Mauer, IV; John L.
Patent Applications and Registrations
Patent applications and USPTO patent grants for Mauer, IV; John L..The latest application filed is for "resist development endpoint detection for x-ray lithography".
- Mauer, IV; John L. - South Kent CT
- Mauer, IV; John L. - Sherman CT
| Patent | Date |
|---|---|
| Resist development endpoint detection for X-ray lithography Grant 5,264,328 - DellaGuardia , et al. November 23, 1 | 1993-11-23 |
| Schottky diode having limited area self-aligned guard ring and method for making same Grant 4,796,069 - Anantha , et al. January 3, 1 | 1989-01-03 |
| Method for making Schottky diode having limited area self-aligned guard ring Grant 4,691,435 - Anantha , et al. September 8, 1 | 1987-09-08 |
| Isolation for high density integrated circuits Grant 4,688,069 - Joy , et al. August 18, 1 | 1987-08-18 |
| Electron beam system Grant 4,494,004 - Mauer, IV , et al. January 15, 1 | 1985-01-15 |
| Isolation for high density integrated circuits Grant 4,454,646 - Joy , et al. June 19, 1 | 1984-06-19 |
| Isolation for high density integrated circuits Grant 4,454,647 - Joy , et al. June 19, 1 | 1984-06-19 |
| Planar multi-level metal process with built-in etch stop Grant 4,447,824 - Logan , et al. May 8, 1 | 1984-05-08 |
| Method for avoiding residue on a vertical walled mesa Grant 4,389,294 - Anantha , et al. June 21, 1 | 1983-06-21 |
| Planar multi-level metal process with built-in etch stop Grant 4,367,119 - Logan , et al. January 4, 1 | 1983-01-04 |
| Planar deep oxide isolation process utilizing resin glass and E-beam exposure Grant 4,222,792 - Lever , et al. September 16, 1 | 1980-09-16 |
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