March 21, 2	2006-03-21
Imager photo diode capacitor structure with reduced process variation sensitivity Grant 7,008,816 - McClure March 7, 2	2006-03-07
Capacitor constructions and methods of forming App 20050269669 - McClure, Brent A. ; et al.	2005-12-08
Method Of Forming A Contact In A Pixel Cell App 20050191814 - McClure, Brent A.	2005-09-01
Self masking contact using an angled implant App 20050189573 - McClure, Brent A.	2005-09-01
Imager photo diode capacitor structure with reduced process variation sensitivity App 20050032281 - McClure, Brent A.	2005-02-10
Capacitor constructions and methods of forming App 20050018381 - McClure, Brent A. ; et al.	2005-01-27
Reduced aspect ratio digit line contact process flow used during the formation of a semiconductor device App 20040178435 - McClure, Brent A.	2004-09-16
Imager photo diode capacitor structure with reduced process variation sensitivity Grant 6,780,666 - McClure August 24, 2	2004-08-24
Reduced aspect ratio digit line contact process flow used during the formation of a semiconductor device Grant 6,709,945 - McClure March 23, 2	2004-03-23
Semiconductor Structures Formed Using Redeposition Of An Etchable Layer App 20020130349 - McClure, Brent A. ; et al.	2002-09-19
Reduced aspect ratio digit line contact process flow used during the formation of a semiconductor device App 20020093043 - McClure, Brent A.	2002-07-18
Method for precision etching of platinum electrodes Grant 5,930,639 - Schuele , et al. July 27, 1	1999-07-27
Method for forming a structure using redeposition of etchable layer Grant 5,792,593 - McClure , et al. August 11, 1	1998-08-11

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