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Patent applications and USPTO patent grants for Mattox; Robert J..The latest application filed is for "method of forming substrate contact trenches and isolation trenches using anodization for isolation".
Patent | Date |
---|---|
Method of forming substrate contact trenches and isolation trenches using anodization for isolation Grant 5,217,920 - Mattox , et al. June 8, 1 | 1993-06-08 |
Process for making a multilayer metallization structure Grant 4,943,539 - Wilson , et al. July 24, 1 | 1990-07-24 |
Method for obtaining submicron features from optical lithography technology Grant 4,801,350 - Mattox , et al. January 31, 1 | 1989-01-31 |
Trench isolation method for semiconductor devices Grant 4,791,073 - Nagy , et al. December 13, 1 | 1988-12-13 |
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